Browsing by author "de Potter de ten Broeck, Muriel"
Now showing items 21-40 of 66
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Effect of implantation oxide on the Ti- and Co-silicidation of narrow diffusion and poly-lines
Lauwers, Anne; Naem, Abdalla; de Potter de ten Broeck, Muriel; Maex, Karen (1998) -
Effects of alloying on properties of NiSi for CMOS applications
Van Dal, Mark; Akheyar, Amal; Kittl, Jorge; Chamirian, Oxana; de Potter de ten Broeck, Muriel; Demeurisse, Caroline; Lauwers, Anne; Maex, Karen (2004) -
Electrical performance and scalability of Ni-monosilicide towards sub 0.13 μm technologies
Lauwers, A.; de Potter de ten Broeck, Muriel; Lindsay, Richard; Steegen, An; Roelandts, Nico; Lossen, F.; Vrancken, Christa; Maex, Karen (2001) -
Elevated co-silicide for sub-100nm high performance and RF CMOS
Jurczak, Gosia; de Potter de ten Broeck, Muriel; Rooyackers, Rita; Jeamsaksiri, Wutthinan; Redolfi, Augusto; Grau, Lluis; Lauwers, Anne; Lindsay, Richard; Peytier, Ivan; Augendre, Emmanuel; Badenes, Gonçal (2002) -
Epitaxial diamond-hexagonal silicon nano-ribbon growth on (001) silicon
Qiu, Yang; Bender, Hugo; Richard, Olivier; Kim, Min-Soo; Van Besien, Els; Vos, Ingrid; de Potter de ten Broeck, Muriel; Mocuta, Dan; Vandervorst, Wilfried (2015) -
Epitaxial growth of diamond-hexagonal silicon on silicon
Qiu, Yang; Bender, Hugo; Richard, Olivier; Kim, Min-Soo; Vos, Ingrid; de Potter de ten Broeck, Muriel; Van Besien, Els; Mocuta, Dan; Vandervorst, Wilfried (2015) -
FUSI specific yield monitoring enabling improved circuit performance and fast feedback to production
Chiarella, Thomas; Rosmeulen, Maarten; Tigelaar, Howard; Kerner, Christoph; Nackaerts, Axel; Ramos, Javier; Lauwers, Anne; Veloso, Anabela; Jurczak, Gosia; Rothschild, Aude; Witters, Liesbeth; Yu, HongYu; Kittl, Jorge; Verbeeck, Rita; de Potter de ten Broeck, Muriel; Debusschere, Ingrid; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2007-03) -
Gate-source-drain architecture impact on DC and performance of sub-100-nm elevated source/drain NMOS transistors
Jeamsaksiri, Wutthinan; Jurczak, Gosia; Grau, Lluis; Linten, Dimitri; Augendre, Emmanuel; de Potter de ten Broeck, Muriel; Rooyackers, Rita; Wambacq, Piet; Badenes, Gonçal (2003) -
L-shape spacer architecture for low cost, high performance CMOS
Augendre, Emmanuel; Perello, Carles; Vandamme, Ewout; Pochet, Sandrine; Rooyackers, Rita; Beckx, Stephan; de Potter de ten Broeck, Muriel; Lauwers, A.; Badenes, Gonçal (2001) -
Laser annealed junctions: process integration sequence optimization for advanced CMOS technologies
Hoffmann, Thomas Y.; Noda, Taiji; Felch, S.; Severi, Simone; Parihar, V.; Forstner, H.; Vrancken, Christa; de Potter de ten Broeck, Muriel; Van Daele, Benny; Bender, Hugo; Niwa, Masaaki; Schreutelkamp, Rob; Vandervorst, Wilfried; Biesemans, Serge; Absil, Philippe (2007) -
Laser-annealed junctions with advanced CMOS gate stacks for 32nm node: perspectives on device performance and manufacturability
Ortolland, Claude; Noda, Taiji; Chiarella, Thomas; Kubicek, Stefan; Kerner, Christoph; Vandervorst, Wilfried; Opdebeeck, Ann; Vrancken, Christa; Horiguchi, Naoto; de Potter de ten Broeck, Muriel; Aoulaiche, Marc; Rosseel, Erik; Felch, S.B.; Absil, Philippe; Schreutelkamp, Rob; Biesemans, Serge; Hoffmann, Thomas Y. (2008) -
Linewidth dependence of the reverse bias junction leakage for co-silicided source/drain junctions
Lauwers, Anne; de Potter de ten Broeck, Muriel; Lindsay, Richard; Chamirian, Oxana; Demeurisse, Caroline; Vrancken, Christa; Maex, Karen (2002) -
Low temperature spike anneal for Ni-Silicide formation
Lauwers, Anne; Kittl, Jorge; Van Dal, Mark; Chamirian, Oxana; Lindsay, Richard; de Potter de ten Broeck, Muriel; Demeurisse, Caroline; Vrancken, Christa; Maex, Karen (2004-11) -
Manufacturability issues for application of silicides in 0.25 μm CMOS process and beyond
Wang, Qingfeng; Lauwers, Anne; Jonckx, Franky; de Potter de ten Broeck, Muriel; Chen, Chun-Cho; Maex, Karen (1996) -
Materials aspects, electrical performance, and scalability of Ni-silicide towards sub-0.13μm technologies
Lauwers, A.; Steegen, An; de Potter de ten Broeck, Muriel; Lindsay, Richard; Satta, Alessandra; Bender, Hugo; Maex, Karen (2001) -
Ni fully silicided gates for 45 nm CMOS applications
Kittl, Jorge; Lauwers, Anne; Kmieciak, Malgorzata; Van Dal, Mark; Veloso, Anabela; Kottantharayil, Anil; Pourtois, Geoffrey; Demeurisse, Caroline; Schram, Tom; Brijs, Bert; de Potter de ten Broeck, Muriel; Vrancken, Christa; Maex, Karen (2005-08) -
Ni silicide morphology on small features
Chamirian, Oxana; Lauwers, Anne; Kittl, Jorge; Van Dal, Mark; de Potter de ten Broeck, Muriel; Vrancken, Christa; Lindsay, Richard; Maex, Karen (2004) -
Ni- and Co-based silicides for advanced CMOS applications
Kittl, Jorge; Lauwers, Anne; Chamirian, Oxana; Van Dal, Mark; Akheyar, Amal; de Potter de ten Broeck, Muriel; Lindsay, Richard; Maex, Karen (2003) -
Ni-based silicides for 45 nm CMOS and beyond
Lauwers, Anne; Kittl, Jorge; Van Dal, Mark; Chamirian, Oxana; Kmieciak, Malgorzata; de Potter de ten Broeck, Muriel; Lindsay, Richard; Raymakers, Toon; Pagès, Xavier; Mebarki, Bencherki; Mandrekar, Tushar; Maex, Karen (2004) -
Ni-based silicides: material issues for advanced CMOS applications
Kittl, Jorge; Lauwers, Anne; Chamirian, Oxana; Van Dal, Mark; Akheyar, Amal; Richard, Olivier; Lisoni, Judit; de Potter de ten Broeck, Muriel; Lindsay, Richard; Maex, Karen (2003)