Browsing by author "Laenens, Bart"
Now showing items 1-20 of 25
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22nm node imaging and beyond: a comparison of EUV and ArFi double patterning
van Setten, Eelco; Mouraille, O.; Wittebrood, F.; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
22nm node imaging and beyond: When will EUV take over?
van Setten, Eelco; Mouraille, Orion; Wittebrood, Friso; Dusa, Mircea; van Ingen-Schenau, Koen; Finders, Jo; Feenstra, Kees; Bekaert, Joost; Laenens, Bart; Philipsen, Vicky; Ercken, Monique; Hendrickx, Eric; Vandenberghe, Geert (2010) -
Assist features: placement, impact and relevance
Mochi, Iacopo; Philipsen, Vicky; Gallagher, Emily; Hendrickx, Eric; Lyakhova, Kateryna; Wittebrood, Friso; Schiffelers, Guido; Fliervoet, Timon; Wang, Shibing; Hsu, Stephen; Plachecki, Vince; Baron, Stan; Laenens, Bart (2016) -
Design-based metrology: beyond CD/EPE metrics to evaluate printability performance
Halder, Sandip; Mailfert, Julien; Leray, Philippe; Rio, David; Peng, Hsin-Ying; Laenens, Bart (2016) -
Experimental study of effect of pellicle on optical proximity fingerprint for 1.35 NA immersion ArF lithography
Van Look, Lieve; Bekaert, Joost; Laenens, Bart; Vandenberghe, Geert; Richter, Jan; Bubke, Karsten; Peters, Jan Hendrik; Schreel, Koen; Dusa, Mircea (2010) -
Experimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells
Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Hsu, Stephen; Liu, Hua Yu; Mouraille, Orion; Schreel, Koen; Dusa, Mircea; Zimmermann, Joerg; Gräupner, Paul; Neumann, Jens Timo (2011-03) -
Freeform illumination sources: an experimental study of source-mask optimization for 22nm SRAM cells
Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Baron, S.; Tsai, M.-C.; Ning, K.; Hsu, S.; Liu, H.Y.; Mulder, M.; Bouma, A.; van der Heijden, E.; Mouraille, O.; Schreel, K.; Finders, Jo; Dusa, Mircea; Zimmerman, J.; Graeupner, Paul; Neumann, J.T.; Hennerkes, C. (2010) -
Freeform illumination sources: Source mask optimization for 22 nm node SRAM
Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Mulder, M.; Baron, Stanislas; Tsai, Min-Chun; Ning, Kai; Hsu, Stephen; Bouma, A.; van der Heijden, E.; Schreel, Koen; Carpaij, R.; Dusa, Mircea; Zimmerman, Joerg; Graeupner, Paul; Hennerkes, Christoph (2009) -
Interplay between structural and magnetic properties of L10-FePt(001) thin films directly grown on MgO(001)
Laenens, Bart; Almeida, F.M.; Planckaert, Nikie; Temst, Kristiaan; Meersschaut, Johan; Vantomme, Andre; Rentenberger, C.; Rennhofer, Marcus; Sepiol, Bogdan (2009) -
Joint optimization of layout and litho for SRAM and Logic towards the 20 nm node, using 193i
De Bisschop, Peter; Laenens, Bart; Iwase, Kazuya; Yao, Teruyoshi; Dusa, Mircea; Smayling, M. (2011) -
Joint-optimization for SRAM and Logic for 28nm node and below
Verhaegen, Staf; Smayling, Michael C.; De Bisschop, Peter; Laenens, Bart (2010) -
Litho and patterning challenges for memory and logic applications at the 22nm node
Finders, Jo; Dusa, Mircea; Nikolsky, Peter; Van Dommelen, Youri; Watso, Robert; Vandeweyer, Tom; Bekaert, Joost; Laenens, Bart; Van Look, Lieve (2010) -
Mask 3D effect mitigation by source optimization and assist feature placement
Van Look, Lieve; Mochi, Iacopo; Philipsen, Vicky; Gallagher, Emily; Hendrickx, Eric; McIntyre, Greg; Wittebrood, Friso; Lyakhova, Kateryna; de Winter, Laurens; Last, Thorsten; Fliervoet, Timon; Schiffelers, Guido; Finders, Jo; Van Adrichem, Paul; Lyons, Adam; Laenens, Bart; Liddle, Jack; Neumann, Jens Timo (2016) -
Moessbauer studies of complex materials: Energy versus time domain
Planckaert, Nikie; Callens, Riet; Demeter, Joost; Laenens, Bart; Meersschaut, Johan; Sturhahn, Wolfgang; Kharlamova, Svetlana; Temst, Kristiaan; Vantomme, André (2009) -
Multiple patterning...various keys for scaling
Wiaux, Vincent; Wong, Patrick; Vandenbroeck, Nadia; Bekaert, Joost; Laenens, Bart; De Bisschop, Peter; Versluijs, Janko; Vandenberghe, Geert (2010) -
Multiple patterning: a path towards sub-20nm hp
Vandenberghe, Geert; Wong, Patrick; Vandenbroeck, Nadia; Bekaert, Joost; Laenens, Bart; De Bisschop, Peter; Versluijs, Janko; Wiaux, Vincent (2010) -
Multiple patterning: step by step towards 1X nm hp
Wiaux, Vincent; Wong, Patrick; Vandenbroeck, Nadia; Bekaert, Joost; Laenens, Bart; De Bisschop, Peter; Versluijs, Janko; Vandenberghe, Geert (2010) -
Optical proximity stability control of ArF immersion clusters
Van Look, Lieve; Bekaert, Joost; D'have, Koen; Laenens, Bart; Vandenberghe, Geert; Cheng, Shaunee; Schreel, Koen; Gemmink, Jan-Willem (2011) -
Pellicle contribution to optical proximity and critical dimension uniformity for 1.35 numerical aperture immersion ArF lithography
Van Look, Lieve; Bekaert, Joost; Laenens, Bart; Vandenberghe, Geert; Richter, Jan; Bubke, Karsten; Peters, Jan Hendrik; Schreel, Koen; Dusa, Mircea (2011-03) -
Performance of FlexRay, a fully programmable illumination system for generation of freeform sources on high NA immersion systems
Mulder, Melchior; Engelen, Andre; Noordman, Oscar; Streutker, Gert; van Drieenhuizen, Bert; van Nuenen, Cas; Endendijk, Wilfred; Verbeeck, Jef; Bouman, Wim; Bouma, Anita; Kazinczi, Robert; Socha, Robert; Juergens, Dirk; Zimmermann, Joerg; Trauter, Bastian; Bekaert, Joost; Laenens, Bart; Corliss, Daniel; McIntyre, Greg (2010)