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Browsing by Author "Yakimets, Dmitry"

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    5nm: has the time for a device change come?

    Raghavan, Praveen
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    Garcia Bardon, Marie  
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    Schuddinck, Pieter  
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    Jang, Doyoung  
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    Yakimets, Dmitry  
    Proceedings paper
    2016, 17th International Symposium on Quality Electronic Design - ISQED, 15/03/2016, p.275-277
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    A comprehensive benchmark and optimization of 5-nm lateral and vertical GAA 6T-SRAMs

    Huynh Bao, Trong
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    Sakhare, Sushil
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    Yakimets, Dmitry  
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    Ryckaert, Julien  
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    Thean, Aaron  
    Journal article
    2016, IEEE Transactions on Electron Devices, (63) 2, p.643-651
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    Benchmarking of MoS2 FETs with multigate Si-FET options for 5 nm and beyond

    Agarwal Kumar, Tarun
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    Yakimets, Dmitry  
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    Raghavan, Praveen
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    Radu, Iuliana  
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    Thean, Aaron  
    Journal article
    2015, IEEE Transactions on Electron Devices, (62) 12, p.4051-4156
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    Built-in sheet charge as an alternative to dopant pockets in tunnel field-effect transistors

    Verreck, Devin  
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    Verhulst, Anne  
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    Xiang, Yang  
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    Yakimets, Dmitry  
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    El Kazzi, Salim
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    Parvais, Bertrand  
    Journal article
    2018, IEEE Journal of the Electron Devices Society, 6, p.658-663
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    Buried power rail integration with FinFETs for ultimate CMOS scaling

    Gupta, Anshul  
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    Varela Pedreira, Olalla  
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    Arutchelvan, Goutham  
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    Zahedmanesh, Houman  
    Journal article
    2020, IEEE Transactions on Electron Devices, (67) 12, p.5349-5354
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    Buried Power Rail Integration with Si FinFETs for CMOS Scaling beyond the 5 nm Node

    Gupta, Anshul  
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    Mertens, Hans  
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    Tao, Zheng  
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    Demuynck, Steven  
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    Boemmels, Juergen  
    Proceedings paper
    2020, IEEE Symposium on VLSI Technology and Circuits, JUN 15-19, 2020
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    Circuit and process co-design with vertical gate-all-around nanowire FET technology to extend CMOS scaling for 5nm and beyond technologies

    Huynh Bao, Trong
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    Yakimets, Dmitry  
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    Ryckaert, Julien  
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    Ciofi, Ivan  
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    Baert, Rogier  
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    Veloso, Anabela  
    Proceedings paper
    2014-09, 44th European Solid-State Device Research Conference - ESSDERC, 22/09/2014, p.102-105
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    Design technology co-optimization for enabling 5nm gate-all-around nanowire 6T SRAM

    Huynh Bao, Trong
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    Sakhare, Sushil
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    Ryckaert, Julien  
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    Yakimets, Dmitry  
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    Mercha, Abdelkarim  
    Proceedings paper
    2015, International Conference on IC Design and Technology - ICICDT, 1/06/2015, p.1-4
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    Device challenges for logic scaling for sub-5 nm node

    Jang, Doyoung  
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    Garcia Bardon, Marie  
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    Yakimets, Dmitry  
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    Schuddinck, Pieter  
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    Ragnarsson, Lars-Ake  
    Meeting abstract
    2018, ISTDM/ICSI 2018, 27/05/2018
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    Device circuit and technology co-optimisation for FinFET based 6T SRAM cells beyond N7

    Gupta, Mohit  
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    Weckx, Pieter  
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    Cosemans, Stefan  
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    Schuddinck, Pieter  
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    Baert, Rogier  
    Proceedings paper
    2017, 47th European Solid-State Device Research Conference - ESSDERC, 11/09/2017, p.256-259
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    Device exploration of nanosheet transistors for sub-7nm technology node

    Jang, Doyoung  
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    Yakimets, Dmitry  
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    Eneman, Geert  
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    Schuddinck, Pieter  
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    Garcia Bardon, Marie  
    Journal article
    2017, IEEE Transactions on Electron Devices, (64) 6, p.2707-2713
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    Device-, circuit- & block-level evaluation of CFET in a 4 track library

    Schuddinck, Pieter  
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    Zografos, Odysseas  
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    Weckx, Pieter  
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    Matagne, Philippe  
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    Sarkar, Satadru  
    Proceedings paper
    2019, 2019 Symposia on VLSI Technology and Circuits, 9/06/2019, p.T204-T205
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    Device/system performance modeling of stacked lateral NWFET logic

    Huang, Victor
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    Pang, Chenyun
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    Yakimets, Dmitry  
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    Raghavan, Praveen
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    Naaemi, Azad
    Proceedings paper
    2016, 17th International Symposium on Quality Electronic Design - ISQED, 15/04/2016, p.215-220
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    Dimensioning for power and performance under 10nm: The limits of FinFETs scaling

    Garcia Bardon, Marie  
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    Schuddinck, Pieter  
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    Raghavan, Praveen
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    Jang, Doyoung  
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    Yakimets, Dmitry  
    Proceedings paper
    2015, 2015 International Conference on IC Design & Technology (ICICDT), 1/06/2015, p.1-4
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    DTCO flow for device exploration

    Yakimets, Dmitry  
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    Schuddinck, Pieter  
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    Matagne, Philippe  
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    Parvais, Bertrand  
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    Mocuta, Anda
    Meeting abstract
    2018, SNUG (Synopsys User Group) Europe 2018, 11/06/2018
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    DTCO of Nanosheet and Forksheet Architectures: Exploring Dielectric Walls, Contacting Schemes, and Active Regions for Optimized RO Performance

    Gaddemane, Gautam  
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    Schuddinck, Pieter  
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    Bhuwalka, Krishna
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    Rzepa, Gerhard
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    Mirabelli, Gioele  
    Proceedings paper
    2024, 8th Electron Devices Technology & Manufacturing Conference (EDTM), MAR 03-06, 2024, p.226-228
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    Enablement of STT-MRAM as last level cache for the high performance computing domain at the 5nm node

    Sakhare, Sushil
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    Perumkunnil, Manu  
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    Huynh Bao, Trong
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    Rao, Siddharth  
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    Kim, Woojin  
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    Crotti, Davide  
    Proceedings paper
    2018, IEEE International Electron Devices Meeting - IEDM, 1/12/2018, p.420-423
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    Extreme scaling enabled by 5 tracks cells : holistic design-device co-optimization for FinFETs and lateral nanowires

    Garcia Bardon, Marie  
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    Sherazi, Yasser  
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    Schuddinck, Pieter  
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    Jang, Doyoung  
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    Yakimets, Dmitry  
    Proceedings paper
    2016, IEEE International Electron Devices Meeting - IEDM, 3/12/2016, p.687-690
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    Ge Devices: a potential candidate for sub-5nm nodes?

    Sharan, Neha  
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    Shaik, Khaja Ahmad
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    Jang, Doyoung  
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    Schuddinck, Pieter  
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    Yakimets, Dmitry  
    Journal article
    2019, IEEE Transactions on Electron Devices, (66) 11, p.4997-5002
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    Heterogeneous nano- to wide-scale co-integration of beyond-Si and Si CMOS devices to enhance future electronics

    Thean, Aaron  
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    Collaert, Nadine  
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    Radu, Iuliana  
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    Waldron, Niamh  
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    Merckling, Clement  
    Proceedings paper
    2015, Silicon Compatible Materials, and Technologies for Advanced Integrated Processes, Circuits and Emerging Applications 5, 29/06/2015, p.3-14
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