Browsing by author "Lindsay, Richard"
Now showing items 1-20 of 77
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A comparison of spike, flash, SPER and laser annealing for 45nm CMOS
Lindsay, Richard; Pawlak, Bartek; Kittl, Jorge; Henson, Kirklen; Torregiani, Cristina; Giangrandi, Simone; Surdeanu, Radu; Vandervorst, Wilfried; Mayur, A.; Ross, J.; McCoy, S.; Gelpey, J.; Elliott, K.; Pagès, Xavier; Satta, Alessandra; Lauwers, Anne; Stolk, P.; Maex, Karen (2003) -
A new technique to fabricate Ultra-Shallow-Junctions, combining in-situ vapour HCl etching and in-situ doped epitaxial SiGe re-growth
Loo, Roger; Caymax, Matty; Meunier-Beillard, Philippe; Peytier, Ivan; Holsteyns, Frank; Kubicek, Stefan; Verheyen, Peter; Lindsay, Richard; Richard, Olivier (2003-01) -
A new technique to fabricate ultra-shallow-junctions, combining in-situ vapour HCl etching and in-situ doped epitaxial SiGe re-growth
Loo, Roger; Caymax, Matty; Meunier-Beillard, Philippe; Peytier, Ivan; Holsteyns, Frank; Kubicek, Stefan; Verheyen, Peter; Lindsay, Richard; Richard, Olivier (2004) -
A practical baseline process for advanced CMOS devices research
Ponomarev, Youri; Loo, Josine; Rittersma, Chris; Lander, Rob; Hooker, Jacob; Doornbos, Gerben; Surdeanu, Radu; Cubaynes, Florence; Dachs, Charles; Kubicek, Stefan; Henson, Kirklen; Lindsay, Richard (2003) -
Advanced front-end processes for the 45nm CMOS technology node
Collart, E.J.H.; Felch, S.B.; Graoui, H.; Tallavarjula, S.; Lindsay, Richard; Pawlak, Bartek; van den Berg, J.A.; Cowern, N.E.B.; Kirby, K.J. (2004) -
Advanced PMOS device architecture for highly-doped ultra-shallow junctions
Surdeanu, Radu; Pawlak, Bartek; Lindsay, Richard; Van Dal, Mark; Doornbos, Gerben; Dachs, C.J.J.; Ponomarev, Youri; Loo, Josine; Cubaynes, Florence; Henson, Kirklen; Verheijen, M.A.; Kaiser, M.; Pagès, Xavier; Stolk, Peter; Jurczak, Gosia (2004) -
An (un)solvable problem in SIMS: B-interfacial profiling
Vandervorst, Wilfried; Janssens, Tom; Loo, Roger; Caymax, Matty; Peytier, Ivan; Lindsay, Richard; Fruehauf, Jens; Bergmaier, A.; Dollinger, G. (2003) -
Analysis of junctions formed in strained Si/SiGe substrates
Eneman, Geert; Simoen, Eddy; Lauwers, Anne; Lindsay, Richard; Verheyen, Peter; Delhougne, Romain; Loo, Roger; Caymax, Matty; Meunier-Beillard, Philippe; Demuynck, Steven; De Meyer, Kristin; Vandervorst, Wilfried (2004) -
Analysis of silicide / diffusion contact resistance making use of transmission line stuctures
Akheyar, Amal; Lauwers, Anne; Lindsay, Richard; de Potter de ten Broeck, Muriel; Tempel, Georg; Maex, Karen (2002) -
Applications of Ni-based silicides to 45 nm CMOS and beyond
Kittl, Jorge; Lauwers, Anne; Chamirian, Oxana; Pawlak, Malgorzata; Van Dal, Mark; Akheyar, Amal; de Potter de ten Broeck, Muriel; Kottantharayil, Anil; Pourtois, Geoffrey; Lindsay, Richard; Maex, Karen (2004) -
Arsenic junction thermal stability and high-dose boron-pocket activation during SPER in nMOS transistors
Severi, Simone; Pawlak, Bartek; Duffy, Ray; Augendre, Emmanuel; Henson, Kirklen; Lindsay, Richard; De Meyer, Kristin (2007) -
Carrier illumination for characterization of ultra-shallow doping profiles
Clarysse, Trudo; Lindsay, Richard; Vandervorst, Wilfried; Budiarto, E.; Borden, Peter (2003) -
Carrier illumination for characterization of ultrashallow doping profiles
Clarysse, Trudo; Lindsay, Richard; Vandervorst, Wilfried; Budiarto, E.; Borden, P. (2004-02) -
Carrier illumination for monitoring of CMOS ultra-shallow junctions
Clarysse, Trudo; Vandervorst, Wilfried; Lindsay, Richard; Borden, P.; Budiarto, E. (2002) -
Challenges in scaling of CMOS devices towards 65nm node
Jurczak, Gosia; Veloso, Anabela; Rooyackers, Rita; Augendre, Emmanuel; Mertens, Sofie; Rothschild, Aude; Schaekers, Marc; Lindsay, Richard; Lauwers, Anne; Henson, Kirklen; Severi, Simone; Pollentier, Ivan; De Keersgieter, An (2003-06) -
Channel engineering and junction overlap issues for ultra-shallow junctions formed by SPER in the 45 nm CMOS technology node
Severi, Simone; Henson, Kirklen; Lindsay, Richard; Lauwers, Anne; Pawlak, Bartek; Surdeanu, Radu; De Meyer, Kristin (2004-04) -
Channel engineering towards a full low temperature process solution for the 45 nm technology node
Severi, Simone; Henson, Kirklen; Lindsay, Richard; Pawlak, Bartek; De Meyer, Kristin (2004) -
Characterization of the B and As pile-up at the Si-SiO2 interface
Fruehauf, Jens; Lindsay, Richard; Vandervorst, Wilfried; Maex, Karen; Bergmaier, A.; Dollinger, G.; Koch, F. (2003) -
Chemical and electrical dopant evolution during solid phase epitaxial regrowth
Pawlak, Bartek; Lindsay, Richard; Vandervorst, Wilfried; Kittl, Jorge; Surdeanu, Radu; Duffy, Ray; Stolk, P. (2003) -
Chemical and electrical dopant profiling for P-type junctions formed by solid phase epitaxial regrowth
Pawlak, Bartek; Lindsay, Richard; Kittl, Jorge; Vandervorst, Wilfried; Clarysse, Trudo; Hoflijk, Ilse; Dieu, B.; Geenen, Luc; Brijs, Bert (2003)