Browsing by author "Vrancken, Christa"
Now showing items 21-40 of 105
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Compositional study of BaSrTiO thin films for memory application
Tomida, Kazuyuki; Opsomer, Karl; Vrancken, Christa; Matero, Raija; Tois, Eva; Kaczer, Ben; Pawlak, Malgorzata; Popovici, Mihaela Ioana; Swerts, Johan; Van Elshocht, Sven; Detavernier, Christophe; Kim, Min-Soo; Debusschere, Ingrid; Altimime, Laith; Kittl, Jorge (2010) -
Controlled growth of rutile TiO2 by atomic layer deposition on oxidized ruthenium
Popovici, Mihaela Ioana; Swerts, Johan; Tomida, Kazuyuki; Radisic, Dunja; Kim, Min-Soo; Kaczer, Ben; Richard, Olivier; Bender, Hugo; Delabie, Annelies; Moussa, Alain; Vrancken, Christa; Opsomer, Karl; Franquet, Alexis; Pawlak, Malgorzata; Schaekers, Marc; Altimime, Laith; Van Elshocht, Sven; Kittl, Jorge (2011) -
Cost effective low Vt Ni-FUSI CMOS on SiON by means of Al implant (pMOS) and Yb+P implant (nMOS)
Lauwers, Anne; Veloso, Anabela; Chang, Shou-Zen; Yu, HongYu; Hoffmann, Thomas Y.; Kerner, Christoph; Demand, Marc; Rothschild, Aude; Niwa, Masaaki; Satoru, Ito; Mitshashi, Riichirou; Ameen, Mike; Whittemore, Graham; Pawlak, Malgorzata; Vrancken, Christa; Demeurisse, Caroline; Mertens, Sofie; Vandervorst, Wilfried; Absil, Philippe; Biesemans, Serge; Kittl, Jorge (2008) -
Demonstration of asymmetric gate-oxide thickness four-terminal FinFETs having flexible threshold voltage and good subthreshold slope
Masahara, Meishoku; Surdeanu, Radu; Witters, Liesbeth; Doornbos, Gerben; Nguyen Hoang, Viet; Van den Bosch, Geert; Vrancken, Christa; Devriendt, Katia; Neuilly, Francois; Kunnen, Eddy; Jurczak, Gosia; Biesemans, Serge (2007-03) -
Demonstration of phase-controlled Ni-FUSI CMOSFETs employing SiON dielectrics capped with sub-monolayer ALD HfSiON for low power applications
Yu, HongYu; Chang, Shou-Zen; Veloso, Anabela; Lauwers, Anne; Delabie, Annelies; Everaert, Jean-Luc; Singanamalla, Raghunath; Kerner, Christoph; Vrancken, Christa; Brus, Stephan; Absil, Philippe; Hoffmann, Thomas; Biesemans, Serge (2007-09) -
Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; De Keersgieter, An; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Baudemprez, Bart; Vandeweyer, Tom; Van Roey, Frieda; Baerts, Christina; Goossens, Danny; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Dusa, Mircea; Romijn, Leon; Pigneret, Charles; van Dijk, Andre; Schreutelkamp, Rob; Cockburn, Andrew; Gravey, Virginie; Meiling, H.; Hultermans, B.; Lok, S.; Shah, K.; Rajagopalan, R.; Gelatos, J.; Richard, Olivier; Bender, Hugo; Vandenberghe, Geert; Beyer, Gerald; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2009-12) -
Development of a metal gate and silicon selective "dry ash only" process for combined extension and halo implanted photo resist
Mannaert, Geert; Baklanov, Mikhaïl; Goossens, Danny; Vrancken, Christa; Boullart, Werner (2008) -
Direct evidence of linewidth effect: Ni31Si12 and Ni3Si formation on 25 nm Ni fully silicided gates
Kittl, Jorge; Lauwers, Anne; Demeurisse, Caroline; Vrancken, Christa; Kubicek, Stefan; Absil, Philippe; Biesemans, Serge (2007) -
Direct SiGe BFFT patterning by dry plasma etching
Milenin, Alexey; Witters, Liesbeth; Deweerdt, Bruno; Vrancken, Christa; Demand, Marc (2012) -
Dry etch of Yb-doped poly-Si gates for low Vt FUSI devices
Demand, Marc; Paraschiv, Vasile; Shamiryan, Denis; Vrancken, Christa; Brus, Stephan; Veloso, Anabela; Boullart, Werner (2007) -
Electrical performance and scalability of Ni-monosilicide towards sub 0.13 μm technologies
Lauwers, A.; de Potter de ten Broeck, Muriel; Lindsay, Richard; Steegen, An; Roelandts, Nico; Lossen, F.; Vrancken, Christa; Maex, Karen (2001) -
Enabling 3X nm DRAM: Record low leakage 0.4 nm EOT MIM capacitors with novel stack engineering
