Browsing by author "Kim, Min-Soo"
Now showing items 21-40 of 49
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FEOL patterning challenges in scaled SRAM with vertical Surrounding Gate Transistors (SGT)
Tao, Zheng; Li, Waikin; Kim, Min-Soo; Devriendt, Katia; Lorant, Christophe; Sebaai, Farid; Porret, Clément; Rosseel, Erik; Sepulveda Marquez, Alfonso; Jourdan, Nicolas; Kikuchi, Yoshiaki; Boemmels, Juergen; Mitard, Jerome; Matagne, Philippe; Ragnarsson, Lars-Ake; Dangol, Anish; Batuk, Dmitry; Martinez Alanis, Gerardo Tadeo; Geypen, Jef; Altamirano Sanchez, Efrain; Lee, James; Li, YiSuo; Kanazawa, Kenichi; Harada, Nozomu; Masuoka, Fujio (2019) -
FinFET: Towards a new horizon
Kim, Min-Soo (2013) -
Gate-all-around MOSFETs based on vertically stacked horizontal Si nanowires in a replacement metal gate process on bulk Si substrates
Mertens, Hans; Ritzenthaler, Romain; Hikavyy, Andriy; Kim, Min-Soo; Tao, Zheng; Wostyn, Kurt; Chew, Soon Aik; De Keersgieter, An; Mannaert, Geert; Rosseel, Erik; Schram, Tom; Devriendt, Katia; Tsvetanova, Diana; Dekkers, Harold; Demuynck, Steven; Vaisman Chasin, Adrian; Van Besien, Els; Dangol, Anish; Godny, Stephane; Douhard, Bastien; Bosman, Niels; Richard, Olivier; Geypen, Jef; Bender, Hugo; Barla, Kathy; Mocuta, Dan; Horiguchi, Naoto; Thean, Aaron (2016) -
Gate-all-around transistors based on vertically stacked Si nanowires
Mertens, Hans; Ritzenthaler, Romain; Hikavyy, Andriy; Kim, Min-Soo; Tao, Zheng; Wostyn, Kurt; Schram, Tom; Kunnen, Eddy; Ragnarsson, Lars-Ake; Dekkers, Harold; Hopf, Toby; Devriendt, Katia; Tsvetanova, Diana; Chew, Soon Aik; Kikuchi, Yoshiaki; Van Besien, Els; Rosseel, Erik; Mannaert, Geert; De Keersgieter, An; Vaisman Chasin, Adrian; Kubicek, Stefan; Dangol, Anish; Demuynck, Steven; Barla, Kathy; Mocuta, Dan; Horiguchi, Naoto (2017) -
Higher-k ALD Sr-rich SrTiO3 for DRAM MIMCAP Application
Tomida, Kazuyuki; Swerts, Johan; Popovici, Mihaela Ioana; Kaczer, Ben; Clima, Sergiu; Pawlak, Malgorzata; Kim, Min-Soo; Afanasiev, Valeri; Kittl, Jorge; Jurczak, Gosia (2013) -
Impact of crystallization behavior of SrxTiyOz films on electrical properties of metal-insulator-metal capacitors with TiN electrodes
Pawlak, Malgorzata; Kaczer, Ben; Kim, Min-Soo; Popovici, Mihaela Ioana; Tomida, Kazuyuki; Swerts, Johan; Opsomer, Karl; Polspoel, Wouter; Favia, Paola; Vrancken, Christa; Demeurisse, Caroline; Wang, W.-C.; Afanasiev, Valeri; Vandervorst, Wilfried; Bender, Hugo; Debusschere, Ingrid; Altimime, Laith; Kittl, Jorge (2010) -
Impact of fin shape variability on device performance towards 10nm node
Tomida, Kazuyuki; Hiraga, Keizo; Dehan, Morin; Hellings, Geert; Jang, Doyoung; Miyaguchi, Kenichi; Chiarella, Thomas; Kim, Min-Soo; Mocuta, Anda; Horiguchi, Naoto; Mercha, Abdelkarim; Verkest, Diederik; Thean, Aaron (2015) -
Impact of multi-gate device architectures on digital and analog circuits and its implications on system-on-chip technologies
Thean, Aaron; Wambacq, Piet; Lee, Jae Woo; Cho, Moon Ju; Veloso, Anabela; Sasaki, Yuichiro; Chiarella, Thomas; Miyaguchi, Kenichi; Parvais, Bertrand; Garcia Bardon, Marie; Schuddinck, Pieter; Kim, Min-Soo; Horiguchi, Naoto; Dehan, Morin; Mercha, Abdelkarim; Van der Plas, Geert; Collaert, Nadine; Verkest, Diederik (2013) -
Impact of the plasma ambient and the ruthenium precursor on the growth of ruthenium films by plasma enhanced atomic layer deposition
Swerts, Johan; Delabie, Annelies; Salimullah M. M., Salimullah; Popovici, Mihaela Ioana; Kim, Min-Soo; Schaekers, Marc; Van Elshocht, Sven (2012) -
Improved EOT and leakage current for metal-insulator-metal capacitor stacks with rutile TiO2
