Browsing by author "Rohr, Erika"
Now showing items 21-40 of 42
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Low-frequency noise analysis of the impact of an LaO cap layer in HfSiON/Ta2C gate stack nMOSFETs
Simoen, Eddy; Akheyar, Amal; Rohr, Erika; Mercha, Abdelkarim; Claeys, Cor (2009) -
Molecular beam epitaxy for advanced gate stack materials and processes
Locquet, Jean-Pierre; Marchiori, Chiara; Sousa, M.; Siegwart, H.; Caimi, D.; Fompeyrine, Jean; Pantisano, Luigi; Claes, Martine; Conard, Thierry; Demand, Marc; Deweerd, Wim; De Gendt, Stefan; Heyns, Marc; Houssa, Michel; Aoulaiche, Marc; Lujan, Guilherme; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Hooker, Jacob; Rittersma, Chris; Furukawa, Yukiko; Seo, J.W.; dimoulas, A. (2005) -
MOSFET with La2HfO7 and HfO2 high-k dielectrics integrated in a conventional flow
Pantisano, Luigi; Conard, Thierry; Claes, Martine; Demand, Marc; Deweerd, Wim; De Gendt, Stefan; Heyns, Marc; Houssa, Michel; Aoulaiche, Marc; Lujan, Guilherme; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Hooker, Jacob; Rittersma, Chris; Fompereyne, Jean; Locquet, Jean-Pierre; dimoulas, A. (2005) -
Multiple-Vt FinFET devices through La2O3 dielectric capping
Witters, Liesbeth; Veloso, Anabela; Ferain, Isabelle; Demand, Marc; Collaert, Nadine; Son, Nak Jin; Adelmann, Christoph; Meersschaut, Johan; Vos, Rita; Rohr, Erika; Wada, Masayuki; Schram, Tom; Kubicek, Stefan; De Meyer, Kristin; Biesemans, Serge; Jurczak, Gosia (2008) -
Nitrogen profile and dielectric cap layer (Al2O3, Dy2O3, La2O3) engineering on Hf-silicate
Cho, Hag-Ju; Yu, HongYu; Ragnarsson, Lars-Ake; Chang, Vincent; Schram, Tom; O'Sullivan, Barry; Kubicek, Stefan; Mitsuhashi, Riichirou; Akheyar, Amal; Van Elshocht, Sven; Witters, Thomas; Delabie, Annelies; Adelmann, Christoph; Rohr, Erika; Singanamalla, Raghunath; Chang, Shou-Zen; Swerts, Johan; Lehnen, Peer; De Gendt, Stefan; Absil, Philippe; Biesemans, Serge (2007) -
Novel process to pattern selectively dual dielectric capping layers using soft-mask only
Schram, Tom; Kubicek, Stefan; Rohr, Erika; Brus, Stephan; Vrancken, Christa; Chang, Shou-Zen; Chang, V.S.; Mitsuhashi, Riichiru; Okuno, Yasutoshi; Akheyar, Amal; Cho, Hag-Ju; Hooker, J.C.; Paraschiv, Vasile; Vos, Rita; Sebaai, Farid; Ercken, Monique; Kelkar, Prasad; Delabie, Annelies; Adelmann, Christoph; Witters, Thomas; Ragnarsson, Lars-Ake; Kerner, Christoph; Chiarella, Thomas; Aoulaiche, Marc; Cho, Moon Ju; Kauerauf, Thomas; De Meyer, Kristin; Lauwers, Anne; Hoffmann, Thomas Y.; Absil, Philippe; Biesemans, Serge (2008) -
Observation and characterization of defects in HfO2 High-K gate dielectric layers
Kaushik, Vidya; Claes, Martine; Delabie, Annelies; Van Elshocht, Sven; Richard, Olivier; Conard, Thierry; Rohr, Erika; Witters, Thomas; Caymax, Matty; De Gendt, Stefan; Heyns, Marc (2004) -
