imec Institutional Repository Browsing {{ collection }} by Author "Defranoux, C."

Publication

Accurate electrical activation characterization of CMOS ultra-shallow profiles

Clarysse, Trudo

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Dortu, Fabian

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Vanhaeren, Danielle

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Hoflijk, Ilse

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Geenen, Luc

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Janssens, Tom

Journal article

2004, Materials Science and Engineering B, 114-115, p.166-173

Publication

Characterization of high-k dielectrics by combined spectroscopic ellipsometry (SE) and x-ray reflectometry (XRR)

Sun, L.

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Defranoux, C.

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Stehlé, J.L.

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Boher, P.

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Evrard, P.

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Bellandi, E.

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Bender, Hugo

Proceedings paper

2004, Fundamentals of Novel Oxide/Semiconductor Interfaces, 1/12/2003, p.95-101

Publication

High-k dielectric characterization by combined VUV spectroscopic ellipsometry and X-ray reflectometry

Boher, P.

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Evrard, P.

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Defranoux, C.

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Darragon, A.

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Sun, Lianchao

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Fouere, J.C.

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Stehlé, J.L.

Proceedings paper

2003-12, MRS Fall Meeting Symposium E: Fundamentals of Novel Oxide/Semiconductor Interfaces, 1/12/2003

Publication

High-k dielectric characterization by VUV spectroscopic ellipsometry and X-ray reflection

Boher, P.

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Evrard, P.

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Defranoux, C.

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Fouere, J.C.

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Bellandi, E.

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Bender, Hugo

Proceedings paper

2003, Characterization and Metrology of ULSI Technology, 24/03/2003, p.148-153

Publication

Multitechnique characterisation of Al203 thin layers deposited on SiO2/Si surface by atomic layer chemical vapour deposition

Houssiau, L.

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Vitchev, R.G.

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Pireaux, J.J.

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Conard, Thierry

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Bender, Hugo

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Richard, Olivier

Proceedings paper

2003, AVS 4th International Conference on Microelectronics and Interfaces - ICMI, 3/03/2003, p.36-38

Publication

On the activation mechanisms of sub-melt laser anneals

Clarysse, Trudo

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Bogdanowicz, Janusz

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Goossens, Jozefien

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Moussa, Alain

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Rosseel, Erik

Meeting abstract

2008, E-MRS Sprng Meeting Symposium I: Front-End Junction and Contact Formation in Future Silicon/Germanium Based Devices, 26/05/2008

Publication

Physical characterization of mixed HfAlOx layers by complementary analysis techniques

Bender, Hugo

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Conard, Thierry

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Richard, Olivier

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Brijs, Bert

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Petry, Jasmine

Journal article

2004, Materials Science and Engineering B, 109, p.60-63

Publication

Physical characterization of thin HfO2 layers by the combined analysis with complementary techniques

Bender, Hugo

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Conard, Thierry

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Richard, Olivier

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Brijs, Bert

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Petry, Jasmine

Proceedings paper

2003, Analytical Techniques for Semiconductor Materials and Processes, 27/04/2003, p.223-232

Publication

Spectroscopic ellipsometry in the VUV range applied to the characterization of atomic layer deposited HfO2,Al2O3 and HfAlOx thin layers for high k dielectrics

Boher, P.

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Defranoux, C.

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Bourtault, S.

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Piel, J.P.

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Bender, Hugo

Proceedings paper

2003, Analytical and Diagnostic Techniques for Semiconductor Materials, Devices and Processes, 27/04/2003, p.305-315

Publication

Vacuum UV spectroscopic ellipsometry applied to the characterization of high-k dielectrics

Boher, P.

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Defranoux, C.

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Heinrich, P.

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Wolstenholme, J.

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Bender, Hugo

Oral presentation

2003, E-MRS Spring Meeting Symposium I: Functional Metal Oxides - Semiconductor Structures

Publication

Vacuum UV spectroscopic ellipsometry applied to the characterization of high-k gate dielectrics

Boher, P.

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Defranoux, C.

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Bender, Hugo

Oral presentation

2003, 3rd International Conference on Spectroscopic Ellipsometry - ICSE 3

Publication

VUV spectroscopic ellipsometry applied to the characterization of high-k dielectrics

Boher, P.

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Defranoux, C.

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Heinrich, P.

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Wolstenholme, J.

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Bender, Hugo

Journal article

2004, Materials Science & Engineering B, (109) 1_3, p.64-68

Publication

X-ray photoelectron spectroscopy characterisation of high-k dielectric Al2O3 and HfO2 layers deposited on SiO2/Si surface

Vitchev, R.G.

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Pireaux, J.J.

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Conard, Thierry

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Bender, Hugo

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Wolstenholme, J.

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Defranoux, C.

Journal article

2004, Applied Surface Science, (235) 1_2, p.21-25

Browsing by Author "Defranoux, C."