Popovici, Mihaela Ioana; Kim, Min-Soo; Tomida, Kazuyuki; Swerts, Johan; Tielens, Hilde; Moussa, Alain; Richard, Olivier; Bender, Hugo; Franquet, Alexis; Conard, Thierry; Altimime, Laith; Van Elshocht, Sven; Kittl, Jorge (2011) -
Improved sidewall doping with small implant angle by AsH3 Ion assisted deposition and doping process for scaled NMOS Si bulk FinFETs
Sasaki, Yuichiro; Godet, Ludovic; Chiarella, Thomas; Brunco, David; Rockwell, Tyler; Lee, Jae Woo; Colombeau, Benjamin; Togo, Mitsuhiro; Chew, Soon Aik; Zschaetzsch, Gerd; Noh, Kyung Bong; De Keersgieter, An; Boccardi, Guillaume; Kim, Min-Soo; Hellings, Geert; Martin, Patrick; Vandervorst, Wilfried; Thean, Aaron; Horiguchi, Naoto (2013) -
Improvement of the CMOS characteristics of bulk Si FinFETs by high temperature ion implantation
Kikuchi, Yoshiaki; Hopf, Toby; Mannaert, Geert; Tao, Zheng; Waite, A.; Cournoyer, J.; Borniquel, J.; Schreutelkamp, Rob; Ritzenthaler, Romain; Kim, Min-Soo; Kubicek, Stefan; Chew, Soon Aik; Devriendt, Katia; Schram, Tom; Demuynck, Steven; Variam, N.; Horiguchi, Naoto; Mocuta, Dan (2016) -
Interconnects for scaled SRAM with vertical Surrounded Gate Transistors (SGT)
Boemmels, Juergen; Harada, N.; Kim, Min-Soo; Mitard, Jerome; Kikuchi, Yoshiaki; Li, Waikin; Tao, Zheng; Puliyalil, Harinarayanan; Devriendt, Katia; Lorant, Christophe; Le, Quoc Toan; Kesters, Els; Jourdan, Nicolas; El-Mekki, Zaid; Teugels, Lieve; van der Veen, Marleen; Li, Y.; Nakamura, H.; Mocuta, Dan; Masuoka, F. (2019) -
Investigation of leakage mechanisms in ALD Sr-rich SrTiO films
Kaczer, Ben; Wang, W. C.; Afanasiev, Valeri; Pawlak, Malgorzata; Kim, Min-Soo; Tomida, Kazuyuki; Debusschere, Ingrid; Van Elshocht, Sven; Altimime, Laith; Kittl, Jorge (2010) -
Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and process variability at 7nm technology node
Sakhare, Sushil; Trivkovic, Darko; Mountsier, Tom; Kim, Min-Soo; Mocuta, Dan; Ryckaert, Julien; Mercha, Abdelkarim; Verkest, Diederik; Thean, Aaron; Dusa, Mircea (2015) -
Novel junction design for NMOS Si bulk-FinFETs with extension doping by phosphorus doped silicate glass
Sasaki, Yuichiro; Ritzenthaler, Romain; Kimura, Y.; De Roest, David; Shi, Xiaoping; De Keersgieter, An; Kim, Min-Soo; Chew, Soon Aik; Kubicek, Stefan; Schram, Tom; Kikuchi, Yoshiaki; Demuynck, Steven; Veloso, Anabela; Vandervorst, Wilfried; Horiguchi, Naoto; Mocuta, Dan; Mocuta, Anda; Thean, Aaron (2015) -
Patterning challenges in advanced device architectures: FinFETs to nanowire
Horiguchi, Naoto; Milenin, Alexey; Tao, Zheng; Hody, Hubert; Altamirano Sanchez, Efrain; Veloso, Anabela; Witters, Liesbeth; Waldron, Niamh; Ragnarsson, Lars-Ake; Kim, Min-Soo; Kikuchi, Yoshiaki; Mertens, Hans; Raghavan, Praveen; Piumi, Daniele; Collaert, Nadine; Barla, Kathy; Thean, Aaron (2016) -
Plasma enhanced atomic layer deposited Ru for MIMCAP applications
Swerts, Johan; Salimullah, M.M.; Popovici, Mihaela Ioana; Kim, Min-Soo; Pawlak, Malgorzata; Delabie, Annelies; Schaekers, Marc; Tomida, Kazuyuki; Kaczer, Ben; Opsomer, Karl; Vrancken, Christa; Debusschere, Ingrid; Altimime, Laith; Kittl, Jorge; Van Elshocht, Sven (2011) -
Process development of ALD-rutile-TiO2/Ru(Ox) for DRAM MIMcap application and its leakage mechanism analysis
Tomida, Kazuyuki; Popovici, Mihaela Ioana; Swerts, Johan; Wang, Mugwort; Kaczer, Ben; Pawlak, Malgorzata; Van Elshocht, Sven; Kim, Min-Soo; Debusschere, Ingrid; Afanasiev, Valeri; Altimime, Laith; Kittl, Jorge (2011) -
RMG Technology Integration in FinFET Devices
Boccardi, Guillaume; Ritzenthaler, Romain; Togo, Mitsuhiro; Chiarella, Thomas; Kim, Min-Soo; Sasaki, Yuichiro; Veloso, Anabela; Chew, Soon Aik; Vecchio, Emma; Locorotondo, Sabrina; Devriendt, Katia; Ong, Patrick; Brus, Stephan; Horiguchi, Naoto; Thean, Aaron (2012)