Browsing Presentations by imec author "41e9f400e7d745491346dcae57e502d389464fd2"
Now showing items 1-18 of 18
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A detailed study of semiconductor wafer drying
Fyen, Wim; Holsteyns, Frank; Bearda, Twan; Arnauts, Sophia; Van Steenbergen, Jan; Doumen, Geert; Kenis, Karine; Mertens, Paul (2004) -
Advanced wafer surface cleaning technology
Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004) -
Cleaning of nanoparticles in semiconductor manufacturing
Vereecke, Guy; Arnauts, Sophia; Doumen, Geert; Eitoku, Atsuro; Fransaer, J.; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Lee, Kuntack; Lux, Marcel; Snow, Jim; Vinckier, Chris; Vos, Rita; Xu, Kaidong; Mertens, Paul (2004) -
Controlled isotropic etches for Gate-All-Around (GAA) device architectures
Muraki, Yusuke; Oniki, Yusuke; Kenis, Karine; Altamirano Sanchez, Efrain; Holsteyns, Frank; Kal, Subhadeep; Alix, Cheryl; Kumar, Kaushik; Mosden, Aelan (2020) -
Correlation between haze of the wafer and particle-count on wafers: a new approach to monitor nano-sized particles
Xu, Kaidong; Vos, Rita; Vereecke, Guy; Lux, Marcel; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Mertens, Paul; Heyns, Marc; Vinckier, Chris (2002) -
Evaluation of megasonic cleaning for sub-90-nm technologies
Vereecke, Guy; Holsteyns, Frank; Arnauts, Sophia; Kenis, Karine; Lux, Marcel; Vos, Rita; Snow, Jim; Mertens, Paul (2004) -
Fin bending in dimensional scaling
Zhang, Liping; Hellin, David; Sepulveda Marquez, Alfonso; Altamirano Sanchez, Efrain; Lazzarino, Frederic; Morin, Pierre; Wang, Shouhua; Hopf, Toby; Kenis, Karine; Lorant, Christophe; Sebaai, Farid; Batuk, Dmitry; Briggs, Basoene; Mertens, Hans; Demuynck, Steven (2020) -
High velocity aerosol cleaning with organic solvents: particle removal and substrate damage
Andreas, Michael; Wostyn, Kurt; Wada, Masayuki; Janssens, Tom; Kenis, Karine; Bearda, Twan; Mertens, Paul (2008) -
Impact of iron contamination and SC1 generated roughness on 5nm gate oxides
De Gendt, Stefan; Knotter, D. M.; Kenis, Karine; Mertens, Paul; Heyns, Marc (1997) -
Influences of oxide loss on contamination removal
Eitoku, Atsuro; Snow, Jim; Vos, Rita; Kenis, Karine; Mertens, Paul (2004) -
Optimization of cleaning processes for 100 nm and smaller design rules
Xu, Kaidong; Vos, Rita; Holsteyns, Frank; Kenis, Karine; Vereecke, Guy; Mertens, Paul; Heyns, Marc (2001) -
Particle removal efficiency and damage analysis of patterned wafers in different solvents after megasonic cleaning
Halder, Sandip; Bearda, Twan; Kenis, Karine; Janssens, Tom; Le, Quoc Toan; Wostyn, Kurt; Leunissen, Peter; Mertens, Paul (2008) -
Process monitoring and qualification of CVD/PVD tools using comprehensivesurface haze information
Holsteyns, Frank; Roels, Jan; Kenis, Karine; Mertens, Paul (2002) -
Removal of nano-particles and structural damage in megasonic cleaning of silicon wafers
Vereecke, Guy; Holsteyns, Frank; Arnauts, Sophia; Kenis, Karine; Lux, Marcel; Vos, Rita; Snow, Jim; Mertens, Paul (2004) -
Surface cleaning issues in thin-oxide technology
Mertens, Paul; Bearda, Twan; Houssa, Michel; Loewenstein, Lee; Teerlinck, Ivo; De Gendt, Stefan; Vos, Rita; Kenis, Karine; Naili, Mohamed; Heyns, Marc (1999) -
The IMEC-Clean: A clean for advanced CMOS manufacturing
Meuris, Marc; Arnauts, Sophia; Cornelissen, Ingrid; Kenis, Karine; Lux, Marcel; De Gendt, Stefan; Mertens, Paul; Teerlinck, Ivo; Vos, Rita; Loewenstein, Lee; Heyns, Marc; Wolke, K. (2000) -
Vapor phase decomposition - droplet collection. Can we improve the collection efficiency for copper contamination?
De Gendt, Stefan; Huber, A.; Onsia, Bart; Arnauts, Sophia; Kenis, Karine; Knotter, D. M.; Mertens, Paul; Heyns, Marc (1998) -
Wafer backside cleaning strategies for high-k/metal gate processing
Vos, Rita; Kesters, Els; Garaud, Sylvain; De Waele, Rita; Kenis, Karine; Lux, Marcel; Kraus, Harald; Snow, Jim; Shamiryan, Denis; Catana, Gabriela; Deweerd, Wim; Schram, Tom; De Gendt, Stefan; Mertens, Paul (2004)