Browsing by author "Rakhimova, T."
Now showing items 1-13 of 13
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Comparison between vacuum ultra-violet emission of CF4/Ar and CF3I/Ar plasmas in CCP chamber for low-k etching
Zotovich, A.; El Otell, Ziad; de Marneffe, Jean-Francois; Proshina, O.; Lopaev, D.; Rakhimova, T.; Baklanov, Mikhaïl (2015) -
Effect of VUV and EUV radiation on utra low-k materials damage
Braginsky, O.; Kovalev, A.; Lopaev, D.; Mankelevich, Y.; Proshina, O.; Rakhimova, T.; Rakhimov, A.; Vasilieva, A.; Zyryanov, S.; Baklanov, Mikhaïl (2013) -
Experimental and theoretical study of RF capacitevely-coupled plasma in the Ar/CF4/CF3I mixtures
Proshina, O.; Rakhimova, T.; Lopaev, D.; Samara, V.; Baklanov, Mikhaïl; de Marneffe, Jean-Francois (2015) -
F atoms interaction with nanoporous OSG low-k materials
Rakhimova, T.; Rakhimov, A.; Zyryanov, S.; Lopaev, D.; Mankelevich, Y.; Proshina, O.; Novikova, N.; Kurchikov, K.; Baklanov, Mikhaïl (2014) -
Interaction of atomic fluorine with porous low-k SiCOH films: modeling
Palov, A.; Voronina, E.; Lopaev, D.; Mankelevich, Y.; Rakhimova, T.; Zyryanov, S.; Proshina, O.; Baklanov, Mikhaïl (2015) -
Interaction of F atoms with SiCOH ultra low-k films. Part I: Fluorination and damage
Rakhimova, T.; Lopaev, D.; Mankelevich, Y.; Rakhimov, A.; Zyryanov, S.; Kurchikov, K.; Novikova, N.; Baklanov, Mikhaïl (2015) -
Interaction of F atoms with SiCOH ultra low-k films. Part II: Etching
Rakhimova, T.; Lopaev, D.; Mankelevich, Y.; Kurchikov, K.; Zyryanov, S.; Palov, A.P.; Proshina, O.V.; Maslakov, K.; Baklanov, Mikhaïl (2015) -
Low-k films modification under EUV and VUV radiation
Rakhimova, T.; Rakhimov, A.; Mankelevich, Y.A.; Lopaev, D.V.; Kovalev, A.S.; Vasil'eva, A.N.; Zyryanov, S.M.; Kurchikov, K.; Proshina, O.; Voloshin, D.G.; Novikova, N.N.; Krishtab, Mikhail; Baklanov, Mikhaïl (2014) -
Low-k OSG damage and etching by F atoms at lowered temperatures
Zyryanov, S.; Kurchikov, D.; Lopaev, D.; Mankelevich, Y.; Palov, A.; Rakhimova, T.; Voronina, E.; Novikova, N.; Baklanov, Mikhaïl (2015) -
Modelling degradation of PTFE under electron irradiation
Palov, A.; Fujii, H.; Mankelevich, Y.; Rakhimova, T.; Baklanov, Mikhaïl (2012) -
Modification of OSG based low-k films under EUV and VUV exposure
Rakhimova, T.; Rakhimov, A.; Mankelevich, Y.; Lopaev, D.; Kovalev, A.; Vasil'eva, A.; Proshina, O.; Braginsky, O.; Zyryanov, S.; Kurchikov, K.; Novikova, N.; Baklanov, Mikhaïl (2013) -
Multi-step reaction mechanism for F atom interactions with organosilicate glass and SiOx films
Mankelevich, Y.; Voronina, E.; Rakhimova, T.; Palov, A.; Lopaev, D.V.; Zyryanov, S.M.; Baklanov, Mikhaïl (2016) -
Ultra low-k dielectrics damage under VUV and EUV radiation
Zyryanov, S.; Braginsky, O.; Kovaev, A.; Lopaev, D.; Mankelevich, Y.; Rakhimova, T.; Rakhimov, A.; Vasilieva, A.; Baklanov, Mikhaïl (2012)