Browsing by Author "Naili, Mohamed"

Alternative gate insulator materials for future generation MOSFETs

Charge trapping in SiOx/ZrO2 and SiOx/TiO2 gate dielectric stacks

Charge trapping in SiOx/ZrO2 gate dielectric stacks

Charge trapping in very thin high-permittivity gate dielectric layers

Constant voltage stress induced degradation in HfO2/SiO2 gate dielectric stacks

Effect of O-2 post-deposition anneals on the properties of ultra-thin SiOx/ZrO2 gate dielectric stacks

Electrical and physical characterization of high-k dielectric layers

Electrical properties of metal-insulator-semiconductor devices with high permittivity gate dielectric layers

High k dielectric materials prepared by atomic layer CVD

High temperature grazing incidence XRD study on in-situ crystallization in ultra-thin oxide films

In situ crystallisation in ZrO2 thin films during high temperature X-ray diffraction

Model for the charge trapping in high permittivity gate dielectric stacks

Surface cleaning issues in thin-oxide technology

Trap-assisted tunneling in high permittivity gate dielectric stacks