Browsing by Author "Cubaynes, Florence"
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Publication 45nm nMOSFET with metal gate on thin SiON driving 1150μA/μm and off-state of 10nA/μm
; ; Publication A manufacturable 25nm planar MOSFET technology
Publication A practical baseline process for advanced CMOS devices research
Proceedings paper2003, Proceedings 33rd European Solid-State Device Research Conference - ESSDERC, 16/09/2003, p.27-30Publication Advanced PMOS device architecture for highly-doped ultra-shallow junctions
Journal article2004, Japanese J. of Appl. Phys. Part 1, (43) 4B, p.1778-1783Publication Device and circuit-level analog performance trade-offs: a comparative study of planar bulk FETs versus FinFETs
Proceedings paper2005, Technical Digest International Electronic Devices Meeting - IEDM, 5/12/2005, p.36-5-1-36-5-4Publication Further optimization of plasma nitridation of ultra-thin oxides for 65 nm node MOSFETS
Proceedings paper2004, Advanced Short-Time Thermal Processing for Si-based CMOS Devies II, 9/05/2004, p.236-243Publication Gate dielectrics for high performance and low power CMOS SoC applications
Publication In-line electrical characterization of furnace and plasma and plasma nitrided gate dielectric films
Oral presentation2002, 5th Technical and Scientific Meeting of CREMSI: New Tools and Processes for Thin Active Layers in the Advanced FEOL TechniquesPublication Optimal frequency range selection for full C-V characterization above 45MHz for ultra thin (1.2-nm) nitrided oxide MOSFETs
Proceedings paper2004, Proceedings of the International Conference on Microelectronic Test Structures - ICMTS, 22/03/2004, p.297-301Publication Physical properties of thin nitrided Hf silicates and their impact on the performance of advanced transistors having a TaN metal gate electrode
Oral presentation2005, MRS Spring Meeting Symposium G: Advanced Gate Dielectric Stacks on High-Mobility SemiconductorsPublication Plasma nitridation optimization sub-15A gate dielectrics
Proceedings paper2003, Silicon Nitride and Silicon Dioxide Thin Insulating Films VII, 28/04/2003, p.595-604Publication Plasma nitrided silicon rich oxide as an extension to ultra-thin nitrided oxide gate dielectrics
Publication RFCV test structures for a selected frequency range
Journal article2005, IEICE Transactions on Electronics, (88) 5, p.817-823Publication RPN oxynitride gate dielectrics for 90nm low power CMOS applications
Proceedings paper2002, ESSDERC - 32nd European Solid-State Device Research Conference, 24/09/2002, p.159-162Publication Study of pulsed RF DPN process parameters for 65 nm node MOSFET gate dielectrics
Proceedings paper2004, Integration of Advanced Micro- and Nanoelectronic Devices - Critical Issues and Solutions, 10/04/2004, p.49-53Publication Tantalum-based gate electrode metals for advanced CMOS devices
Proceedings paper2005, Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment, 15/05/2005, p.215-224Publication Ultra thin plasma nitrided oxides for sub-100nm CMOS
Oral presentation2002, 5th Technical and Scientific Meeting of CREMSI: New Tools and Processes for Thin Active Layers in the Advanced FEOL TechniquesPublication Ultra-thin oxynitride gate dielectrics by pulsed-RF DPN for 65 nm general purpose CMOS applications
Proceedings paper2003, 33rd European Solid-State Devices Research Conference - ESSDERC, 16/09/2003