Browsing Presentations by imec author "fcdaa6ac504cb49ec3d87d8e0d3dc23fb681c06f"
Now showing items 1-19 of 19
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A low thermal budget pre metal dielectric stack using PECVD and HDP processing
Schaekers, Marc; De Jaeger, Brice; Sleeckx, Erik; Debusschere, Ingrid; Van Hove, Marleen; Lauwers, A.; Hauf, H. (2001) -
A novel approach to characterization of a low-k dielectric polymer surface
Martin Hoyas, Ana; Schuhmacher, Jorg; Whelan, Caroline; Baklanov, Mikhaïl; Carbonell, Laure; Schaekers, Marc; Celis, Jean-Pierre; Maex, Karen (2002) -
A study of plasma-enhanced CVD growth of Si nanowires catalyzed by indium
Iacopi, Francesca; Vereecken, Philippe; Schaekers, Marc; Caymax, Matty; Detavernier, Christophe; Griffiths, Hefin (2007) -
Advanced cleaning and ultra-thin oxide technology
Heyns, Marc; Cornelissen, Ingrid; De Gendt, Stefan; Degraeve, Robin; Knotter, D. M.; Mertens, Paul; Mertens, S.; Meuris, Marc; Nigam, Tanya; Rotondaro, Antonio; Schaekers, Marc; Teerlinck, Ivo; Vos, Rita; Wolke, K. (1998) -
ALD of ZrO2, TiO2 and ZrTiO4 thin films from heteroleptic precursors
Schaekers, Marc; Opsomer, Karl; Rampelberg, Geert; Deduytse, Davy; Detavernier, Christophe; Blasco, Nicolas; Zauner, Andy (2010) -
ALD of ZrO2, TiO2 and ZrTiO4 thin films from novel heteroleptic precursors
Schaekers, Marc; Opsomer, Karl; Deduytsche, Davy; Detavernier, Christophe; Blasco, Nicolas; Zauner, Andy (2008) -
Characterization of (ultra)thin dielectrica
Vandervorst, Wilfried; De Witte, Hilde; Conard, Thierry; Janssens, Tom; Schaekers, Marc; Brijs, Bert; Houssa, Michel (2000) -
Developments in cleaning technology for critical layers
Heyns, Marc; Arnauts, Sophia; Bearda, Twan; Claes, M.; Cornelissen, Ingrid; De Gendt, Stefan; Doumen, Geert; Fyen, Wim; Loewenstein, Lee; Lux, Marcel; Mertens, Paul; Mertens, S.; Meuris, Marc; Onsia, Bart; Röhr, Erika; Schaekers, Marc; Teerlinck, Ivo; Van Doorne, Patrick; Van Hoeymissen, Jan; Vereecke, Guy; Vos, Rita; Wolke, K. (2000) -
Electrical characterization of the metal-vanadium dioxide interface and implications for memory applications
Martens, Koen; Radu, Iuliana; Mertens, Sofie; Shi, Xiaoping; Schaekers, Marc; Tielens, Hilde; Huyghebaert, Cedric; De Gendt, Stefan; Jurczak, Gosia; Afanasev, Valeri; Heyns, Marc; Kittl, Jorge (2011) -
Epitaxial growth of (Si)GeSn source-drain layers for advanced gate all around devices
Loo, Roger; Vohra, Anurag; Porret, Clément; Hikavyy, Andriy; Rosseel, Erik; Schaekers, Marc; Capogreco, Elena; Shimura, Yosuke; Kohen, David; Tolle, John; Vandervorst, Wilfried (2019) -
In-line electrical characterization of furnace and plasma and plasma nitrided gate dielectric films
Eason, K.; Passefort, Sophie; Zhang, X.; Cubaynes, Florence; Schaekers, Marc (2002) -
Physical properties of thin nitrided Hf silicates and their impact on the performance of advanced transistors having a TaN metal gate electrode
Cubaynes, Florence; van der marel, C.; Hopstaken, M.J.P.; Van Elshocht, Sven; Everaert, Jean-Luc; Schaekers, Marc (2005) -
Process and properties of ALD tungsten nitride carbide barrier films for interconnects
Schuhmacher, Jörg; Tokei, Zsolt; Beyer, Gerald; Li, Yunlong; Stokhof, Maarten; Schaekers, Marc; Maex, Karen (2003) -
Process optimization of low temperature silicon nitride stressor layers for improvement of device performance for 45nm technology and below
Eyckens, Brenda; Collaert, Nadine; Schaekers, Marc; Sleeckx, Erik; Eneman, Geert; Verheyen, Peter; Rooyackers, Rita (2005) -
Reliability of Porous Dielectrics
Beyer, Gerald; Schaekers, Marc (2005) -
Technology and reliability aspects of ultra-thin silicon dioxide layers
Heyns, Marc; Nigam, Tanya; Degraeve, Robin; Mertens, Paul; Schaekers, Marc; Bearda, Twan; De Gendt, Stefan; Groeseneken, Guido; Maes, Herman; Claes, Martine; Houssa, Michel; Vandewalle, N.; Ausloos, M. (1999) -
The effect of CF4 contaminant gas on N2O oxidation
Kelleher, Ann; Elsmore, Chris; Schaekers, Marc; Mertens, Paul; Heyns, Marc; Mangelschots, G. (1994) -
Thermal desorption issues related to silicidation and back-end metallization
Li, H.; Vereecke, Guy; Schaekers, Marc; Baklanov, Mikhaïl; Sleeckx, Erik; Maex, Karen; Froyen, L. (1999) -
Ultra thin plasma nitrided oxides for sub-100nm CMOS
Rothschild, Aude; Veloso, Anabela; Mertens, Sofie; Schaekers, Marc; Cubaynes, Florence; Date, Lucien; Pique, Didier (2002)