Browsing by author "Locorotondo, Sabrina"
Now showing items 21-38 of 38
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Hybrid floating gate cell for sub-20-nm NAND flash memory technology
Blomme, Pieter; Cacciato, Antonio; Wellekens, Dirk; Breuil, Laurent; Rosmeulen, Maarten; Kar, Gouri Sankar; Locorotondo, Sabrina; Vrancken, Christa; Richard, Olivier; Debusschere, Ingrid; Van Houdt, Jan (2012) -
Implementation of high-K and metal gate materials for the 45nm node and beyond: gate patterning development
Beckx, Stephan; Demand, Marc; Locorotondo, Sabrina; Henson, K.; Claes, Martine; Paraschiv, Vasile; Shamiryan, Denis; Jaenen, Patrick; Boullart, Werner; De Gendt, Stefan; Biesemans, Serge; Vanhaelemeersch, Serge; Vertommen, Johan; Coenegrachts, Bart (2004) -
Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development
Beckx, Stephan; Demand, Marc; Locorotondo, Sabrina; Henson, Kirklen; Claes, Martine; Paraschiv, Vasile; Shamiryan, Denis; Jaenen, Patrick; Boullart, Werner; De Gendt, Stefan; Biesemans, Serge; Vanhaelemeersch, Serge; Vertommen, Johan; Coenegrachts, Bart (2005-06) -
Influence of oxide hard mask on profiles of sub-100 nm Si and SiGe gates
Shamiryan, Denis; Paraschiv, Vasile; Locorotondo, Sabrina; Beckx, Stephan; Boullart, Werner; Vanhaelemeersch, Serge (2005) -
Integration challenges for multi-gate devices
Collaert, Nadine; Brus, Stephan; De Keersgieter, An; Dixit, Abhisek; Ferain, Isabelle; Goodwin, Michael; Kottantharayil, Anil; Rooyackers, Rita; Verheyen, Peter; Yim, Yong Sik; Zimmerman, Paul; Beckx, Stephan; Degroote, Bart; Demand, Marc; Kim, Myeong-Cheol; Kunnen, Eddy; Locorotondo, Sabrina; Mannaert, Geert; Neuilly, Francois; Shamiryan, Denis; Baerts, Christina; Ercken, Monique; Laidler, David; Leys, Frederik; Loo, Roger; Lisoni, Judit; Snow, Jim; Vos, Rita; Boullart, Werner; Pollentier, Ivan; De Gendt, Stefan; De Meyer, Kristin; Jurczak, Gosia; Biesemans, Serge (2005) -
Integration of tall triple-gate devices with inserted TaxNy gate in a 0.274μm² 6T-SRAM cell and advanced CMOS logic circuits
Witters, Liesbeth; Collaert, Nadine; Nackaerts, Axel; Demand, Marc; Demuynck, Steven; Delvaux, Christie; Lauwers, Anne; Baerts, Christina; Beckx, Stephan; Boullart, Werner; Brus, Stephan; Degroote, Bart; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Ercken, Monique; Goodwin, Michael; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Leray, Philippe; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Willems, Patrick; Wouters, Johan M. D.; Jurczak, Gosia; Biesemans, Serge (2005) -
Low temperature plasma-enhanced ALD enables cost-effective spacer defined double patterning (SDDP)
Beynet, Julien; Wong, Patrick; Miller, Andy; Locorotondo, Sabrina; Vangoidsenhoven, Diziana; Yoon, Tae-Ho; Demand, Marc; Park, Hyung-Sang; Vandeweyer, Tom; Sprey, Hessel; Yoo, Yong-Min; Maenhoudt, Mireille (2009) -
Metal inserted poly-Si (MIPS) and FUSI dual metal (TaN and NiSi) CMOS integration
Singanamalla, Raghunath; Van Dal, Mark; Demand, Marc; Shamiryan, Denis; Beckx, Stephan; Jaenen, Patrick; Locorotondo, Sabrina; Yu, HongYu; Hooker, Jacob; Kubicek, Stefan; De Meyer, Kristin; Biesemans, Serge; Juffermans, Casper; Lander, Rob (2007-04) -
Monocrystalline floating gate structure for ultimate NAND flash scaling towards the 12nm node
