Browsing by Author "Xu, Dongbo"

28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography

Characterization and mitigation of 3D mask effects

Characterization and mitigation of 3D mask effects in EUV lithography

Concurrent design rule, OPC and process optimization in EUV lithography

Design and Mask Optimization Toward Low Dose EUV Exposure

EUV low-n attenuated phase-shift mask on random logic Via single patterning at pitch 36nm

EUV Single Patterning Exploration for Pitch 28 nm

EUV single patterning validation of curvilinear routing

Exploration of alternative absorber materials for EUV lithography: A simulation study

Exploration of Alternative Mask for 0.33NA EUV Single Patterning at Pitch 28nm

Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design

Extend 0.33 NA extreme ultraviolet single patterning to pitch 28-nm metal design by low-n mask

High NA EUV single patterning of advanced metal logic nodes: Inverse lithography techniques in combination with alternative mask absorbers

Improving OPC Model Accuracy of Dry Resist for Low k1 EUV Patterning

Investigation of Low-n Mask in 0.33NA EUV Single Patterning at Pitch 28nm Metal Design

Mitigating EUV mask 3D effects by alternative metal absorbers

NXE:3400 OPC Process Monitoring: Model Validity vs. Process Variability

OPC and Modeling Solution to Support 0.55NA EUV Stitching

Reducing EUV mask 3D effects by alternative metal absorbers