Browsing by Author "Deweerd, Wim"

45nm nMOSFET with metal gate on thin SiON driving 1150μA/μm and off-state of 10nA/μm

ALCVD hafnium silicates for low power gate stacks

ALD deposition of high-k and metal gate stacks for advanced CMOS applications

Atomic layer deposition of hafnium silicate from HfCl4, SiCl4, and H2O

Electrical and physical characterization of MOSFETs with MBE grown La2HfO7 and HfO2 high-k dielectrics integrated in a conventional flow

Engineering ALCVD HfSiO gate stacks for LSTP applications

Fabrication of MBE high-k MOSFETs in a standard CMOS flow

Flat-band voltage shift of Ruthenium gated stacks and its link with the formation of a thin Ruthenium oxide layer at the Ruthenium/dielectric interface

High-k gate stack engineering – towards meeting low standby power and high performance targets

Implementation of high-k gate dielectrics - a status update

Integration of high-k gate dielectrics - wet etch, cleaning and surface conditioning

Integration of high-K gate dielectrics - wet etch, cleaning and surface conditioning

Integration of PVD ruthenium as a pMOS metal gate in scaled planar devices: workfunction and electrical performance on HfO2

Introducing novel metal gate materials for decananometer CMOS in the agile fab: a case study

Issues, achievements and challenges towards intergration of high-k dielectrics

Managing and controlling contamination in an advanced 8" CMOS pilot line

Mechanism of O2-anneal induced Vfb shifts of Ru gated stacks

Molecular beam epitaxy for advanced gate stack materials and processes

MOSFET with La2HfO7 and HfO2 high-k dielectrics integrated in a conventional flow

Nitrided hafnium silicates for gate dielectrics