Browsing by Author "Tritchkov, Alexander"

0.18 μm KrF lithography using optical proximity correction based on empirical behavior modeling

AIMS TM 45 inspection of CH treated with inverse lithography

Application of pixel-based mask optimization technique for high-transmission attenuated PSM

Automated OPC for application in advanced lithography

Characterization and correction of optical proximity effects in deep-ultraviolet lithography using behavior modeling

Design split algorithms validation for DPT implementation at 32 nm and beyond

Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography

Directed self-assembly graphoepitaxy template generation with immersion lithography

Double patterning EDA solutions for the 32nm HP and beyond

Electron beam / DUV intra-level mix-and-match lithography for random logic 0.25 μm CMOS

Feasibility of 250 nm gate patterning using i-line with OPC

Hyper-NA imaging of 45nm node random CH layouts using inverse lithography

Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture

Lithography simulation with aerial image - variable threshold resist model

Lithography simulation with aerial image-variable threshold resist model

Optical proximity effects and correction strategies for chemical amplified DUV resists

Optical proximity effects correction at 0.25 mm incorporating process variations in lithography

Optically induced mask criical dimension error magnification in 248 nm lithography

Proximity effects correction for advanced optical lithography processes

Reduction of mask induced CD errors by optical proximity correction