Browsing by Author "Cosnier, Vincent"

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Carbonell, Laure

Journal article

2004, Journal of the Electrochemical Society, (151) 10, p.F228-F234

Publication

Characterization of nano-laminate structure using grazing incidence XRD and ATR-FTIR

Zhao, Chao

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Heyns, Marc

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Cosnier, Vincent

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Maes, Jan

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Roebben, G.

Proceedings paper

2003, Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes, 27/04/2003, p.252-259

Publication

Effect of N2 annealing on AlxZryOz oxide

Petry, Jasmine

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Richard, Olivier

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Chen, Jerry

Oral presentation

2002, AVS 49th International Symposium

Publication

Effect of N2 annealing on AlZrO oxide

Petry, Jasmine

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Richard, Olivier

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Chen, Jerry

Journal article

2003, Journal of Vacuum Science & Technology A, (21) 4, p.1482-1487

Publication

Growth and characterization of single and mixed metal oxides by ALCVD on various surfaces for high-k gate stack applications

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Brijs, Bert

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Carter, Richard

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Claes, Martine

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Oral presentation

2002, Atomic Layer Deposition Conference - ALD

Publication

Infrared interface analysis of high-k dielectrics deposited by atomic layer chemical vapour deposition

Cosnier, Vincent

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Chen, Jian

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Nohira, Hiroshi

Proceedings paper

2001, Extended Abstracts of the International Workshop on Gate Insulator - IWGI, 1/11/2001, p.226-229

Publication

Issues, achievements and challenges towards integration of high-k dielectrics

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Heyns, Marc

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Proceedings paper

2002, Frontiers in Electronics. Future Chips. Proceedings of the 2002 Workshop, 6/01/2002, p.?-?

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Physical characterisation of high-gate stacks

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Richard, Olivier

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Zhao, Chao

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Brijs, Bert

Oral presentation

2002, MRS Fall Meeting Symposium N: Novel Materials and Processes for Advanced CMOS

Publication

Physical characterization of ultrathin high k dielectrics

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Brijs, Bert

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Petry, Jasmine

Proceedings paper

2003, 8th International Symposium on Plasma-and Process-Induced Damage, 24/04/2003, p.40-50

Publication

Scaling of high-k dielectrics towards sub-1nm EOT

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Brijs, Bert

Proceedings paper

2003, IEEE International Symposium on VLSI Technology, Systems, and Applications, 23/04/2003, p.251-254

Publication

Surface preparation and interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition

Tsai, Wilman

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Carter, Richard

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Nohira, Hiroshi

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Cosnier, Vincent

Journal article

2003, Microelectronic Engineering, (65) 3, p.259-272

Publication

The influence of defects on campatibility and yield of the HfO2-polysilicon gate stack for CMOS integration

Kaushik, Vidya

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