Browsing by author "Caymax, Matty"
Now showing items 41-60 of 829
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Alternative catalysts for Si-technology compatible growth of Si nanowires
Iacopi, Francesca; Vereecken, Philippe; Schaekers, Marc; Caymax, Matty; Moelans, Nele; Blanpain, Bart; Detavernier, C.; D'Haen, Jan; Griffiths, Hefin (2007) -
Alternative catalysts for si-technology compatible growth of si nanowires
Iacopi, Francesca; Vereecken, Philippe; Schaekers, Marc; Caymax, Matty; Moelans, Nele; Blanpain, Bart; Detavernier, C.; D'Haen, Jan; Griffiths, Hefin (2007) -
Alternative gate insulator materials for future generation MOSFETs
Heyns, Marc; Bender, Hugo; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; De Witte, Hilde; Groeseneken, Guido; Haukka, S.; Henson, Kirklen; Houssa, Michel; Kubicek, Stefan; Maes, Jos; Naili, Mohamed; Nohira, Hiroshi; Tsai, Wilman; Tuominen, Marko; Vandervorst, R.; Wilhelm, Rudi; Young, Edward; Zhao, Chao (2001) -
Ammonium sulfide vapor passivation of In0.53Ga0.47As and InP surfaces
Alian, AliReza; Brammertz, Guy; Merckling, Clement; Firrincieli, Andrea; Wang, Wei-E; Lin, Dennis; Caymax, Matty; Meuris, Marc; De Meyer, Kristin; Heyns, Marc (2011) -
Amorphous inclusions during Ge and GeSn epitaxial growth via chemical vapor deposition
Gencarelli, Federica; Shimura, Yosuke; Kumar, Arul; Vincent, Benjamin; Moussa, Alain; Vanhaeren, Danielle; Richard, Olivier; Bender, Hugo; Vandervorst, Wilfried; Caymax, Matty; Loo, Roger; Heyns, Marc (2015) -
An (un)solvable problem in SIMS: B-interfacial profiling
Vandervorst, Wilfried; Janssens, Tom; Loo, Roger; Caymax, Matty; Peytier, Ivan; Lindsay, Richard; Fruehauf, Jens; Bergmaier, A.; Dollinger, G. (2003) -
An improved technology for elevated source/drain MOSFETS
Waite, Andrew Michael; Howard, Dave; Kubicek, Stefan; Caymax, Matty; De Meyer, Kristin; Evans, A. G. R. (1997) -
An InGaAs/InP quantum well FinFET using the replacement fin process integrated in an RMG flow on 300mm Si substrates
Waldron, Niamh; Merckling, Clement; Guo, Weiming; Ong, Patrick; Teugels, Lieve; Ansar, Sheikh; Tsvetanova, Diana; Sebaai, Farid; van Dorp, Dennis; Milenin, Alexey; Lin, Dennis; Nyns, Laura; Mitard, Jerome; Pourghaderi, Mohammad Ali; Douhard, Bastien; Richard, Olivier; Bender, Hugo; Boccardi, Guillaume; Caymax, Matty; Heyns, Marc; Vandervorst, Wilfried; Barla, Kathy; Collaert, Nadine; Thean, Aaron (2014) -
An investigation of growth and properties of Si capping layers used in advanced SiGe/Ge based pMOS transistors
Hikavyy, Andriy; Witters, Liesbeth; Mitard, Jerome; Vanherle, Wendy; Vandervorst, Wilfried; Dekoster, Johan; Loo, Roger; Caymax, Matty (2012) -
An ultra-short InP nanowire laser monolithic integrated on (001) silicon substrate
Wang, Zhechao; Tian, Bin; Paladugu, Mohan; Pantouvaki, Marianna; Merckling, Clement; Guo, Weiming; Dekoster, Johan; Caymax, Matty; Van Campenhout, Joris; Absil, Philippe; Van Thourhout, Dries (2013) -
Analysis of junctions formed in strained Si/SiGe substrates
Eneman, Geert; Simoen, Eddy; Lauwers, Anne; Lindsay, Richard; Verheyen, Peter; Delhougne, Romain; Loo, Roger; Caymax, Matty; Meunier-Beillard, Philippe; Demuynck, Steven; De Meyer, Kristin; Vandervorst, Wilfried (2004) -
Analysis of selectively grown epitaxial Si1-xGex by spectroscopic ellipsometry and comparison with other established techniques
Loo, Roger; Caymax, Matty; Libezny, Milan; Blavier, G.; Brijs, Bert; Geenen, Luc; Vandervorst, Wilfried (2000) -
Analysis of selectively grown epitaxial Si1-xGex by spectroscopic ellipsometry and comparison with RBS and SIMS
Loo, Roger; Caymax, Matty; Libezny, Milan; Blavier, G.; Brijs, Bert; Geenen, Luc; Vandervorst, Wilfried (1999) -
Analysis of the structural properties of polycrystalline silicon germanium films
Sedky, Sherif; Fiorini, Paolo; Loreti, S.; Caymax, Matty; Baert, Kris; Van Hoof, Chris (1999) -
Anomalous low-temperature dopant diffusion from in-situ doped polycrystalline and epitaxial Si layers into the monocrystalline Si substrate
Caymax, Matty; Baert, Kris; Poortmans, Jef; Vandervorst, Wilfried (1994) -
Application of electron channeling contrast imaging to 3D semiconductor structures through proper detector configurations
Han, Han; Hantschel, Thomas; Strakos, Libor; Vystavel, Tomas; Baryshnikova, Marina; Mols, Yves; Kunert, Bernardette; Langer, Robert; Vandervorst, Wilfried; Caymax, Matty (2020) -
Application of HCl etch in the production of novel devices
Hikavyy, Andriy; Rooyackers, Rita; Verheyen, Peter; Vellianitis, Georgios; Van Dal, Mark; Lander, Rob; Loo, Roger; Caymax, Matty (2008) -
Application of industrial processing techniques to thin-film crystalline solar cells on highly doped defected silicon substrates
Vermeulen, Tom; Poortmans, Jef; Caymax, Matty; Duerinckx, Filip; Maene, Sigrid; Szlufcik, Jozef; Nijs, Johan; Mertens, Robert; Mason, N. B.; Bruton, T. M. (1998) -
Application of x-ray fluorescence spectrometry in charaterization of high-k uktra-thin films
Zhao, Chao; Brijs, Bert; Dortu, Fabian; De Gendt, Stefan; Caymax, Matty; Heyns, Marc; Besling, W.; Maes, Jan (2003) -
Aqueous chemical solution deposition and characterization of ultrathin high-k dielectric metal oxide films
Hardy, An; Van Elshocht, Sven; Van Bael, Marlies; D'Haen, Jan; Douheret, Olivier; De Gendt, Stefan; Adelmann, Christoph; Caymax, Matty; Conard, Thierry; Witters, Thomas; D'Olieslaeger, Marc; Heyns, Marc; Mullens, J (2007)