Browsing by author "Le, Quoc Toan"
Now showing items 21-40 of 161
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Buried Power Rail Metal exploration towards the 1 nm Node
Gupta, Anshul; Radisic, Dunja; Maes, J.W.; Varela Pedreira, Olalla; Soulie, Jean-Philippe; Jourdan, Nicolas; Mertens, Hans; Bandyopadhyay, Sudip; Le, Quoc Toan; Pacco, Antoine; Heylen, Nancy; Vandersmissen, Kevin; Devriendt, Katia; Zhu, C.; Datta, S.; Sebaai, Farid; Wang, S.; Mousa, M.; Lee, J.; Geypen, Jef; De Wachter, Bart; Chehab, Bilal; Salahuddin, Shairfe Muhammad; Murdoch, Gayle; Biesemans, Serge; Tokei, Zsolt; Dentoni Litta, Eugenio; Horiguchi, Naoto (2021) -
Challenges and novel approaches for photo resist removal and post-etch residue removal for 22 nm interconnects
Mertens, Paul; Kim, Tae-Gon; Claes, Martine; Le, Quoc Toan; Vereecke, Guy; Kesters, Els; Suhard, Samuel; Pacco, Antoine; Lux, Marcel; Kenis, Karine; Urbanowicz, Adam; Tokei, Zsolt; Beyer, Gerald (2009) -
Challenges in BEOL cleaning for the 10 nm node and beyond
Yu, David; Le, Quoc Toan; Braun, Simon; Kesters, Els; Shen, Mary; Klipp, Andreas; Holsteyns, Frank (2014) -
Challenges in uniform etching of Ruthenium
Le, Quoc Toan; Verdonck, Patrick; Pacco, Antoine; Altamirano Sanchez, Efrain (2021) -
Challenges of clean/strip processing for Cu/LowK technology
Baklanov, Mikhaïl; Le, Quoc Toan; Kesters, Els; Iacopi, Francesca; Van Aelst, Joke; Struyf, Herbert; Boullart, Werner; Vanhaelemeersch, Serge; Maex, Karen (2004) -
Characterisation and integration feasibility of JSR's low-k dielectric LKD-5109
Das, Arabinda; Kokubo, Terukazu; Furukawa, Yukiko; Struyf, Herbert; Vos, Ingrid; Sijmus, Bram; Iacopi, Francesca; Van Aelst, Joke; Le, Quoc Toan; Carbonell, Laure; Brongersma, Sywert; Maenhoudt, Mireille; Tokei, Zsolt; Vervoort, Iwan; Sleeckx, Erik; Stucchi, Michele; Schaekers, Marc; Boullart, Werner; Rosseel, Erik; Van Hove, Marleen; Vanhaelemeersch, Serge; Shiota, A.; Maex, Karen (2002) -
Characterisation of JSR's spin-on hardmask FF-02
Das, Arabinda; Le, Quoc Toan; Furukawa, Yukiko; Nguyen Hoang, Viet; Terzieva, Valentina; de Theije, Femke; Whelan, Caroline; Maenhoudt, Mireille; Struyf, Herbert; Tokei, Zsolt; Iacopi, Francesca; Stucchi, Michele; Carbonell, Laure; Vos, Ingrid; Bender, Hugo; Patz, M.; Beyer, Gerald; Van Hove, Marleen; Maex, Karen (2003) -
Characterization and removal of post-etch residues in interconnect patterning
Le, Quoc Toan; de Marneffe, Jean-Francois; Conard, Thierry; Lux, Marcel; Vereecke, Guy (2010) -
Characterization of etch residues generated on damascene structures
Le, Quoc Toan; Kesters, Els; Hoflijk, Ilse; Conard, Thierry; Shen, M.; Braun, S.; Burk, Y.; Holsteyns, Frank (2016) -
Characterization of low-k dielectric etch residue on the sidewall by chemical force microscope
Kim, Tae-Gon; Le, Quoc Toan; Suhard, Samuel; Lux, Marcel; Vereecke, Guy; Claes, Martine; Struyf, Herbert; De Gendt, Stefan; Mertens, Paul; Heyns, Marc (2010) -
Characterization of modification of 193-nm photoresist by HBr plasma
Vereecke, Guy; Claes, Martine; Le, Quoc Toan; Kesters, Els; Struyf, Herbert; Carleer, Robert; Adriaensens, Peter (2011) -
Characterization of modification of 193-nm photoresist by HBr plasma
Vereecke, Guy; Claes, Martine; Le, Quoc Toan; Kesters, Els; Struyf, Herbert; Carleer, Robert; Adriaensens, Peter (2011) -
Characterization of patterned porous dielectrics after plasma patterning and subsequent wet processing
Le, Quoc Toan; Kesters, Els; Decoster, Stefan; Chan, BT; Holsteyns, Frank; De Gendt, Stefan (2015) -
Characterization of patterned porous low-k dielectrics: surface sealing and residue removal by wet processing/cleaning
Le, Quoc Toan; Kesters, Els; Decoster, Stefan; Chan, BT; Nguyen, Mai Phuong; Conard, Thierry; Vanleenhove, Anja; Holsteyns, Frank; De Gendt, Stefan (2016) -
Characterization of post-etch photoresists used in metal hardmask and photoresist mask patterning schemes
Kesters, Els; Claes, Martine; Lux, Marcel; Le, Quoc Toan; Vereecke, Guy; Franquet, Alexis; Conard, Thierry; Mertens, Paul; Adriaensens, Peter; Carleer, Robert; Biebuyck, J.J.; Van Veltem, P.; Bebelman, Sabine (2007) -
Chemical and structural modifications in a 193-nm photoresist after low-k dry etch
Kesters, Els; Claes, Martine; Le, Quoc Toan; Lux, Marcel; Franquet, Alexis; Vereecke, Guy; Mertens, Paul; Frank, Martin M.; Carleer, Robert; Adriaensens, Peter; Biebuyck, J.J.; Bebelman, Sabine (2008) -
Cleaning and etching solutions for the prospective use of Molybdenum in next generation interconnect fabrication.
Pacco, Antoine; Le, Quoc Toan; Akanishi, Yuya; Altamirano Sanchez, Efrain (2020) -
Cleaning of post-etch photoresist layer on patterned surface using organic solvent combined with physical forces
Le, Quoc Toan; Chiodarelli, Nicolo; Blum, Ivan; Kesters, Els; Lux, Marcel; Claes, Martine; Vereecke, Guy; Mertens, Paul (2007-04) -
Co and Ru dual damascene compatible metallization studies
van der Veen, Marleen; Heylen, Nancy; Lariviere, Stephane; Vega Gonzalez, Victor; Kesters, Els; Le, Quoc Toan; Teugels, Lieve; Chew, Soon Aik; Philipsen, Harold; Hung, Joey; Adelmann, Christoph; Vanstreels, Kris; Jourdan, Nicolas; Holsteyns, Frank; Struyf, Herbert; Wilson, Chris; Tokei, Zsolt (2019) -
Cobalt pre-metallization clean and functional water rinse in BEOL interconnect
Kesters, Els; Le, Quoc Toan; van der Veen, Marleen; Akanishi, Yuya; Hideaki, Iino; Mizutani, Atsushi; Holsteyns, Frank (2019)