Observation and characterization of defects in HfO2 high-k gate dielectric layers
Kaushik, Vidya; Claes, Martine; Delabie, Annelies; Van Elshocht, Sven; Richard, Olivier; Rohr, Erika; Witters, Thomas; Caymax, Matty; De Gendt, Stefan; Heyns, Marc (2005) -
On the origin of mobility reduction in ultrathin EOT HK/MG CMOS devices: Impact from gate-stack and device architecture
Ragnarsson, Lars-Ake; Mitard, Jerome; Hong, Sug-Hun; Takeoka, Shinji; Tseng, Joshua; Wang, Wei-E; Yamaguchi, Shinpei; Trojman, Lionel; Kauerauf, Thomas; De Keersgieter, An; Schram, Tom; Rohr, Erika; Collaert, Nadine; Jurczak, Gosia; Bourdelle, Konstantin; Nguyen, B-Y; Absil, Philippe; Hoffmann, Thomas Y. (2011) -
On the origin of the mobility reduction in bulk-Si, UTBOX-FDSOI and SiGe devices with ultrathin-EOT dielectrics
Ragnarsson, Lars-Ake; Mitard, Jerome; Kauerauf, Thomas; De Keersgieter, An; Schram, Tom; Rohr, Erika; Collaert, Nadine; Jurczak, Gosia; Hong, Sug-Hun; Tseng, Joshua; Wang, Wei-E; Trojman, Lionel; Bourdelle, Konstantin; Nguyen, B-Y; Absil, Philippe; Hoffmann, Thomas Y. (2011) -
Process control & integration options of RMG Technology for aggressively scaled devices
Veloso, Anabela; Higuchi, Yuichi; Chew, Soon Aik; Devriendt, Katia; Ragnarsson, Lars-Ake; Sebaai, Farid; Schram, Tom; Brus, Stephan; Vecchio, Emma; Kellens, Kristof; Rohr, Erika; Eneman, Geert; Simoen, Eddy; Cho, Moon Ju; Paraschiv, Vasile; Crabbe, Yvo; Shi, Xiaoping; Tielens, Hilde; Van Ammel, Annemie; Dekkers, Harold; Favia, Paola; Geypen, Jef; Bender, Hugo; Phatak, Anup; del Agua Borniquel, Jose Ignacio; Xu, K.; Allen, M.; Liu, C.; Xu, T.; Yoo, W.S.; Thean, Aaron; Horiguchi, Naoto (2012) -
Scalability of MOCVD-deposited Hafnium oxide
Van Elshocht, Sven; Carter, Richard; Caymax, Matty; Claes, Martine; Conard, Thierry; Date, Lucien; De Gendt, Stefan; Kaushik, Vidya; Kerber, Andreas; Kluth, J.; Lujan, Guilherme; Petry, Jasmine; Pique, Didier; Richard, Olivier; Rohr, Erika; Shimamoto, Yasuhiro; Tsai, Wilman; Heyns, Marc (2003) -
Scaling of HF-based gate dielectrics - intgeration with polysilicon gates
De Gendt, Stefan; Caymax, Matty; Chen, J.; Claes, Martine; Conard, Thierry; Delabie, Annelies; Deweerd, Wim; Kaushik, Vidya; Kerber, Andreas; Kubicek, Stefan; Niwa, M.; Pantisano, Luigi; Puurunen, Riikka; Ragnarsson, Lars-Ake; Schram, Tom; Shimamoto, Yasuhiro; Tsai, Wilman; Rohr, Erika; Van Elshocht, Sven; Vandervorst, Wilfried; Witters, Thomas; Young, Edward; Zhao, Chao; Heyns, Marc (2004) -
Scaling of Hf-based high-k dielectrics
