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Browsing by Author "Ohashi, Takeyoshi"

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    3D measurement of 3D NAND memory hole with CD-SEM and tilted FIB

    Ohashi, Takeyoshi
    ;
    Yamaguchi, Atsuko
    ;
    Hasumi, Kazuhisa
    ;
    Ikota, Masami
    ;
    Tan, Chi Lim
    Proceedings paper
    2017, 43rd International Conference on Micro and Nanoengineering - MNE, 18/09/2017, p.OC073
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    Contact inspection and resistance - capacitance measurement of Si nanowire with SEM voltage contrast

    Ohashi, Takeyoshi
    ;
    Hasumi, Kazuhisa
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    Ikota, Masami
    ;
    Lorusso, Gian  
    ;
    Mertens, Hans  
    Journal article
    2019, Journal of Micro/Nanolithography MEMS and MOEMS, (18) 2, p.21205
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    Contact inspection of Si nanowire with SEM voltage contrast

    Ohashi, Takeyoshi
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    Yamaguchi, Atsuko
    ;
    Hasumi, Kazuhisa
    ;
    Ikota, Masami
    ;
    Lorusso, Gian  
    Proceedings paper
    2018, Metrology, Inspection, and Process Control for Microlithography XXXII, 25/02/2018, p.105850B
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    EB metrology of Ge channel gate-all-around FET: buckling evaluation and EB damage assessment

    Ohashi, Takeyoshi
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    Hasumi, Kazuhisa
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    Ikota, Masami
    ;
    Lorusso, Gian  
    ;
    Witters, Liesbeth  
    Proceedings paper
    2020, Metrology, Inspection, and Process Control for Microlithography XXXIV, 23/02/2020, p.1132525
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    Electron beam metrology for advanced technology nodes

    Lorusso, Gian  
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    Horiguchi, Naoto  
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    Boemmels, Juergen  
    ;
    Wilson, Chris  
    ;
    Van den Bosch, Geert  
    Journal article
    2019, Japanese Journal of Applied Physics, (58) SD, p.SD0801
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    Enabling CD SEM metrology for 5nm technology node and beyond

    Lorusso, Gian  
    ;
    Ohashi, Takeyoshi
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    Yamaguchi, Astuko
    ;
    Inoue, Osamu
    ;
    Sutani, Takumichi
    Proceedings paper
    2017, Metrology, Inspection, and Process Control for Microlithography XXXI, 26/02/2017, p.1014512
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    Line width roughness accuracy analysis during pattern transfer in self-aligned quadruple patterning process

    Lorusso, Gian  
    ;
    Inoue, Osamu
    ;
    Ohashi, Takeyoshi
    ;
    Altamirano Sanchez, Efrain  
    Proceedings paper
    2016, Metrology, Inspection, and Process Control for Microlithography XXX, 21/02/2016, p.97780V
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    Precise measurement of thin film thickness in 3D-NAND device with CD-SEM

    Ohashi, Takeyoshi
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    Atsuko, Yamaguchi
    ;
    Kobayashi, Takashi
    ;
    Inoue, Osamu
    ;
    Hasumi, Kazuhisa
    Oral presentation
    2016, 42nd Micro and Nano Engineering Conference
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    Precise measurement of thin-film thickness in 3D-NAND device with CD-SEM

    Ohashi, Takeyoshi
    ;
    Yamaguchi, Atsuko
    ;
    Hasumi, Kazuhisa
    ;
    Ikota, Masami
    ;
    Lorusso, Gian  
    Journal article
    2018, Journal of Micro/Nanolithography MEMS and MOEMS, (17) 2, p.24002
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    SEM Inspection of Nanowire Devices: Contact inspection, Resistance and Capacitance Measurement and Buckling Evaluation

    Ohashi, Takeyoshi
    ;
    Hasumi, Kazuhisa
    ;
    Masami, Ikota
    ;
    Lorusso, Gian  
    ;
    Mertens, Hans  
    Oral presentation
    2019, MNE 2019
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    Variability study with CD-SEM metrology for STT-MRAM: Correlation analysis between physical dimensions and electrical property of the memory element

    Ohashi, Takeyoshi
    ;
    Yamaguchi, Atusko
    ;
    Hasumi, Kazuhisa
    ;
    Inoue, Osamu
    ;
    Ikata, Masami
    Meeting abstract
    2017, Metrology, Inspection, and Process Control for Microlithography XXXI, 27/02/2017, p.101450H
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    Variability study with CD-SEM metrology for STT-MRAM: correlation analysis between physical dimensions and electrical property of the memory element

    Ohashi, Takeyoshi
    ;
    Yamaguchi, Atsuko
    ;
    Hasumi, Kazuhisa
    ;
    Inoue, Osamu
    ;
    Ikota, Masami
    Proceedings paper
    2017, Metrology, Inspection, and Process Control for Microlithography XXXI, 26/02/2017, p.101450H

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