Browsing by author "Van Roey, Frieda"
Now showing items 21-40 of 71
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EUV resist material performance, progress and process improvements at imec
Goethals, Mieke; Niroomand, Ardavan; Ban, Keundo; Hosokawa, Kohei; Van Roey, Frieda; Pollentier, Ivan; Jehoul, Christiane; Van Den Heuvel, Dieter; Ronse, Kurt (2010) -
EUV resist performance update on ADT and NXE:3100 scanner
Goethals, Mieke; Niroomand, Ardavan; Hosokawa, Kohei; Van Roey, Frieda; Pollentier, Ivan; Van Den Heuvel, Dieter (2011) -
EUV resist process development for full field imaging
Niroomand, Ardavan; Goethals, Mieke; Van Roey, Frieda; Kim, Byeong Soo; Lorusso, Gian; Pollentier, Ivan; Jonckheere, Rik; Ronse, Kurt (2007) -
EUV resist process performance investigations on the NXE 3100 full field scanner
Goethals, Mieke; Foubert, Philippe; Hosokawa, Kohei; Van Roey, Frieda; Niroomand, Ardavan; Van Den Heuvel, Dieter; Pollentier, Ivan (2012) -
EUV resist screening: current performance and issues
Goethals, Mieke; Gronheid, Roel; Leunissen, Peter; Van Roey, Frieda; Solak, Harun (2005-06) -
Flare in extreme ultraviolet lithography: metrology, out-of-band radiation, fractal point spread function, and flare map calibration
Lorusso, Gian; Van Roey, Frieda; Hendrickx, Eric; Fenger, Germain; Lam, Michael; Christian, Zuniga; Habib, Mohamed; Diab, Hesham; Word, James (2009) -
Fluid-photoresist interactions and imaging in high-index immersion lithography
Tran, H.V.; Hendrickx, Eric; Van Roey, Frieda; Vandenberghe, Geert; French, R.H. (2009) -
Full field EUV lithography: lessons learnt on EUV ADT imaging, EUV resist, and EUV reticles
Hendrickx, Eric; Goethals, Mieke; Niroomand, Ardavan; Jonckheere, Rik; Van Roey, Frieda; Lorusso, Gian; Hermans, Jan; Baudemprez, Bart; Ronse, Kurt (2008) -
Full-field EUV and immersion lithography integration in 0.186μm² FinFET 6T-SRAM cell
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Demand, Marc; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Keersgieter, An; Delvaux, Christie; De Backer, Johan; Brus, Stephan; Hermans, Jan; Baudemprez, Bart; Van Roey, Frieda; Lorusso, Gian; Baerts, Christina; Goossens, Danny; Vrancken, Christa; Mertens, Sofie; Versluijs, Janko; Truffert, Vincent; Huffman, Craig; Laidler, David; Heylen, Nancy; Ong, Patrick; Parvais, Bertrand; Rakowski, Michal; Verhaegen, Staf; Hikavyy, Andriy; Meiling, H.; Hultermans, B.; Romijn, L.; Pigneret, C.; Lok, S.; Van Dijk, A.; Shah, K.; Noori, A.; Gelatos, J.; Arghavani, R.; Schreutelkamp, Rob; Boelen, Pieter; Richard, Olivier; Bender, Hugo; Witters, Liesbeth; Collaert, Nadine; Rooyackers, Rita; Absil, Philippe; Lauwers, Anne; Jurczak, Gosia; Hoffmann, Thomas Y.; Vanhaelemeersch, Serge; Cartuyvels, Rudi; Ronse, Kurt; Biesemans, Serge (2008) -
High refractive index fluid evaluations: fluid radiation durabilitylifetimes and fluid/resist interactions