Blomme, Pieter; Cacciato, Antonio; Degraeve, Robin; Locorotondo, Sabrina; Vrancken, Christa; Kar, Gouri Sankar; Debusschere, Ingrid; Van Houdt, Jan (2012) -
On the scalability of source/drain current enhancement in thin film sSOI
Augendre, Emmanuel; Eneman, Geert; De Keersgieter, An; Simons, Veerle; De Wolf, Ingrid; Ramos, Javier; Brus, Stephan; Pawlak, Bartek; Severi, Simone; Leys, Frederik; Sleeckx, Erik; Locorotondo, Sabrina; Ercken, Monique; de Marneffe, Jean-Francois; Fei, Lu; Seacrist, Mike; Kellerman, Bruce; Goodwin, Michael; Jurczak, Gosia; Biesemans, Serge (2005) -
Overbake: sub-40-nm gate patterning with ArF lithography and binary masks
Van Steenwinckel, David; Kwinten, Hans; Locorotondo, Sabrina; Beckx, Stephan (2004) -
Phosphorus doped SiC source drain and SiGe channel for scaled bulk FinFETs
Togo, Mitsuhiro; Lee, Jae Woo; Pantisano, Luigi; Chiarella, Thomas; Ritzenthaler, Romain; Krom, Raymond; Hikavyy, Andriy; Loo, Roger; Rosseel, Erik; Brus, Stephan; Maes, J.W.; Machkaoutsan, Vladimir; Tolle, J.; Eneman, Geert; De Keersgieter, An; Boccardi, Guillaume; Mannaert, Geert; Altamirano Sanchez, Efrain; Locorotondo, Sabrina; Demand, Marc; Horiguchi, Naoto; Thean, Aaron (2012) -
Profile optimization for dry etched Ge-containing Si-gates
Locorotondo, Sabrina; Shamiryan, Denis; Paraschiv, Vasile; Brus, Stephan; Kottantharayil, Anil; Beckx, Stephan; Boullart, Werner (2005) -
Record low contact resistivity to n-type Ge for CMOS and memory applications
Martens, Koen; Firrincieli, Andrea; Rooyackers, Rita; Vincent, Benjamin; Loo, Roger; Locorotondo, Sabrina; Rosseel, Erik; Vandeweyer, Tom; Hellings, Geert; De Jaeger, Brice; Meuris, Marc; Favia, Paola; Bender, Hugo; Douhard, Bastien; Delmotte, Joris; Vandervorst, Wilfried; Simoen, Eddy; Jurczak, Gosia; Wouters, Dirk; Kittl, Jorge (2010) -
RMG Technology Integration in FinFET Devices
Boccardi, Guillaume; Ritzenthaler, Romain; Togo, Mitsuhiro; Chiarella, Thomas; Kim, Min-Soo; Sasaki, Yuichiro; Veloso, Anabela; Chew, Soon Aik; Vecchio, Emma; Locorotondo, Sabrina; Devriendt, Katia; Ong, Patrick; Brus, Stephan; Horiguchi, Naoto; Thean, Aaron (2012) -
Strain enhanced FUSI/HfSiON technology with optimized CMOS process window
Veloso, Anabela; Verheyen, Peter; Vos, Rita; Brus, Stephan; Ito, Satoru; Mitsuhashi, Riichirou; Paraschiv, Vasile; Shi, Xiaoping; Onsia, Bart; Arnauts, Sophia; Loo, Roger; Lauwers, Anne; Conard, Thierry; de Marneffe, Jean-Francois; Goossens, Danny; Baute, Debbie; Locorotondo, Sabrina; Chiarella, Thomas; Kerner, Christoph; Vrancken, Christa; Mertens, Sofie; O'Sullivan, Barry; Yu, HongYu; Chang, Shou-Zen; Niwa, Masaaki; Kittl, Jorge; Absil, Philippe; Jurczak, Gosia; Hoffmann, Thomas Y.; Biesemans, Serge (2007) -
Sub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniques
Vleeming, Bert; Maenhoudt, Mireille; Quaedackers, John; van der Heijden, Eddy; de Haas, Paul; Uzunbajakau, Siarhei; Meessen, Jeroen; Dicker, Gerald; Finders, Jo; Dusa, Mircea; Jaenen, Patrick; Locorotondo, Sabrina (2007) -
Ultra thin hybrid floating gate and high-k dielectric as IGD enabler of highly scaled planar NAND flash technology
Kar, Gouri Sankar; Breuil, Laurent; Blomme, Pieter; Hody, Hubert; Locorotondo, Sabrina; Jossart, Nico; Richard, Olivier; Bender, Hugo; Van den Bosch, Geert; Debusschere, Ingrid; Van Houdt, Jan (2012)