Browsing by author "Van den hove, Luc"
Now showing items 1-20 of 107
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0.18 μm lithography : using 248 nm deep-UV and top surface imaging
Goethals, Mieke; Van den hove, Luc (1996) -
0.25 µm optical lithography based on surface imaging and dry development
Goethals, Mieke; Van den hove, Luc (1994) -
248 nm lithography for the 0.18 μm generation
Vandenberghe, Geert; Tzviatkov, Plamen; Yen, Anthony; Ronse, Kurt; Van den hove, Luc; Luehrmann, P.; Slonaker, S.; van Ingen Schenau, K.; Juffermans, Casper (1996) -
4X reticles with 3% linewidth control for the development of 0.18 µm lithography
Jonckheere, Rik; Moonens, Jos; Potoms, Goedele; Bovie, Inge; Van den hove, Luc (1996) -
Achievements and concerns of 193 nm immersion lithography
Ronse, Kurt; Vandenberghe, Geert; Van den hove, Luc (2005) -
Attenuated phase shifting masks in combination with off-axis illumination: A way towards quarter micron DUV lithography for random logic operations
Ronse, Kurt; Pforr, Rainer; Baik, Ki-Ho; Jonckheere, Rik; Van den hove, Luc (1994) -
Automated OPC for application in advanced lithography
Ronse, Kurt; Tritchkov, Alexander; Randall, John; Jonckheere, Rik; Ghandehari, Kouros; Van den hove, Luc (1997) -
CD control comparison of step & repeat versus step & scan DUV lithography for sub-0.25 μm gate printing
Ronse, Kurt; Maenhoudt, Mireille; Marschner, Thomas; Van den hove, Luc; Streefkerk, B.; Finders, Jo; van Schoot, J.; Luehrmann, P.; Minvielle, A. (1998) -
CD control for 180-nm and 130-nm gate-level lithography
Kim, Kee - Ho; Ronse, Kurt; Goethals, Mieke; Vandenberghe, Geert; Van den hove, Luc (1996) -
CD Control: The limiting factor for i-line and deep-UV lithography?
Ronse, Kurt; Pforr, Rainer; Op de Beeck, Maaike; Van den hove, Luc (1995) -
Challenges and outlook of 193nm immersion lithography
Ronse, Kurt; Vandenberghe, Geert; Van den hove, Luc (2005) -
Challenges for 0.35-0.25 μm optical lithography
Van den hove, Luc; Ronse, Kurt (1995) -
Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modeling
Yen, Anthony; Tritchkov, Alexander; Stirniman, J. P.; Vandenberghe, Geert; Jonckheere, Rik; Ronse, Kurt; Van den hove, Luc (1996) -
Characterization and optimization of CD control for 0.25µm CMOS applications
Ronse, Kurt; Op de Beeck, Maaike; Yen, Anthony; Kim, Kee - Ho; Van den hove, Luc (1996) -
Current status of 193 nm immersion lithography and outlook to the future
Ronse, Kurt; Cheng, Shaunee; Ercken, Monique; Leunissen, Peter; Maenhoudt, Mireille; Vandenberghe, Geert; Van den hove, Luc (2005) -
Development of a global planarization process without CMP
Forester, Lynn; Coenegrachts, Bart; Stone, M.; Meynen, Herman; Grillaert, Joost; Van den hove, Luc (1994) -
Dry development in an O2/SO2 plasma for sub-0.18 μm top layer imaging processes
Goethals, Mieke; Van Roey, Frieda; Sugihara, Takashi; Van den hove, Luc; Vertommen, Johan; Klippert, W. (1998) -
DUV Lithography for 0.35 µm CMOS Processing
Van Driessche, Veerle; Goethals, Mieke; Op de Beeck, Maaike; Ronse, Kurt; Van den hove, Luc (1994) -
DUV lithography for 0.35 μm CMOS processing
Van Driessche, Veerle; Goethals, Mieke; Op de Beeck, Maaike; Ronse, Kurt; Van den hove, Luc (1995) -
DUV resist materials and processes for 0.25 μm and 0.18 μm CMOS devices
Op de Beeck, Maaike; Vandenberghe, Geert; Goethals, Mieke; Van den hove, Luc (1996)