Browsing imec Publications by imec author "ca8923bd1cf5844f670a6c2084649943e68b4036"
Now showing items 1-14 of 14
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28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography
Kim, Il Hwan; Kim, Insung; Park, Changmin; Lee, Jsiun; Ryu, Koungmin; De Schepper, P.; Doise, J.; Kocsis, M.; De Simone, Danilo; Kljucar, Luka; Das, Poulomi; Blanc, Romuald; Beral, Christophe; Severi, Joren; Vandenbroeck, Nadia; Foubert, Philippe; Charley, Anne-Laure; Oak, Apoorva; Xu, Dongbo; Gillijns, Werner; Mitard, Jerome; Tokei, Zsolt; van der Veen, Marleen; Heylen, Nancy; Teugels, Lieve; Le, Quoc Toan; Schleicher, Filip; Leray, Philippe; Ronse, Kurt (2021) -
Characterization and mitigation of 3D mask effects
Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Philipsen, Vicky; Luong, Vu; Hendrickx, Eric (2017) -
Characterization and mitigation of 3D mask effects in EUV lithography
Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Luong, Vu; Philipsen, Vicky; Hendrickx, Eric (2016) -
Concurrent design rule, OPC and process optimization in EUV lithography
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Lee, Jae Uk; Kim, Ryan Ryoung han (2020) -
Design and Mask Optimization Toward Low Dose EUV Exposure
Xu, Dongbo; Gillijns, Werner; Kim, Ryan Ryoung han (2022-05-26) -
EUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nm
Tan, Ling Ee; Gillijns, Werner; Lee, Jae Uk; Xu, Dongbo; Van de Kerkhove, Jeroen; Philipsen, Vicky; Kim, Ryan Ryoung han (2022-05-26) -
EUV Single Patterning Exploration for Pitch 28 nm
Xu, Dongbo; Gillijns, Werner; Drissi, Youssef; Tan, Ling Ee; Oak, Apoorva; Kim, Ryan Ryoung han (2021-02-22) -
Exploration of alternative absorber materials for EUV lithography: A simulation study
Erdmann, Andreas; Evanschitzky, Peter; Xu, Dongbo; Luong, Vu; Philipsen, Vicky; Hendrickx, Eric (2016) -
Exploration of Alternative Mask for 0.33NA EUV Single Patterning at Pitch 28nm
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Philipsen, Vicky; Kim, Ryan Ryoung han (2021-10-12) -
Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Philipsen, Vicky; Kim, Ryan Ryoung han (2022) -
Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Rio, David; Delorme, Max; Philipsen, Vicky; Kim, Ryan Ryoung han (2022-11-25) -
Investigation of Low-n Mask in 0.33NA EUV Single Patterning at Pitch 28nm Metal Design
Xu, Dongbo; Gillijns, Werner; Tan, Ling Ee; Philipsen, Vicky; Kim, Ryan Ryoung han (2022-05-26) -
NXE:3400 OPC Process Monitoring: Model Validity vs. Process Variability
Xu, Dongbo; Rio, David; Gillijns, Werner; Delorme, Max; Baerts, Christina (2021-02-22) -
Reducing EUV mask 3D effects by alternative metal absorbers
Philipsen, Vicky; Luong, Vu; Souriau, Laurent; Erdmann, Andreas; Xu, Dongbo; Evanschitzky, Peter; Van de Kruijs, Robbert; Edrisi, Arash; Scholze, Frank; Laubis, Christian; Irmscher, Mathias; Naasz, Sandra; Reuter, Christian; Hendrickx, Eric (2017)