Browsing Articles by imec author "601a2043b76882ca3e86900dc2c3901e7038dd5b"
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Adhesion and collapse of extreme ultraviolet photoresists and the role of underlayers
Fallica, Roberto; Chen, Steven; De Simone, Danilo; Suh, Hyo Seon (2022) -
Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions
Van Dongen, Kaat; Nye, Rachel; Clerix, Jan-Willem; Sixt, Claudia; De Simone, Danilo; Delabie, Annelies (2023) -
Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography
Severi, Joren; Lorusso, Gian F.; De Simone, Danilo; Moussa, Alain; Saib, Mohamed; Duflou, Rutger; De Gendt, Stefan (2022) -
Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO(2 )area-selective deposition
Nye, Rachel; Van Dongen, Kaat; Oka, Hironori; De Simone, Danilo; Parsons, Gregory N. N.; Delabie, Annelies (2022) -
Dielectric Response Spectroscopy as Means to Investigate Interfacial Effects for Ultra-Thin Film Polymer-Based High NA EUV Lithography
Severi, Joren; De Simone, Danilo; De Gendt, Stefan (2020) -
Dissolution rate monitor tool to measure EUV photoresist dissolution
Vesters, Yannick; De Simone, Danilo; De Gendt, Stefan (2017) -
E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography
Zidan, Mohamed; Lorusso, Gian; De Simone, Danilo; De Silva, Anuja; Haider, Ali; Verveniotis, Elisseos; Moussa, Alain; De Gendt, Stefan (2023) -
e-beam metrology of thin resist for high NA EUVL
Lorusso, Gian; De Simone, Danilo; Zidan, Mohamed; Severi, Joren; Moussa, Alain; Dey, Bappaditya; Halder, Sandip; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; De Gendt, Stefan; Leray, Philippe (2023) -
Effect of molecular weight on the EUV-printability of main chain scission type polymers
Rathore, Ashish; Pollentier, Ivan; Singh, Harpreet; Fallica, Roberto; De Simone, Danilo; De Gendt, Stefan (2020) -
Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography
Rathore, Ashish; Cipriani, Maicol; Huang, Ching-Chung; Amiaud, Lionel; Dablemont, Celine; Lafosse, Anne; Ingolfsson, Oddur; De Simone, Danilo; De Gendt, Stefan (2021) -
Enhancing Performance and Function of Polymethacrylate Extreme Ultraviolet Resists Using Area-Selective Deposition
Nye, Rachel; Van Dongen, Kaat; De Simone, Danilo; OKa, Hironori; Parsons, Gregory N.; Delabie, Annelies (2023) -
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing
Dinh, Cong Que; Nagahara, Seiji; Kuwahara, Yuhei; Dauendorffer, Arnaud; Yoshida, Keisuke; Okada, Soichiro; Onitsuka, Tomoya; Kawakami, Shinichiro; Shimura, Satoru; Muramatsu, Makoto; Yoshihara, Kosuke; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Huli, Lior; Grzeskowiak, Steven; Krawicz, Alexandra; Bae, Nayoung; Kato, Kanzo; Nafus, Kathleen; Raley, Angelique (2022) -
Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists
Fallica, Roberto; Nannarone, Stefano; Mahne, Nicola; Malvezzi, Andrea Marco; Berti, Andrea; De Simone, Danilo (2021) -
Extreme Ultraviolet-Printability and Mechanistic Studies of Engineered Hydrogen Silsesquioxane Photoresist Systems
Rathore, Ashish; Pollentier, Ivan; Cipriani, Maicol; Singh, Harpreet; De Simone, Danilo; Ingolfsson, Oddur; De Gendt, Stefan (2021) -
Feasibility of unzipping polymer polyphthalaldehyde for extreme ultraviolet lithography
Rathore, Ashish; Pollentier, Ivan; Kumar, Sunkuru S.; De Simone, Danilo; De Gendt, Stefan (2021) -
Mask absorber, mask tone, and wafer process impact on resist line-edge-roughness
Ohtomi, Eisuke; Philipsen, Vicky; Welling, Ulrich; Melvin III, Lawrence S.; Takahata, Yosuke; Tanaka, Yusuke; De Simone, Danilo (2023) -
Mean Free Path of Electrons in Organic Photoresists for Extreme Ultraviolet Lithography in the Kinetic Energy Range 20-450 eV
Fallica, Roberto; Mahne, Nicola; Conard, Thierry; Vanleenhove, Anja; de Simone, Danilo; Nannarone, Stefano (2023) -
Metal based materials for EUV lithography
Kosma, Vasiliki; De Simone, Danilo; Vandenberghe, Geert (2019) -
Metal containing resist readiness for HVM EUV lithography
De Simone, Danilo; Mao, Ming; Lazzarino, Frederic; Vandenberghe, Geert (2016) -
Metal sensitizer in chemically amplified EUV resist: a study of sensitivity enhancement and dissolution
Jiang, Jing; De Simone, Danilo; Vandenberghe, Geert (2017)