Browsing by author "Nafus, Kathleen"
Now showing items 21-40 of 70
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EUV process establishment through litho and etch for N7 node
Kuwahara, Yuhei; Kawakami, Shinichiro; Kubota, Minoru; Matsunaga, Koichi; Nafus, Kathleen; Foubert, Philippe; Mao, Ming (2016) -
EUV process sensitivities and optimizations for track processing
Shite, Hideo; Bradon, Neil; Nafus, Kathleen; Kitano, Junichi; Kosugi, Hitoshi; Hermans, Jan; Hendrickx, Eric; Foubert, Philippe; Gronheid, Roel; Jehoul, Christiane; Van Den Heuvel, Dieter; Goethals, Mieke; Cheng, Shaunee (2010) -
EUV processing investigation on state-of-the-art coater/developer system
Shite, Hideo; Bradon, Neil; Shimoaoki, T.; Kobayashi, S.; Nafus, Kathleen; Kosugi, Hitoshi; Foubert, Philippe; Hermans, Jan; Hendrickx, Eric; Goethals, Mieke; Gronheid, Roel; Jehoul, Christiane (2011) -
EUV reolution-LWR-sensitivity performance tradeoffs for a polymer bound PAG resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2010) -
EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity
Nagahara, S.; Dinh, C.Q.; Yoshida, Keisuke; Shiraishi, G.; Kondo, Y.; Yoshihara, K.; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Stock, H.; Meliorisz, B. (2020) -
EUV RLS performance tradeoffs for a polymer bound PAG resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2010) -
EUV RLS performance tradeoffs for a polymer bound PAG resist process
Rathsack, Ben; Hooge, Josh; Somervell, Mark; Scheer, Steve; Nafus, Kathleen; Shite, Hideo; Bradon, Neil; Kitano, Junichi; Gronheid, Roel; Vaglio Pret, Alessandro (2009) -
EUV secondary electron blur at the 22nm half pitch node
Gronheid, Roel; Younkin, Todd; Leeson, Michael; Fonseca, Carlos; Hooge, Joshua; Nafus, Kathleen; Biafore, John; Smith, Mark D. (2011) -
Evaluation of integration schemes for contact-hole grapho-epitaxy DSA: a study of substrate and template affinity control
Romo Negreira, Ainhoa; Younkin, Todd; Gronheid, Roel; Demuynck, Steven; Vandenbroeck, Nadia; Seo, Takehito; Guerrero, Douglas; Parnell, Doni; Muramatsu, Makoto; Shinichiro, Kawakami; Takashi, Yamauchi; Nafus, Kathleen; Somervell, Mark (2014) -
Experimental study of sub-DSA resolution assist features (SDRAF)
Yi, Linda; Bekaert, Joost; Gronheid, Roel; Vandenberghe, Geert; Nafus, Kathleen; Wong, H.-S. Philip (2015) -
Exploration of new resist chemistries and process methods for enabling dual-tone development
Fonseca, Carlos; Somervell, M.; Scheer, S.; Kuwahara, Y.; Nafus, Kathleen; Gronheid, Roel; Tarutani, S. (2009) -
Extreme-ultraviolet secondary electron blur at the 22-nm half pitch node
Gronheid, Roel; Younkin, Todd; Leeson, Michael J.; Fonseca, Carlos; Hooge, Joshua S.; Nafus, Kathleen; Biafore, John J.; Smith, Mark D. (2011) -
Feasibility study on dual tone development for frequency doubling
Bernard, Sophie; Fonseca, Carlos; Gronheid, Roel; Hatakeyama, Shinichi; Leeson, Michael; Nafus, Kathleen; Scheer, Steven; Somervell, Marc (2008) -
Focus spot reduction by brush scrubber cleaning
Pacco, Antoine; Kesters, Els; Simms, Ihsan; Nafus, Kathleen; Vandereyken, Jelle; Yonekawa, Hiroki (2014) -
Frequency mulitiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern
Gronheid, Roel; Rincon Delgadillo, Paulina; Younkin, Todd; Pollentier, Ivan; Somervell, Mark; Hooge, Joshua S.; Nafus, Kathleen; Nealey, Paul F. (2012) -
Further investigation of EUV process sensitivities for wafer track processing
Bradon, Neil; Nafus, Kathleen; Shite, Hideo; Kitano, J.; Kosugi, H.; Goethals, Mieke; Cheng, Shaunee; Hermans, Jan; Hendrickx, Eric; Baudemprez, Bart; Van Den Heuvel, Dieter (2010) -
Image contrast contributions to immersion lithography defect formation and process yield
Rathsack, Ben; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Hatakeyama, Shinichi; Kouichi, Hontake; Kitano, Junichi; Van Den Heuvel, Dieter; Leray, Philippe; Hendrickx, Eric; Foubert, Philippe; Gronheid, Roel (2008) -
Implementation of directed self-assembly of block copolymers in the fab for defectivity analysis
Rincon Delgadillo, Paulina; Nealey, Paul; Gronheid, Roel; Matsunaga, Koichi; Somervell, Mark; Nafus, Kathleen; Cao, Yi; Lin, Guanyang (2012) -
Implementation of self-assembly in a 300mm processing environment
Gronheid, Roel; Rincon Delgadillo, Paulina; Nealey, Paul; Younkin, Todd; Matsunaga, Koichi; Somervell, Mark; Nafus, Kathleen (2012) -
Investigation of EUV process sensitivities for wafer track processing
Bradon, Neil; Weichert, Heiko; Nafus, Kathleen; Hatakeyama, Shinichi; Kitano, J.; Kosugi, H.; Yoshihara, K.; Goethals, Mieke; Hermans, Jan (2009)