Browsing by author "Jaenen, Patrick"
Now showing items 21-40 of 51
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Implementation of ArF resist processes for 130nm and below
Goethals, Mieke; Van Roey, Frieda; Vandenberghe, Geert; Jaenen, Patrick; Pollers, Ingrid; Pollentier, Ivan; Ronse, Kurt (2000) -
Implementation of high-K and metal gate materials for the 45nm node and beyond: gate patterning development
Beckx, Stephan; Demand, Marc; Locorotondo, Sabrina; Henson, K.; Claes, Martine; Paraschiv, Vasile; Shamiryan, Denis; Jaenen, Patrick; Boullart, Werner; De Gendt, Stefan; Biesemans, Serge; Vanhaelemeersch, Serge; Vertommen, Johan; Coenegrachts, Bart (2004) -
Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development
Beckx, Stephan; Demand, Marc; Locorotondo, Sabrina; Henson, Kirklen; Claes, Martine; Paraschiv, Vasile; Shamiryan, Denis; Jaenen, Patrick; Boullart, Werner; De Gendt, Stefan; Biesemans, Serge; Vanhaelemeersch, Serge; Vertommen, Johan; Coenegrachts, Bart (2005-06) -
Improvement of the focus-exposure latitude using optimised illumination and mask design
Pforr, Rainer; Ronse, Kurt; Jaenen, Patrick; Jonckheere, Rik; Van den hove, Luc; van Oorschot, P.; Luehrman, P. (1994) -
Integration challenges of Cu pillars with extreme wafer thinning for 3D stacking and packaging
Buisson, Thibault; Potoms, Goedele; Phommahaxay, Alain; Verbinnen, Greet; Jaenen, Patrick; La Manna, Antonio; Travaly, Youssef; Beyne, Eric (2011) -
Integration of tall triple-gate devices with inserted TaxNy gate in a 0.274μm² 6T-SRAM cell and advanced CMOS logic circuits
Witters, Liesbeth; Collaert, Nadine; Nackaerts, Axel; Demand, Marc; Demuynck, Steven; Delvaux, Christie; Lauwers, Anne; Baerts, Christina; Beckx, Stephan; Boullart, Werner; Brus, Stephan; Degroote, Bart; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Ercken, Monique; Goodwin, Michael; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Leray, Philippe; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Willems, Patrick; Wouters, Johan M. D.; Jurczak, Gosia; Biesemans, Serge (2005) -
Introducing 193 nm lithography
Pollers, Ingrid; Jaenen, Patrick; Van Roey, Frieda; Goethals, Mieke; Ronse, Kurt; Davies, G.; Heskamp, B.; Bakker, H.; McCoo, E.; Mulkens, J.; Stoeldraijer, J.; Sytsma, J.; Van der Vleuten, B.; Vleeming, Bert; Tzviatkov, Plamen; Van Driessche, Veerle; Slater, S. (1998) -
Investigation of poly-Si/HfO2 gate stacks in a self-aligned 70nm MOS process flow
Kubicek, Stefan; Chen, Jerry; Ragnarsson, Lars-Ake; Carter, Richard; Kaushik, Vidya; Lujan, Guilherme; Cartier, Eduard; Henson, Kirklen; Pantisano, Luigi; Beckx, Stephan; Jaenen, Patrick; Boullart, Werner; Caymax, Matty; De Gendt, Stefan; Heyns, Marc; De Meyer, Kristin (2003) -
Issues for megasonic cleaning without damaging
Vereecke, Guy; Holsteyns, Frank; Arnauts, Sophia; Beckx, Stephan; Jaenen, Patrick; Kenis, Karine; Lismont, Mark; Lux, Marcel; Vos, Rita; Snow, Jim; Mertens, Paul (2005) -
Mask absorber for next generation EUV lithography
Wu, Meiyi; Thakare, Devesh; De Marneffe, Jean-Francois; Jaenen, Patrick; Souriau, Laurent; Opsomer, Karl; Soulie, Jean-Philippe; Erdmann, Andreas; Mesilhy, Hazem; Naujok, Philipp; Foltin, Markus; Soltwisch, Victor; Saadeh, Qais; Philipsen, Vicky (2020) -
Metal inserted poly-Si (MIPS) and FUSI dual metal (TaN and NiSi) CMOS integration
Singanamalla, Raghunath; Van Dal, Mark; Demand, Marc; Shamiryan, Denis; Beckx, Stephan; Jaenen, Patrick; Locorotondo, Sabrina; Yu, HongYu; Hooker, Jacob; Kubicek, Stefan; De Meyer, Kristin; Biesemans, Serge; Juffermans, Casper; Lander, Rob (2007-04) -
Microbump lithography for 3D stacking applications
Jaenen, Patrick; Slabbekoorn, John; Miller, Andy; Flack, Warren W.; Ranjan, Manish; Kenyon, Gareth; Hsieh, Robert; Nguyen, Ha-Ai (2013) -
NA/sigma optimisation strategies for an advanced DUV stepper applied to 0.25 mm and sub-0.25 mm critical levels
Op de Beeck, Maaike; Ronse, Kurt; Ghandehari, Kouros; Jaenen, Patrick; Botermans, Harry; Finders, Jo; Lilygren, John; Baker, Daniel; Vandenberghe, Geert; De Bisschop, Peter; Maenhoudt, Mireille; Van den hove, Luc (1997) -
Optical proximity correction for 0.3 μm i-line lithography
Yen, Anthony; Tzviatkov, Plamen; Wong, Alfred; Juffermans, Casper; Jonckheere, Rik; Jaenen, Patrick; Garofalo, J.; Otto, O.; Ronse, Kurt; Van den hove, Luc (1996) -
Optimisation of bottom-ARC processes with respect to CD control
Op de Beeck, Maaike; Vandenberghe, Geert; Jaenen, Patrick; Zhang, Fenghong; Delvaux, Christie; Van Puyenbroeck, Ilse; Ronse, Kurt; Lamb, J. E.; van der Hilst, J. B. C. (1998) -
Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
Dusa, Mircea; Quaedackers, John; Larsen, Olaf F.A.; Meessen, J.; van der Heijden, Eddy; Dicker, Gerald; Wismans, Onno; de Haas, Paul; van Ingen Schenau, Koen; Finders, Jo; Vleeming, Bert; Storms, Greet; Jaenen, Patrick; Cheng, Shaunee; Maenhoudt, Mireille (2007) -
Recent advancements in 193 nm step and scan lithography
Goethals, Mieke; Jaenen, Patrick; Pollers, Ingrid; Van Roey, Frieda; Ronse, Kurt; Heskamp, B.; Davies, G. (1999) -
Reduction of mask induced CD errors by optical proximity correction
Randall, John; Tritchkov, Alexander; Jonckheere, Rik; Jaenen, Patrick; Ronse, Kurt (1998) -
Silicon nanophotonic wire structures fabricated by 193nm optical lithography
Selvaraja, Shankar; Jaenen, Patrick; Beckx, Stephan; Bogaerts, Wim; Dumon, Pieter; Van Thourhout, Dries; Baets, Roel (2007-10) -
Silicon-on-insulator nanophotonics
Bogaerts, Wim; Dumon, Pieter; Jaenen, Patrick; Wouters, Johan M. D.; Beckx, Stephan; Wiaux, Vincent; Van Thourhout, Dries; Taillaert, D.; Luyssaert, B.; Baets, Roel (2005-09)