Pawlak, Malgorzata; Popovici, Mihaela Ioana; Swerts, Johan; Tomida, Kazuyuki; Kim, Min-Soo; Kaczer, Ben; Opsomer, Karl; Schaekers, Marc; Favia, Paola; Bender, Hugo; Vrancken, Christa; Govoreanu, Bogdan; Demeurisse, Caroline; Wang, Wan-Chih; Afanasiev, Valeri; Debusschere, Ingrid; Altimime, Laith; Kittl, Jorge (2010) -
Etch of Yb-doped poly gates to achieve low vt Ni-FUSI CMOS
Demand, Marc; Paraschiv, Vasile; Shamiryan, Denis; Veloso, Anabela; Vrancken, Christa; Brus, Stephan; Boullart, Werner (2007) -
Evaluation of transmission line model structures for silicide-to-silicon specific contact resistance extraction
Stavitski, Natalie; Van Dal, Mark J.H.; Lauwers, Anne; Vrancken, Christa; Kovalgin, Alexey Y.; Wolters, Rob A.M. (2008) -
Experimental investigation of optimum gate workfunction for CMOS four-terminal muligate MOSFETs (MUGFETs)
Masahara, Meishoku; Surdeanu, Radu; Witters, Liesbeth; Doornbos, Gerben; Nguyen Hoang, Viet; Van den Bosch, Geert; Vrancken, Christa; Jurczak, Gosia; Biesemans, Serge (2007) -
First demonstration of 15nm-WFIN inversion-mode relaxed germanium bulk nFinFET with Si-cap free RMG and NiSiGe source/drain
Mitard, Jerome; Witters, Liesbeth; Arimura, Hiroaki; Sasaki, Yuichiro; Milenin, Alexey; Loo, Roger; Hikavyy, Andriy; Eneman, Geert; Lagrain, Pieter; Mertens, Hans; Sioncke, Sonja; Vrancken, Christa; Bender, Hugo; Barla, Kathy; Horiguchi, Naoto; Mocuta, Anda; Collaert, Nadine; Thean, Aaron (2014) -
First demonstration of vertically stacked gate-all-around highly strained germanium nanowire pFETs
Capogreco, Elena; Witters, Liesbeth; Arimura, Hiroaki; Sebaai, Farid; Porret, Clément; Hikavyy, Andriy; Loo, Roger; Milenin, Alexey; Eneman, Geert; Favia, Paola; Bender, Hugo; Wostyn, Kurt; Dentoni Litta, Eugenio; Schulze, Andreas; Vrancken, Christa; Opdebeeck, Ann; Mitard, Jerome; Langer, Robert; Holsteyns, Frank; Waldron, Niamh; Barla, Kathy; De Heyn, Vincent; Mocuta, Dan; Collaert, Nadine (2018-11) -
First demonstration of vertically-stacked gate-all-around highly-strained germanium nanowire p-FETs
Capogreco, Elena; Witters, Liesbeth; Arimura, Hiroaki; Sebaai, Farid; Porret, Clément; Hikavyy, Andriy; Loo, Roger; Milenin, Alexey; Eneman, Geert; Favia, Paola; Bender, Hugo; Wostyn, Kurt; Dentoni Litta, Eugenio; Schulze, Andreas; Vrancken, Christa; Opdebeeck, Ann; Mitard, Jerome; Langer, Robert; Holsteyns, Frank; Waldron, Niamh; Barla, Kathy; De Heyn, Vincent; Mocuta, Dan; Collaert, Nadine (2018) -
Four-terminal FinFET device technology
Masahara, Meishoku; Endo, K.; Liu, Y.X.; O'uchi, S.; Matsukawa, T.; Surdeanu, Radu; Witters, Liesbeth; Doornbos, Gerben; Nguyen Hoang, Viet; Van den Bosch, Geert; Vrancken, Christa; Jurczak, Gosia; Biesemans, Serge; Suzuki, E. (2007) -
Full-field EUV and immersion lithography integration in 0.186μm² FinFET 6T-SRAM cell
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Demand, Marc; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Keersgieter, An; Delvaux, Christie; De Backer, Johan; Brus, Stephan; Hermans, Jan; Baudemprez, Bart; Van Roey, Frieda; Lorusso, Gian; Baerts, Christina; Goossens, Danny; Vrancken, Christa; Mertens, Sofie; Versluijs, Janko; Truffert, Vincent; Huffman, Craig; Laidler, David; Heylen, Nancy; Ong, Patrick; Parvais, Bertrand; Rakowski, Michal; Verhaegen, Staf; Hikavyy, Andriy; Meiling, H.; Hultermans, B.; Romijn, L.; Pigneret, C.; Lok, S.; Van Dijk, A.; Shah, K.; Noori, A.; Gelatos, J.; Arghavani, R.; Schreutelkamp, Rob; Boelen, Pieter; Richard, Olivier; Bender, Hugo; Witters, Liesbeth; Collaert, Nadine; Rooyackers, Rita; Absil, Philippe; Lauwers, Anne; Jurczak, Gosia; Hoffmann, Thomas Y.; Vanhaelemeersch, Serge; Cartuyvels, Rudi; Ronse, Kurt; Biesemans, Serge (2008)