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Browsing by Author "Saadeh, Qais"

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    Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask

    Wu, Meiyi  
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    de Marneffe, Jean-Francois  
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    Opsomer, Karl  
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    Detavernier, Christophe
    Journal article
    2021, MICRO AND NANO ENGINEERING, 12, p.100089
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    Determination of optical constants of thin films in the EUV

    Ciesielski, Richard
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    Saadeh, Qais
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    Philipsen, Vicky  
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    Opsomer, Karl  
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    Soulie, Jean-Philippe
    Journal article
    2022, APPLIED OPTICS, (61) 8, p.2060-2078
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    Evaluation of Ta-Co alloys as novel high-k EUV mask absorber

    Thakare, Devesh  
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    Wu, Meiyi  
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    Opsomer, Karl  
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    Detavernier, Christophe
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    Naujok, Philipp
    Proceedings paper
    2022, Conference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference, APR 24-MAY 27, 2022, p.120510D
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    Evaluation of Ta-Co alloys as novel high-k extreme ultraviolet mask absorber

    Thakare, Devesh  
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    Wu, Meiyi  
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    Opsomer, Karl  
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    Saadeh, Qais
    ;
    Soltwisch, Victor
    ;
    Naujok, Philipp
    Journal article
    2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 2, p.Art. 024403
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    Mask absorber for next generation EUV lithography

    Wu, Meiyi  
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    Thakare, Devesh  
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    De Marneffe, Jean-Francois
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    Jaenen, Patrick  
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    Souriau, Laurent  
    Proceedings paper
    2020, Conference on Extreme Ultraviolet Lithography, SEP 21-25, 2020
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    Nested Sampling aided determination of tantalum optical constants in the EUV spectral range

    Saadeh, Qais
    ;
    Naujok, Philipp
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    Wu, Meiyi  
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    Philipsen, Vicky  
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    Thakare, Devesh  
    ;
    Scholze, Frank
    Journal article
    2022, APPLIED OPTICS, (61) 33, p.10032-10042
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    On the optical constants of cobalt in the M-absorption edge region

    Saadeh, Qais
    ;
    Naujok, Philipp
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    Thakare, Devesh  
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    Wu, Meiyi  
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    Philipsen, Vicky  
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    Scholze, Frank
    Journal article
    2023, OPTIK, (273) February, p.Art.: 170455
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    Optical constants for EUV scatterometry

    Ciesielski, Richard
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    Saadeh, Qais
    ;
    Naujok, Philipp
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    Opsomer, Karl  
    ;
    Soulie, Jean-Philippe
    Proceedings paper
    2021, Modeling Aspects in Optical Metrology VII, 21/06/2021, p.117830M
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    Precise optical constant determination in the soft X-ray, EUV, and VUV spectral range

    Abbasirad, Najmeh
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    Saadeh, Qais
    ;
    Ciesielski, Richard
    ;
    Gottwald, Alexander
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    Philipsen, Vicky  
    Proceedings paper
    2023, Conference on Metrology, Inspection, and Process Control XXXVII, FEB 27-MAR 02, 2023, p.Art. 124963B
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    Precise optical constants: determination and impact on metrology, simulation and development of EUV masks

    Saadeh, Qais
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    Mesilhy, Hazem
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    Soltwisch, Victor
    ;
    Erdmann, Andreas
    ;
    Ciesielski, Richard
    Proceedings paper
    2022, Photomask Technology Conference, SEP 26-29, 2022, p.Art. 122930Y
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    Simulation of polychromatic effects in high NA EUV lithography

    Erdmann, Andreas
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    Mesilhy, Hazem
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    Evanschitzky, Peter
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    Saadeh, Qais
    ;
    Soltwisch, Victor
    Proceedings paper
    2021, International Conference on Extreme Ultraviolet Lithography, SEP 27-OCT 01, 2021
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    Study of novel EUVL mask absorber candidates

    Wu, Meiyi  
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    Thakare, Devesh  
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    De Marneffe, Jean-Francois
    ;
    Jaenen, Patrick  
    ;
    Souriau, Laurent  
    Journal article
    2021, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (20) 2
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    Time-frequency analysis assisted determination of ruthenium optical constants in the sub-EUV spectral range 8 nm-23.75 nm

    Saadeh, Qais
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    Naujok, Philipp
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    Philipsen, Vicky  
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    Hoenicke, Philipp
    ;
    Laubis, Christian
    Journal article
    2021, OPTICS EXPRESS, (29) 25, p.40993-41013
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    Tunability of the optical constants of tantalum-cobalt alloy thin films in the extreme ultraviolet

    Saadeh, Qais
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    Philipsen, Vicky  
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    Thakare, Devesh  
    ;
    Naujok, Philipp
    ;
    Wu, Meiyi  
    ;
    Scholze, Frank
    Journal article
    2023, OPTICAL MATERIALS EXPRESS, (13) 1, p.78-91

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