Browsing by Author "Erdmann, Andreas"
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Publication Analysis of EUV mask multilayer defect printing characteristics
Proceedings paper2012, Extreme Ultraviolet (EUV) Lithography III, 12/02/2012, p.83220EPublication Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?
Journal article2018, Journal of Micro/Nanolithography MEMS and MOEMS, (18) 1, p.11005Publication Attenuated PSM for EUV: Can they mitigate 3D mask effects?
Proceedings paper2018, Extreme Ultraviolet (EUV) Lithography IX, 26/02/2018, p.1058312Publication Characterization and mitigation of 3D mask effects
Journal article2017, Advanced Optical Technologies, (6) 3_4, p.187-202Publication Characterization and mitigation of 3D mask effects in EUV lithography
Oral presentation2016, International Symposium on Extreme Ultraviolet Lithography - EUVLPublication Exploration of alternative absorber materials for EUV lithography: A simulation study
Proceedings paper2016, European Mask and Lithography Conference - EUVL, 21/06/2016Publication Impact of alternative mask stacks on the imaging performance at NA 1.20 and above
Proceedings paper2007, SPIE Photomask Technology (BACUS), 18/09/2007, p.67301NPublication Increasing the predictability of AIMS measurements by coupling to resist simulations
Publication Mask absorber development to enable next-generation EUVL
; ; ; ; ; Detavernier, ChristopheProceedings paper2019, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology, 23/04/2019, p.111780FPublication Mask absorber for next generation EUV lithography
Proceedings paper2020, Conference on Extreme Ultraviolet Lithography, SEP 21-25, 2020Publication Mask and wafer topography effects in immersion lithography
Proceedings paper2005, Optical Microlithography XVIII, 27/02/2005, p.383-394Publication Mitigating EUV mask 3D effects by alternative metal absorbers
Proceedings paper2016, International Symposium on Extreme Ultraviolet Lithography - EUVL, 24/10/2016Publication Novel EUV mask absorber evaluation in support of next-generation EUV imaging
Proceedings paper2018, Photomask Technology 2018, 17/09/2018, p.108100CPublication Perspectives and tradeoffs of absorber materials for high NA EUV lithography
Journal article2020, JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, (19) 4Publication Perspectives and tradeoffs of novel absorber materials for high NA EUV lithography
Proceedings paper2020, Extreme Ultraviolet (EUV) Lithography XI, 23/02/2020, p.1132309Publication Precise optical constants: determination and impact on metrology, simulation and development of EUV masks
Publication Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects
Proceedings paper2011, Physical Optics, 5/09/2011, p.81710MPublication Reducing EUV mask 3D effects by alternative metal absorbers
; ; ; ; Evanschitzky, PeterJournal article2017, Journal of Micro/Nanolithography MEMS and MOEMS, (16) 4, p.41002Publication Simulation of polychromatic effects in high NA EUV lithography
Publication Simulation of the effect of a resist-surface bound air bubble on imaging in immersion lithography
Proceedings paper2005, Optical Microlithography XVIII, 27/02/2005, p.243-253