Browsing by Author "Vleeming, Bert"

Applying dipole illumination to characterize the imaging performance of 193nm photoresists for the 100nm node

ArF lithography options for 100-nm technologies

ArF lithography options for 100nm technologies

Critical assessment of error budget components in double patterning immersion lithography

Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control

Double patterning for 32-nm and below: an update

Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerations

Introducing 193 nm lithography

Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Process optimization for sub-100-nm gate patterns using phase edge lithography

Spacer self aligned double patterning: process control

Status of ArF lithography for the 130nm technology node

Sub-32nm half pitch imaging with high NA immersion exposure systems using Double Patterning techniques