Browsing by Author "Abell, Thomas"

A theoretical and experimental study of atomic-layer-deposited films onto porous dielectric substrates

Atomic layer deposited barriers for copper interconnects

Atomic layer deposition of barriers for interconnect

Buckling instabilities of thin cap layers deposited onto low-k dielectric films

Buckling instabilities of thin cap layers deposited onto low-k dielectric films

Characterization of PVD TaN and ALD WNxCy copper diffusion barriers on a porous CVD low-k material

Comparison of modulus and density measurements by nanoidentation, SAWS, XRR and EP techniques of a porous low k MSQ dielectric

Correlation between solvent diffusion, porosity and pore sealing for low k dielectrics

Correlation between solvent diffusion, porosity and pore sealing for low k dielectrics

Damage minimized plasma pore sealing of microporous low k dielectrics

Effects of UV-cure on mechanical, physical and electrical properties of microporous SiOC:H dielectric films

Efficient pore sealing crucial for future interconnects

Interface characterization of nanoscale laminate structures on dense dielectric substrates by X-ray reflectivity

Interface characterization of nanoscale laminate structures on dense dielectric substrates by x-ray reflectivity

Lateral solvent diffusion characterization of low k dielectric plasma damage and ALD barrier film closure

Low-k dielectric materials

Nucleation and growth dependence of ALD WNC on substrate surface condition

Opportunities and challenges for integration of ALD barrier layers in damascene process flows

Pinhole density measurements of barriers deposited on low-k films

Precursor penetration and sealing of porous CVD SiCOH low k dielectric for atomic layer deposition of WCxNy