Browsing by author "Goethals, Mieke"

0.18 μm lithography : using 248 nm deep-UV and top surface imaging

Goethals, Mieke; Van den hove, Luc (1996)

0.25 µm optical lithography based on surface imaging and dry development

Goethals, Mieke; Van den hove, Luc (1994)

157-nm photoresist process optimization for a full-field scanner

Light, Scott; Stepanenko, Nickolay; Gronheid, Roel; Van Roey, Frieda; Van Den Heuvel, Dieter; Goethals, Mieke (2004-03)

157nm full field imaging

Hermans, Jan; Van Roey, Frieda; Van Den Heuvel, Dieter; Goethals, Mieke; Ronse, Kurt (2003-08)

157nm resist process performance and integration challenges on a full field scanner

Goethals, Mieke; Gronheid, Roel; List, Scott; Ercken, Monique; Van Roey, Frieda; Van Den Heuvel, Dieter; Locorotondo, Sabrina; Ronse, Kurt (2004)

193 nm lithography on a full field scanner

Goethals, Mieke; Pollers, Ingrid; Jaenen, Patrick; Van Roey, Frieda; Ronse, Kurt; Heskamp, B.; Davies, G. (1999)

193 nm lithography options: single layer, bilayer and TSI

Goethals, Mieke (1998)

A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography

de Marneffe, Jean-Francois; Goossens, Danny; Vandervorst, Alain; Demuynck, Steven; Goethals, Mieke; Hermans, Jan; Van Roey, Frieda; Baudemprez, Bart; Brus, Stephan; Vrancken, Christa (2008)

Advanced 193 nm step and scan technology

Stoeldraijer, J.; Mulkens, J.; Davies, G.; Sytsma, J.; Bakker, H.; Glatzel, H.; Wagner, C.; Roempp, O.; Boerret, R.; Goethals, Mieke (1998)

Advanced photoresists for 193 nm lithography

Goethals, Mieke; Ronse, Kurt (1999)

Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100

Goethals, Mieke; Van Roey, Frieda; Hosokawa, Kohei; Hoefnagels, Rik; Niroomand, Ardavan; Foubert, Philippe (2012)

Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future

Jonckheere, Rik; Lorusso, Gian; Goethals, Mieke; Ronse, Kurt; Hermans, Jan; De Ruyter, Rudi (2007)

CD control for 180-nm and 130-nm gate-level lithography

Kim, Kee - Ho; Ronse, Kurt; Goethals, Mieke; Vandenberghe, Geert; Van den hove, Luc (1996)

Characterisation of EUV resist related outgassing and contamination

Pollentier, Ivan; Berger, Margaux; Goethals, Mieke; Gronheid, Roel; Leeson, Michael (2009)

Characterization of EUV optics contamination due to photoresist related outgassing

Pollentier, Ivan; Goethals, Mieke; Gronheid, Roel; Steinhoff, J.; Van Dijk, J. (2010)

Correlation of EUV optics contamination and the photoresist chemistry

Pollentier, Ivan; Neira, Imanol; Goethals, Mieke; Gronheid, Roel (2010)

Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology

Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; De Keersgieter, An; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Baudemprez, Bart; Vandeweyer, Tom; Van Roey, Frieda; Baerts, Christina; Goossens, Danny; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Dusa, Mircea; Romijn, Leon; Pigneret, Charles; van Dijk, Andre; Schreutelkamp, Rob; Cockburn, Andrew; Gravey, Virginie; Meiling, H.; Hultermans, B.; Lok, S.; Shah, K.; Rajagopalan, R.; Gelatos, J.; Richard, Olivier; Bender, Hugo; Vandenberghe, Geert; Beyer, Gerald; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2009-12)