Browsing by author "Arnauts, Sophia"

A detailed study of semiconductor wafer drying

Fyen, Wim; Holsteyns, Frank; Bearda, Twan; Arnauts, Sophia; Van Steenbergen, Jan; Doumen, Geert; Kenis, Karine; Mertens, Paul (2004)

A high-performance drying method enabling clustered single wafer wet cleaning

Mertens, Paul; Doumen, Geert; Lauerhaas, Jeff; Kenis, Karine; Fyen, Wim; Meuris, Marc; Arnauts, Sophia; Devriendt, Katia; Vos, Rita; Heyns, Marc (2000)

A synchrotron radiation photoelectron spectroscopy study on atomic-scale wet etching of InAs (111)-A and (111)-B in acidic peroxide solutions: surface chemistry versus kinetics

Abrenica, Graniel; Lebedev, M. V.; Fingerle, M.; Arnauts, Sophia; Calvet, W.; Mayer, T.; De Gendt, Stefan; van Dorp, Dennis (2022)

A wet chemical method for the determination of thickness of SiO2 layers below the nanometer level

De Smedt, Frank; Stevens, G.; De Gendt, Stefan; Cornelissen, Ingrid; Arnauts, Sophia; Meuris, Marc; Heyns, Marc; Vinckier, Chris (1999)

Advanced wafer surface cleaning technology

Mertens, Paul; Vos, Rita; Vereecke, Guy; Arnauts, Sophia; Bearda, Twan; De Waele, Rita; Eitoku, Atsuro; Fyen, Wim; Geckiere, J.; Hellin, David; Holsteyns, Frank; Kesters, Els; Claes, Martine; Kenis, Karine; Kraus, Harald; Malhouitre, Stephane; Lee, Kuntack; Kocsis, Michael; Onsia, Bart; Garaud, Sylvain; Rip, Jens; Snow, Jim; Teerlinck, I.; Van Hoeymissen, Jan; Barbagini, Francesca; Xu, Kaidong; Paraschiv, Vasile; De Gendt, Stefan; Mannaert, Geert; Heyns, Marc (2004)

Aging phenomena in the removal of nano-particles from Si wafers

Vereecke, Guy; Veltens, J.; Xu, Kaidong; Eitoku, A.; Sano, Ken-Ichi; Arnauts, Sophia; Kenis, Karine; Snow, J.; Vinckier, Chris; Mertens, Paul (2008)

Analysis of trace metals in silicon nitride films by a vapor phase decomposition - solution collection approach

Vereecke, Guy; Schaekers, Marc; Verstraete, Kurt; Arnauts, Sophia; Heyns, Marc; Plante, W. (1999)

Analysis of trace metals in thin silicon nitride films by total-reflection X-ray fluorescence

Vereecke, Guy; Arnauts, Sophia; Van Doorne, Patrick; Kenis, Karine; Onsia, Bart; Verstraeten, K.; Schaekers, Marc; Van Hoeymissen, Jan; Heyns, Marc (2001)

Atomic-scale investigations on the wet etching kinetics of Ge versus SiGe in acidic H2O2 solutions: a post operando synchrotron XPS analysis

Abrenica, Graniel; Lebedev, Mikhail; Fingerle, Mathias; Arnauts, Sophia; Bazzazian, Nina; Calvet, Wolfram; Porret, Clément; Bender, Hugo; Mayer, Thomas; De Gendt, Stefan; van Dorp, Dennis (2020)

Atomic-Scale Investigations on the Wet Etching of Group IV Semiconductors in Acidic H2O2 Solution: The Case Ge Versus Si-Ge

van Dorp, Dennis; Abrenica, Graniel; Mayer, T.; Arnauts, Sophia; Altamirano Sanchez, Efrain; De Gendt, Stefan (2021-05)

Challenges with respect to high-k/metal gate stack etching and cleaning

Vos, Rita; Arnauts, Sophia; Bovie, Inge; Onsia, Bart; Garaud, Sylvain; Xu, Kaidong; Yu, HongYu; Kubicek, Stefan; Rohr, Erika; Schram, Tom; Veloso, Anabela; Conard, Thierry; Leunissen, Peter; Mertens, Paul (2007)

Cleaning aspects of novel materials after CMP

Vos, Rita; Wada, M.; Arnauts, Sophia; Takahashi, H.; Cuypers, Daniel; Struyf, Herbert; Mertens, Paul (2011)

Cleaning of III-V materials: surface chemistry considerations

van Dorp, Dennis; Cuypers, Daniel; Arnauts, Sophia; Mertens, Paul; De Gendt, Stefan (2013)

Cleaning of nanoparticles in semiconductor manufacturing

Vereecke, Guy; Arnauts, Sophia; Doumen, Geert; Eitoku, Atsuro; Fransaer, J.; Fyen, Wim; Holsteyns, Frank; Kenis, Karine; Lee, Kuntack; Lux, Marcel; Snow, Jim; Vinckier, Chris; Vos, Rita; Xu, Kaidong; Mertens, Paul (2004)

Clustered single wafer wet cleaning

Mertens, Paul; Holsteyns, Frank; Vos, Rita; Vereecke, Guy; Fyen, Wim; Lauerhaas, Jeff; Xu, Kaidong; Bearda, Twan; Teerlinck, Ivo; Arnauts, Sophia; Kenis, Karine; Schmidt, Michael; Heyns, Marc (2002)

Developments in cleaning technology for critical layers

Heyns, Marc; Arnauts, Sophia; Bearda, Twan; Claes, M.; Cornelissen, Ingrid; De Gendt, Stefan; Doumen, Geert; Fyen, Wim; Loewenstein, Lee; Lux, Marcel; Mertens, Paul; Mertens, S.; Meuris, Marc; Onsia, Bart; Röhr, Erika; Schaekers, Marc; Teerlinck, Ivo; Van Doorne, Patrick; Van Hoeymissen, Jan; Vereecke, Guy; Vos, Rita; Wolke, K. (2000)