Browsing by imec author "8c38dd5e192a931bf45f91c2074997a23f8a79b1"
Now showing items 21-40 of 106
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Defect characterization of EUV Self-Aligned Litho-Etch Litho-Etch (SALELE) patterning scheme for advanced nodes
Sah, Kaushik; Cross, Andrew; Das, Sayantan; Blanco, Victor; Kljucar, Luka; Halder, Sandip; Leray, Philippe (2021) -
Defect detection and classification on imec iN5 node BEoL test vehicle with multibeam scanning electron microscope
Neumann, Jens Timo; Srikantha, Abhilash; Huethwohl, Philipp; Lee, Keumsil; William, B. James; Korb, Thomas; Foca, Eugen; Garbowski, Tomasz; Boecker, Daniel; Das, Sayantan; Halder, Sandip (2023) -
Defect detection and classification on imec iN5 node BEoL test vehicle with MultiSEM
Neumann, Jens Timo; Srikantha, Abhilash; Huthwohl, Philipp; Lee, Keumsil; William, James B.; Korb, Thomas; Foca, Eugen; Garbowski, Tomasz; Boecker, Daniel; Das, Sayantan; Halder, Sandip (2022) -
Defect-free isolation on high-thermal-conductivity SOI substrates for complementary BiCMOS technology
Van Wichelen, Koen; Ong, Patrick; Moussa, Alain; Radisic, Dunja; Devriendt, Katia; Halder, Sandip; Kenis, Karine; Lee, Willie; Vandevelde, Bart; Soonekindt, Christophe; Shahar, Abdul Hadi; Smet, Tom; Van Huylenbroeck, Stefaan; Decoutere, Stefaan; Seacrist, Mike; Ries, Mike; Drobny, Vladimir; Wise, Rick (2009) -
Design-based metrology: beyond CD/EPE metrics to evaluate printability performance
Halder, Sandip; Mailfert, Julien; Leray, Philippe; Rio, David; Peng, Hsin-Ying; Laenens, Bart (2016) -
Detection, binning, and analysis of defects in a GaN-on-Si process for high brightness light emitting diodes
Halder, Sandip; Miller, Andy; Osman, Haris; Dutta, Barundeb; Mani, Antonio; Jones, Chris; McCance, Syd; Burkeen, Frank (2012) -
e-beam metrology of thin resist for high NA EUVL
Lorusso, Gian; De Simone, Danilo; Zidan, Mohamed; Severi, Joren; Moussa, Alain; Dey, Bappaditya; Halder, Sandip; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; De Gendt, Stefan; Leray, Philippe (2023) -
E-beam metrology-based EUVL aberration monitoring
Kang, Seulki; Miura, Yuji; Maruyama, Kotaro; Yamazaki, Yuichiro; Wei, Chih-, I; Maguire, Ethan; Fenger, Germain; De Bisschop, Peter; Das, Sayantan; Halder, Sandip; Lorusso, Gian (2022) -
E-TEST validation of EPE budget and metrology
De Poortere, Etienne; Schelcher, Guillaume; Kissoon, Nicola; Paolillo, Sara; Tabery, Cyrus; Halder, Sandip; Leray, Philippe; Mulkens, Jan; McManus, Moyra (2020) -
E-test validation of space error budget and metrology
Schelcher, Guillaume; De Poortere, Etienne P.; Kissoon, Nicola; Paolillo, Sara; e Silva, Marsil A. C.; Zhang, Yichen; Tabery, Cyrus; Mulkens, Jan; McManus, Moyra; Leray, Philippe; Halder, Sandip (2022-06-30) -
EPE analysis of sub-N10 BEOL structures with Coventor's SEMulator3D
Franke, Joern-Holger; Murdoch, Gayle; Halder, Sandip (2017) -
Estimation of the adhesion strength of particles/residues and gate structures for calculating the damage threshold of patterned silicon wafers during physical force assisted cleans
Halder, Sandip; Kim, Tae-Gon; Vos, Rita; Kenis, Karine; Claes, Martine; De Gendt, Stefan; Mertens, Paul (2010) -
EUV based multi-patterning schemes for advanced DRAM nodes
Das, Sayantan; Sah, Kaushik; Fallica, Roberto; Chen, Zhijin; Halder, Sandip; Cross, Andrew; De Simone, Danilo; Treska, Fergo; Leray, Philippe; Kim, Ryan Ryoung han; Maguire, Ethan; Wei, Chih-, I; Fenger, Germain; Lafferty, Neal; Lee, Jeonghoon (2022) -
EUV lithography qualification: Comparison of alternative wafer inspection methodologies and sensitivities
Halder, Sandip; Leray, Philippe (2018) -
EUV single exposure Tip-to-Tip variability control through PEB process optimization in BEOL layers
Roy, Syamashree; Caron, Elke; Santos, Andreia; Franke, Joern-Holger; Vandereyken, Jelle; Halder, Sandip (2023) -
EUV stochastic defect monitoring with advanced broadband optical wafer inspection and e-beam review systems
Sah, Kaushik; Cross, Andrew; Plihal, Martin; Anantha, Vidyasagar; Babulnath, Raghav; Fung, Derek; De Bisschop, Peter; Halder, Sandip (2018) -
Evaluation of post ion-implantation resist strip with the background signal of a light scattering tool
Halder, Sandip; Vos, Rita; Wada, Masayuki; Tsvetanova, Diana; Claes, Martine; Mertens, Paul; Radovanovic, Sanda; Dighe, Prasanna; Amann, Christophe; Simpson, Gavin; Polli, Marco (2010) -
Exploration of BEOL line-space patterning options at 12nm half-pitch and below
Decoster, Stefan; Lazzarino, Frederic; Petersen Barbosa Lima, Lucas; Li, Waikin; Versluijs, Janko; Halder, Sandip; Mallik, Arindam; Murdoch, Gayle (2018) -
Extraction of Roughness Measurements from Thin Resists with Low Signal-to-Noise-Ratio (SNR) SEM Images by Applying Deep Learning Denoiser
Zidan, Mohamed; Dey, Bappaditya; De Simone, Danilo; Severi, Joren; Charley, Anne-Laure; Halder, Sandip; Leray, Philippe; De Gendt, Stefan; Lorusso, Gian (2022) -
GaN-on-Si process defect detection and analysis for HB-LEDs and power devices
Halder, Sandip; Stiers, Karen; Kandaswamy, Prem Kumar; Rosmeulen, Maarten; Carbonell, Laure; Saripalli, Yoga; Osman, Haris; Rosseel, Erik; Mani, Antonio; Hu, Qiona; Vedula, Srinivas; Polli, Marco (2013)