Browsing by Author "Rutigliani, Vito"

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Rutigliani, Vito

Proceedings paper

2018, Advanced Etch Technology for Nanopatterning VII, 25/02/2018, p.105890Y

Publication

Cryogenic etching vs P4 approaches: paths towards ultra-low damage integration of mesoporous oxide dielectric materials

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Heyne, Markus

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Krishtab, Mikhail

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Goodyear, Andy

Meeting abstract

2014, AVS 61st International Symposium and Exhibition, 9/11/2014, p.EM-TuM-6

Publication

Deep learning nanometrology of line edge roughness

Giannatou, Eva

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Constantoudis, Vassilios

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Papavieros, George

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Papageorgiou, Harris

Proceedings paper

2019, Metrology, Inspection, and Process Control for Microlithography XXXIII, 24/02/2019, p.1095920

Publication

EUV photoresist patterning characterization for imec N7/N5 technology

De Simone, Danilo

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Rutigliani, Vito

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De Bisschop, Peter

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Vesters, Yannick

Proceedings paper

2018, Extreme Ultraviolet (EUV) Lithography IX, 26/02/2018, p.105830G

Publication

Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist

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Seong, TaeGeun

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Wu, Yizhi

Proceedings paper

2017, Advances in Patterning Materials and Processes XXXIV, 26/02/2017, p.101460K

Publication

High thermal stability and high VUV absorption polymer for the P4/pore stuffing approach

Rutigliani, Vito

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Cao, Yi

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Noya, G.

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Baklanov, Mikhaïl

Meeting abstract

2015, Plasma Etch and Strip in Microtechnology - PESM, 27/04/2015

Publication

Multifractal analysis of line-edge roughness

Costantoudis, Vassilios

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Papaverios, George

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Rutigliani, Vito

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Proceedings paper

2018, Metrologia, Inspection, and Process Control for Microlithography XXXII, 25/02/2018, p.1058534

Publication

Need for LWR metrology standardization: the imec roughness protocol

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Sutani, Takeyoshi

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Rutigliani, Vito

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Moussa, Alan

Journal article

2018, Journal of Micro/Nanolithography MEMS and MOEMS, 17, p.41009

Publication

Optimized pore stuffing for enhanced compatibility with interconnect integration flow

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Rutigliani, Vito

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Noya, G.

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Cao, Yi

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Lesniewska, Alicja

Proceedings paper

2015, IEEE International Interconnect Technology Conference - IITC / Materials for Advanced Metallization Conference - MAM, 18/05/2015, p.91-94

Publication

Roughness decomposition: an on-wafer methodology to discriminate mask, metrology, and shot noise contributions

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Rispens, Gijsbert

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Rutigliani, Vito

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Frommhold, Andreas

Meeting abstract

2019, Metrology, Inspection, and Process Control for Microlithography XXXIII, 24/02/2019, p.109590T

Publication

Setting up a proper power spectral density (PSD) and autocorrelation analysis for material and process characterization

Rutigliani, Vito

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Proceedings paper

2018, Metrology, Inspection, and Process Control for Microlithography XXXII, 25/02/2018, p.105851K

Publication

The need for LWR metrology standardization: the imec roughness protocol

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Sutani, Takeyoshi

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Rutigliani, Vito

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Moussa, Alain

Proceedings paper

2018, Metrology, Inspection, and Process Control for Microlithography XXXII, 25/02/2018, p.105850D

Publication

Unbiased roughness measurements: subtracting out SEM effects

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Rutigliani, Vito

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Mack, Chris

Oral presentation

2017, 43rd International Conference on Micro and Nanoengineering - MNE

Publication

Unbiased roughness measurements: Subtracting out SEM effects

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Rutigliani, Vito

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Mack, Chris

Journal article

2018, Microelectronic Engineering, 190, p.33-37

Publication

Unbiased roughness measurements: Subtracting out SEM effects, Part 2

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Rutigliani, Vito

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Mack, Chris

Journal article

2018, Journal of Vacuum Science and Technology B, (36) 6, p.06J501

Publication

Vacuum ultra-violet damage and damage mitigation for plasma processing of highly porous organosilicate glass dielectrics

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