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Impact of gate stack processing on the hysteresis of 300 mm integrated WS2 FETs
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Authors
Panarella, Luca
;
Kaczer, Ben
;
Smets, Quentin
;
Verreck, Devin
;
Schram, Tom
;
Cott, Daire
;
Lin, Dennis
;
Tyaginov, Stanislav
;
Asselberghs, Inge
;
Lockhart de la Rosa, Cesar Javier
;
Kar, Gouri Sankar
;
Afanasiev, Valeri
DOI
10.1109/IRPS48203.2023.10117803
EISBN
978-1-6654-5672-2
ISSN
1541-7026
Conference
61st IEEE International Reliability Physics Symposium (IRPS)
Journal
na
Title
Impact of gate stack processing on the hysteresis of 300 mm integrated WS2 FETs
Publication type
Proceedings paper
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Date
Summary
2
20.500.12860/42157.2
*
2023-11-28T08:36:36Z
validation by library/open access desk
1
20.500.12860/42157
2023-07-15T17:05:46Z
*Selected version
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