Browsing by author "Coenegrachts, Bart"
Now showing items 21-36 of 36
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Key contributors for improvement of line width roughness, line edge roughness, and critical dimension uniformity: 15 nm half-pitch patterning with extreme ultraviolet and self-aligned double patterning
Xu, Kaidong; Souriau, Laurent; Hellin, David; Versluijs, Janko; Wong, Patrick; Vangoidsenhoven, Diziana; Vandenbroeck, Nadia; Dekkers, Harold; Shi, Xiaoping; Albert, Johan; Tan, Chi Lim; Vertommen, Johan; Coenegrachts, Bart; Orain, Isabelle; Kimura, Yoshie; Wiaux, Vincent; Boullart, Werner (2013-09) -
Low-k organic spin-on materials in a non-etchback interconnect strategy
Waeterloos, Joost; Meynen, Herman; Coenegrachts, Bart; Grillaert, Joost; Van den hove, Luc (1996) -
Memory node and oxide-nitride-oxide gate stack patterning for a bi-layer poly-silicon channel
Paraschiv, Vasile; Vecchio, Emma; Milenin, Alexey; Kar, Gouri Sankar; Demand, Marc; Coenegrachts, Bart; Vertommen, Johan; Boullart, Werner (2011) -
Minimizing within die non uniformity in CMP by optimising polishing parameters and consumables
Grillaert, Joost; Meynen, Herman; Waeterloos, Joost; Coenegrachts, Bart; Van den hove, Luc (1997) -
Novel patterning shrink technique enabling sub-50nm trench and contact integration
Demuynck, Steven; Tokei, Zsolt; Zhao, Chao; de Marneffe, Jean-Francois; Struyf, Herbert; Boullart, Werner; Op de Beeck, Maaike; Carbonell, Laure; Heylen, Nancy; Vaes, Jan; Beyer, Gerald; Vanhaelemeersch, Serge; Zhu, Helen; Cirigliano, Peter; Kim, J. S.; Vertommen, Johan; Coenegrachts, Bart; Sadjadi, R.; Pavel, E.; Athayde, A. (2007) -
Physical and electrical characterization of silsesquioxane-based ultra-low k dielectric films
Alves Donaton, Ricardo; Iacopi, Francesca; Baklanov, Mikhaïl; Shamiryan, Denis; Coenegrachts, Bart; Struyf, Herbert; Lepage, Muriel; Meuris, Marc; Van Hove, Marleen; Gray, William; Meynen, Herman; De Roest, David; Vanhaelemeersch, Serge; Maex, Karen (2000) -
Process optimization and integration of trimethylsilane deposited a-SiC:H and SiOC:H dielectric thin films for damascene processing
Gray, William; Loboda, M.; Struyf, Herbert; Van Hove, Marleen; Donaton, R. A.; Sleeckx, Erik; Stucchi, Michele; Gao, Teng; Boullart, Werner; Coenegrachts, Bart; Maenhoudt, Mireille; Vanhaelemeersch, Serge; Meynen, Herman; Maex, Karen (2000) -
Process optimization and integration of trimethylsilane-deposited a-SiC:H and a-SiCO:H dielectric thin films for damascene processing
Gray, W.D.; Loboda, M.J.; Bremmer, J.N.; Struyf, Herbert; Lepage, Muriel; Van Hove, Marleen; Alves Donaton, Ricardo; Sleeckx, Erik; Stucchi, Michele; Lanckmans, Filip; Gao, Teng; Boullart, Werner; Coenegrachts, Bart; Maenhoudt, Mireille; Vanhaelemeersch, Serge; Meynen, H.; Maex, Karen (2003) -
Reduction of the premetal dielectric thermal budget for a 0.35 μm technology