Heyns, Marc; Beckx, Stephan; Caymax, Matty; Chen, J.; Claes, Martine; Coenegrachts, Bart; De Gendt, Stefan; Degraeve, R.; Delabie, Annelies; Deweerd, Wim; Groeseneken, Guido; Hayashi, Shigenori; Henson, Kirklen; Hooker, Jacob; Houssa, Michel; Kauerauf, Thomas; Kerber, A.; Kwak, Dong Hwa; Lander, Rob; Lujan, Guilherme; Niwa, Masaaki; Pantisano, Luigi; Puurunen, Riikka; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Shimamoto, Y.; Tsai, Wilman; Van Elshocht, Sven; Vertommen, Johan; Vandervorst, Wilfried; Kubicek, Stefan (2004) -
Selective wet etching of HF-based layers
Claes, Martine; Paraschiv, Vasile; Boutkabout, Hakim; Witters, Thomas; De Gendt, Stefan; Rohr, Erika; Coenegrachts, Bart; Vertommen, Johan; Richard, Olivier; Lindsay, Richard; Boullart, Werner; Heyns, Marc (2004) -
Single-metal dual-dielectric (SMDD) gate-first CMOS integration towards low VT and high performance
Ragnarsson, Lars-Ake; Schram, Tom; Rohr, Erika; Sebaai, Farid; Kelkar, Prasad; Wada, Masayuki; Kauerauf, Thomas; Aoulaiche, Marc; Cho, Moon Ju; Kubicek, Stefan; Lauwers, Anne; Hoffmann, Thomas Y.; Absil, Philippe; Biesemans, Serge (2009) -
Strain enhanced Low-VT CMOS featuring La/Al-doped HfSiO/TaC and 10ps invertor delay
Kubicek, Stefan; Schram, Tom; Rohr, Erika; Paraschiv, Vasile; Vos, Rita; Demand, Marc; Adelmann, Christoph; Witters, Thomas; Nyns, Laura; Delabie, Annelies; Ragnarsson, Lars-Ake; Chiarella, Thomas; Kerner, Christoph; Mercha, Abdelkarim; Parvais, Bertrand; Aoulaiche, Marc; Ortolland, Claude; Yu, HongYu; Veloso, Anabela; Witters, Liesbeth; Singanamalla, Raghunath; Kauerauf, Thomas; Brus, Stephan; Vrancken, Christa; Chang, V.S.; Chang, Shou-Zen; Mitsuhashi, Riichirou; Okuno, Yasutoshi; Akheyar, Amal; Cho, Hag-Ju; Hooker, J.; O'Sullivan, Barry; Van Elshocht, Sven; De Meyer, Kristin; Jurczak, Gosia; Absil, Philippe; Biesemans, Serge; Hoffmann, Thomas Y. (2008) -
Thermally-stable high effective work function TaCN and Ta2N films for pMOS metal gate applications
Adelmann, Christoph; Lehnen, Peer; Ragnarsson, Lars-Ake; Conard, Thierry; Franquet, Alexis; Chang, Vincent; Rohr, Erika; Meersschaut, Johan; Boissiere, Olivier; Lohe, Christoph; Schram, Tom; Van Elshocht, Sven; De Gendt, Stefan (2008) -
Threshold voltage control in PMOSFETs with polysilicon or fully-Silicided gates on Hf-based gate dielectric using controlled lateral oxidation
Kaushik, Vidya; Rohr, Erika; Hyun, S.; De Gendt, Stefan; Van Elshocht, Sven; Delabie, Annelies; Everaert, Jean-Luc; Veloso, Anabela; Brus, Stephan; Ragnarsson, Lars-Ake; Richard, Olivier; Caymax, Matty; Heyns, Marc (2005) -
Threshold voltage control in polysilicon or fully-silicided-Hf-based gate dielectric pMOSFETs using controlled lateral oxidation
Kaushik, Vidya; Rohr, Erika; Hyun, Sangjin; De Gendt, Stefan; Van Elshocht, Sven; Delabie, Annelies; Everaert, Jean-Luc; Veloso, Anabela; Brus, Stephan; Ragnarsson, Lars-Ake; Richard, Olivier; Caymax, Matty; Heyns, Marc (2005)