Browsing by Author "Laenens, Bart"
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Publication 22nm node imaging and beyond: a comparison of EUV and ArFi double patterning
Proceedings paper2010, International Symposium on Lithography Extensions, 20/10/2010Publication 22nm node imaging and beyond: When will EUV take over?
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010Publication Assist features: placement, impact and relevance
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography VII, 21/02/2016, p.97761SPublication Design-based metrology: beyond CD/EPE metrics to evaluate printability performance
Proceedings paper2016, Metrology, Inspection, and Process Control for Microlithography XXX, 20/02/2016, p.97780WPublication Experimental study of effect of pellicle on optical proximity fingerprint for 1.35 NA immersion ArF lithography
; ; ; Publication Experimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells
Journal article2011-03, Journal of Micro/Nanolithography MEMS and MOEMS, (10) 1, p.13008Publication Freeform illumination sources: an experimental study of source-mask optimization for 22nm SRAM cells
Proceedings paper2010, Optical Microlithography XXIII, 21/02/2010, p.764008Publication Freeform illumination sources: Source mask optimization for 22 nm node SRAM
Proceedings paper2009, 6th International Symposium on Immersion Lithography Extensions, 22/10/2009Publication Interplay between structural and magnetic properties of L10-FePt(001) thin films directly grown on MgO(001)
Journal article2009, Journal of Applied Physics, (105) 7, p.73913Publication Joint optimization of layout and litho for SRAM and Logic towards the 20 nm node, using 193i
Proceedings paper2011, Optical Microlithography XXIV, 27/02/2011, p.79730BPublication Joint-optimization for SRAM and Logic for 28nm node and below
Proceedings paper2010, Design for Manufacturability through Design-Process Integration IV, 21/02/2010, p.764107Publication Litho and patterning challenges for memory and logic applications at the 22nm node
Proceedings paper2010, Optical Microlithography XXIII, 21/02/2010, p.76400CPublication Mask 3D effect mitigation by source optimization and assist feature placement
Proceedings paper2016, International Symposium on Extreme Ultraviolet Lithography - EUVL, 24/10/2016Publication Moessbauer studies of complex materials: Energy versus time domain
Journal article2009, Applied Physics Letters, (94) 22, p.224104Publication Multiple patterning...various keys for scaling
Proceedings paper2010, LLithography Workshop, 7/11/2010Publication Multiple patterning: step by step towards 1X nm hp
Proceedings paper2010, International Symposium on Lithography Extensions, 20/10/2010Publication Optical proximity stability control of ArF immersion clusters
; ; ; ; Cheng, ShauneeProceedings paper2011, Optical Microlithography XXIV, 27/02/2011, p.79731IPublication Pellicle contribution to optical proximity and critical dimension uniformity for 1.35 numerical aperture immersion ArF lithography
; ; ; Publication Performance of FlexRay, a fully programmable illumination system for generation of freeform sources on high NA immersion systems