French, Roger H.; Bernfeld, Adam S.; Tran, Hoang V.; Adelman, Douglas J.; Liberman, Vladimir; Rothschild, Mordechai; Hendrickx, Eric; Van Roey, Frieda (2008) -
High-index immersion fluids enabling cost-effective single-exposure lithography for 32nm half pitches
French, Roger H.; Tran, Hoang V.; Adelman, Doug J.; Rogado, Nyrissa S.; Kaku, Mureo; Mocella, Michael; Chen, Charles Y.; Hendrickx, Eric; Van Roey, Frieda; Bernfeld, Adam S.; Derryberry, Rebekah A. (2008) -
Imaging performance of the EUV alpha demo tool at IMEC
Lorusso, Gian; Hermans, Jan; Goethals, Mieke; Baudemprez, Bart; Van Roey, Frieda; Myers, Alan; Kim, In Sung; Kim, Byeong Soo; Jonckheere, Rik; Niroomand, Ardavan; Lok, E.; Van Dijk, A.; de Marneffe, Jean-Francois; Demuynck, Steven; Goossens, Danny; Ronse, Kurt (2008) -
Implementation of ArF resist processes for 130nm and below
Goethals, Mieke; Van Roey, Frieda; Vandenberghe, Geert; Jaenen, Patrick; Pollers, Ingrid; Pollentier, Ivan; Ronse, Kurt (2000) -
Implementing full field EUV lithography using the ADT
Goethals, Mieke; Hendrickx, Eric; Jonckheere, Rik; Lorusso, Gian; Baudemprez, Bart; Hermans, Jan; Laidler, David; Niroomand, Ardavan; Van Roey, Frieda; van Dijk, Andre; Romijn, Leon; Stepanenko, Nickolay; Timoshkov, Vadim; Iwamoto, Fumio; Myers, Alan; Hyun, Yoonsuk; Lim, Changmoon; Pollentier, Ivan; Leeson, Michael; de Marneffe, Jean-Francois; Demuynck, Steven; Ronse, Kurt (2008) -
Integrated silylation and dry development of resist for sub-0.15µm top surface imaging applications
Vertommen, Johan; Klippert, W.; Goethals, Mieke; Van Roey, Frieda (1998) -
Introducing 193 nm lithography
Pollers, Ingrid; Jaenen, Patrick; Van Roey, Frieda; Goethals, Mieke; Ronse, Kurt; Davies, G.; Heskamp, B.; Bakker, H.; McCoo, E.; Mulkens, J.; Stoeldraijer, J.; Sytsma, J.; Van der Vleuten, B.; Vleeming, Bert; Tzviatkov, Plamen; Van Driessche, Veerle; Slater, S. (1998) -
Line-edge roughness reduction and CD slimming using hardback processing
Peters, R.D.; Lucas, K.; Cobb, J.L.; Parker, C.; Patterson, K.; McCauley, R.; Ercken, Monique; Van Roey, Frieda; Vandenbroeck, Nadia; Pollentier, Ivan (2003) -
Lithographic performance of 193 nm resist
Goethals, Mieke; Pollers, Ingrid; Van Roey, Frieda; Sugihara, Takashi; Ronse, Kurt; Heskamp, B.; Davies, G.; Gehoel-van Ansem, W.; Paniez, P.; Temerson, T. M.; Hien, S.; Mortini, B.; Romeo, C. (1998) -
Lithographic performance of 193 nm single and bi-layer materials
Goethals, Mieke; Pollers, Ingrid; Van Roey, Frieda; Sugihara, Takashi; Ronse, Kurt; Van Driessche, Veerle; Tzviatkov, Plamen; Medina, A.; Gabor, A.; Blakeney, A.; Steinhausler, T.; Biafore, J.; Slater, S.; Nalamasu, O.; Houlihan, F.; Kometani, J.; Timko, A.; Cirelli, R. (1998) -
Lithographic process studies of 193 nm photoresists from six major commercial suppliers
Okoroanyanwu, U.; Levinson, H.; Goethals, Mieke; Van Roey, Frieda (1998)