Browsing by author "Hatcher, Z."

Advanced single chemistry alkaline cleaning in a STEAG single tank tool

Onsia, Bart; Schellkes, E.; Vos, Rita; De Gendt, Stefan; Doll, O.; Fester, A.; Kolbesen, B. O.; Hoffman, M.; Hatcher, Z.; Wolke, K.; Mertens, Paul; Heyns, Marc (2001)

Advanced single chemistry alkaline cleaning in a STEAG single tank tool

Onsia, Bart; Schellkes, E.; Vos, Rita; De Gendt, Stefan; Doll, O.; Fester, A.; Kolbesen, B.; Hoffman, M.; Hatcher, Z.; Wolke, K.; Mertens, Paul; Heyns, Marc (2002)

Cleaning technology for highly reliable gate oxides

Heyns, Marc; Meuris, Marc; Verhaverbeke, Steven; Mertens, Paul; Schmidt, Harald; Rotondaro, Antonio; Hurd, Trace; Hatcher, Z.; Gräf, D. (1994)

Corrosion of aluminum alloys during drying of metallized wafers

Vos, Rita; Meuris, Marc; Mertens, Paul; Heyns, Marc; Hatcher, Z. (1998)

H2O2 decomposition and its impact on silicon surface roughening and gate oxide integrity

Schmidt, Harald; Meuris, Marc; Rotondaro, Antonio; Heyns, Marc; Hurd, Trace; Hatcher, Z. (1995)

Improved phosphoric acid mixtures for nitride strip

Vos, Rita; Lux, Marcel; Conard, Thierry; De Witte, Hilde; Mertens, Paul; Heyns, Marc; Hatcher, Z. (2001)

Just-Clean- Enough technology for the 21st century

Heyns, Marc; Meuris, Marc; Mertens, Paul; Hurd, Trace; Schmidt, Harald; Depas, Michel; Rotondaro, Antonio; Vermeire, Bert; Vandervorst, Wilfried; Storm, Wolfgang; Polleunis, C.; Bertrand, P.; McGeary, M. J.; Lubbers, A.; Hatcher, Z. (1995)

Physico chemical aspects of hydrogen peroxide based silicon wafer cleaning solutions

Schmidt, Harald; Meuris, Marc; Mertens, Paul; Rotondaro, Antonio; Heyns, Marc; Hurd, Trace; Hatcher, Z. (1994)

Quantitative modeling of H2O2 decomposition in SC1

Mertens, Paul; Baeyens, Martien; Moyaerts, Gert; Okorn-Schmidt, H. F.; Vos, Rita; De Waele, Rita; Hatcher, Z.; Hub, W.; De Gendt, Stefan; Knotter, Martin; Meuris, Marc; Heyns, Marc (1998)

Removal of submicrometer particles from silicon wafer surfaces using HF-based cleaning mixtures

Vos, Rita; Lux, Marcel; Xu, Kaidong; Fyen, Wim; Kenens, Conny; Conard, Thierry; Mertens, Paul; Heyns, Marc; Hatcher, Z.; Hoffman, M. (2001)

Single chemistry cleaning solution for advanced wafer cleaning

Vos, Rita; Doll, O.; Fester, A.; Kolbesen, B. O.; Lux, Marcel; Kenis, Karine; Onsia, Bart; De Gendt, Stefan; Schellkes, E.; Hatcher, Z.; Mertens, Paul; Heyns, Marc (2001)

The importance of H2O2 decomposition in silicon surface cleaning

Schmidt, Harald; Meuris, Marc; Mertens, Paul; Rotondaro, Antonio; Heyns, Marc; Hurd, Trace; Hatcher, Z. (1994)

Ultra clean processing technologies: advanced si-surface preparation techniques

Heyns, Marc; Meuris, Marc; Mertens, Paul; Hurd, Trace; Schmidt, Harald; Verhaverbeke, Steven; Hatcher, Z.; Gräf, D. (1994)

Ultra Clean Processing Technologies: Advanced Si-Surface Preparation Techniques

Heyns, Marc; Meuris, Marc; Mertens, Paul; Hurd, Trace; Schmidt, Harald; Verhaverbeke, Steven; Hatcher, Z.; Gräf, D. (1994)

Ultra clean processing technology for highly reliable gate oxides

Heyns, Marc; Meuris, Marc; Mertens, Paul; Schmidt, Harald; Verhaverbeke, Steven; Bender, Hugo; Vandervorst, Wilfried; Caymax, Matty; Rotondaro, Antonio; Hatcher, Z.; Gräf, D. (1994)

Use of surfactants for improved particle performance of dHF-based cleaning recipes

Vos, Rita; Xu, Kaidong; Lux, Marcel; Fyen, Wim; Singh, R.; Chen, Zhi Yong; Mertens, Paul; Hatcher, Z.; Heyns, Marc (2001)