Waeterloos, Joost; Meynen, Herman; de Potter de ten Broeck, Muriel; Coenegrachts, Bart; Gao, Teng; Grillaert, Joost; Van den hove, Luc; Maex, Karen (1996) -
Scaling of Hf-based high-k dielectrics
Heyns, Marc; Beckx, Stephan; Caymax, Matty; Chen, J.; Claes, Martine; Coenegrachts, Bart; De Gendt, Stefan; Degraeve, R.; Delabie, Annelies; Deweerd, Wim; Groeseneken, Guido; Hayashi, Shigenori; Henson, Kirklen; Hooker, Jacob; Houssa, Michel; Kauerauf, Thomas; Kerber, A.; Kwak, Dong Hwa; Lander, Rob; Lujan, Guilherme; Niwa, Masaaki; Pantisano, Luigi; Puurunen, Riikka; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Shimamoto, Y.; Tsai, Wilman; Van Elshocht, Sven; Vertommen, Johan; Vandervorst, Wilfried; Kubicek, Stefan (2004) -
Scaling of high-k dielectrics towards sub-1nm EOT
Heyns, Marc; Beckx, Stephan; Bender, Hugo; Blomme, Pieter; Boullart, Werner; Brijs, Bert; Carter, Richard; Caymax, Matty; Claes, Martine; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; Delabie, Annelies; Deweerd, Wim; Groeseneken, Guido; Henson, Kirklen; Kauerauf, Thomas; Kubicek, Stefan; Lucci, Luca; Lujan, Guilherme; Mentens, Jimmy; Pantisano, Luigi; Petry, Jasmine; Richard, Olivier; Röhr, Erika; Schram, Tom; Vandervorst, Wilfried; Van Doorne, Patrick; Van Elshocht, Sven; Westlinder, Jörgen; Witters, Thomas; Zhao, Chao; Cartier, Eduard; Chen, Jerry; Cosnier, Vincent; Green, Martin; Jang, Se Aug; Kaushik, Vidya; Kerber, Andreas; Kluth, Jon; Lin, Steven; Tsai, Wilman; Young, Edward; Manabe, Yukiko; Shimamoto, Yasuhiro; Bajolet, Philippe; De Witte, Hilde; Maes, Jan; Date, Lucien; Pique, Didier; Coenegrachts, Bart; Vertommen, Johan; Passefort, Sophie (2003) -
Selective wet etching of HF-based layers
Claes, Martine; Paraschiv, Vasile; Boutkabout, Hakim; Witters, Thomas; De Gendt, Stefan; Rohr, Erika; Coenegrachts, Bart; Vertommen, Johan; Richard, Olivier; Lindsay, Richard; Boullart, Werner; Heyns, Marc (2004) -
Studies on XLK film characterization and integration in copper damascene processes
Iacopi, Francesca; Alves Donaton, Ricardo; Coenegrachts, Bart; Komiya, Takayuki; Struyf, Herbert; Lepage, Muriel; Van Aelst, Joke; Boullart, Werner; De Roest, David; Vos, Ingrid; Baklanov, Mikhaïl; Vereecke, Guy; Van Hove, Marleen; Stucchi, Michele; Tokei, Zsolt; Meynen, Herman; Bremmer, J. N.; Vanhaelemeersch, Serge; Maex, Karen (2001) -
Sub-65nm etch challenges of high-k and metal gate materials
Kota, Gowri P.; Ramalingam, Shyam; Lee, Steve; Coenegrachts, Bart; Lee, Chris; Beckx, Stephan; Demand, Marc; Boullart, Werner (2004) -
The evaluation and the inegration of low-k organic spin-on materials in a non-etchback interconnect process
Meynen, Herman; Waeterloos, Joost; Coenegrachts, Bart; Gao, Teng; Grillaert, Joost; Van den hove, Luc (1996) -
The integration of a low-k material with high organic content in a non-etchback process
Waeterloos, Joost; Meynen, Herman; Coenegrachts, Bart; Vanhaelemeersch, Serge; Grillaert, Joost; Van den hove, Luc (1996)