Browsing Conference contributions by author "Favia, Paola"
Now showing items 1-20 of 109
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0.5 nm EOT low leakage ALD SrTiO3 on TiN MIM capacitors for DRAM applications
Menou, Nicolas; Wang, Xin Peng; Kaczer, Ben; Polspoel, Wouter; Popovici, Mihaela Ioana; Opsomer, Karl; Pawlak, Malgorzata; Knaepen, W.; Detavernier, C.; Blomberg, T.; Pierreux, D.; Swerts, Johan; Maes, Jan; Favia, Paola; Bender, Hugo; Brijs, Bert; Vandervorst, Wilfried; Van Elshocht, Sven; Wouters, Dirk; Biesemans, Serge; Kittl, Jorge (2008) -
15nm-WFIN high-performance low-defectivity strained-germanium pFinFETs with low temperature STI-last process
Mitard, Jerome; Witters, Liesbeth; Loo, Roger; Lee, Seung Hun; Sun, J.W.; Franco, Jacopo; Ragnarsson, Lars-Ake; Brand, A.; Lu, X.; Yoshido, N.; Eneman, Geert; Brunco, David; Vorderwestner, M.; Storck, P.; Milenin, Alexey; Hikavyy, Andriy; Waldron, Niamh; Favia, Paola; Vanhaeren, Danielle; Vanderheyden, Annelies; Richard, Olivier; Mertens, Hans; Arimura, Hiroaki; Sioncke, Sonja; Vrancken, Christa; Bender, Hugo; Eyben, Pierre; Barla, Kathy; Lee, Sun Ghil; Horiguchi, Naoto; Collaert, Nadine; Thean, Aaron (2014) -
1mA/μm-ION strained SiGe45%-IFQW pFETs with raised and embedded S/D
Mitard, Jerome; Witters, Liesbeth; Hellings, Geert; Krom, Raymond; Franco, Jacopo; Eneman, Geert; Hikavyy, Andriy; Vincent, Benjamin; Loo, Roger; Favia, Paola; Dekkers, Harold; Altamirano Sanchez, Efrain; Vanderheyden, Annelies; Vanhaeren, Danielle; Eyben, Pierre; Takeoka, Shinji; Yamaguchi, Shinpei; Van Dal, Mark; Wang, Wei-E; Hong, Sug-Hun; Vandervorst, Wilfried; De Meyer, Kristin; Biesemans, Serge; Absil, Philippe; Horiguchi, Naoto; Hoffmann, Thomas Y. (2011) -
A 2nd generation of 14/16nm-node compatible strained-Ge pFINFET with improved performance with respect to advanced Si-channel FinFETs
Mitard, Jerome; Witters, Liesbeth; Sasaki, Yuichiro; Arimura, Hiroaki; Schulze, Andreas; Loo, Roger; Ragnarsson, Lars-Ake; Hikavyy, Andriy; Cott, Daire; Chiarella, Thomas; Kubicek, Stefan; Mertens, Hans; Ritzenthaler, Romain; Vrancken, Christa; Favia, Paola; Bender, Hugo; Horiguchi, Naoto; Barla, Kathy; Mocuta, Dan; Mocuta, Anda; Collaert, Nadine; Thean, Aaron (2016-06) -
Addressing Key Challenges for SiGe-pFin Technologies: Fin Integrity, Low-D-IT Si-cap-free Gate Stack and Optimizing the Channel Strain
Arimura, Hiroaki; Capogreco, Elena; Wostyn, Kurt; Eneman, Geert; Ragnarsson, Lars-Ake; Brus, Stephan; Baudot, Sylvain; Peter, Antony; Schram, Tom; Favia, Paola; Richard, Olivier; Bender, Hugo; Mitard, Jerome; Horiguchi, Naoto (2020) -
Advantage of NW structure in preservation of SRB-induced strain and investigation of off-state leakage in strained stacked Ge NW pFET
Arimura, Hiroaki; Eneman, Geert; Capogreco, Elena; Witters, Liesbeth; De Keersgieter, An; Favia, Paola; Porret, Clément; Hikavyy, Andriy; Loo, Roger; Bender, Hugo; Ragnarsson, Lars-Ake; Mitard, Jerome; Collaert, Nadine; Mocuta, Dan; Horiguchi, Naoto (2018) -
AlGaN/GaN HEMT grown on 150 mm Silicon(111) Substrates
Cheng, Kai; Leys, Maarten; Degroote, Stefan; Derluyn, Joff; Sijmus, Bram; Favia, Paola; Richard, Olivier; Bender, Hugo; Germain, Marianne; Borghs, Gustaaf (2007) -
Application of selective epitaxial growth for merging fins in source/drain areas of sub 20 nm FinFET transistors
Hikavyy, Andriy; Kubicek, Stefan; Chew, Soon Aik; Boccardi, Guillaume; Favia, Paola; Eneman, Geert; Loo, Roger (2013) -
Application of selective epitaxial growth for merging fins in source/drain areas of sub 20 nm FinFET transistors
Hikavyy, Andriy; Chew, Soon Aik; Boccardi, Guillaume; Favia, Paola; Loo, Roger (2013) -
Application of selective epitaxial growth in the sub 20 nm FinFET device fabrication
Hikavyy, Andriy; Rosseel, Erik; Eneman, Geert; Favia, Paola; Loo, Roger (2014) -
Beyond interface: the impact of oxide border traps on InGaAs and Ge n-MOSFETs
Lin, Dennis; Alian, AliReza; Gupta, S.; Yang, B.; Bury, Erik; Sioncke, Sonja; Degraeve, Robin; Toledano Luque, Maria; Krom, Raymond; Favia, Paola; Bender, Hugo; Caymax, Matty; Saraswat, K.C.; Collaert, Nadine; Thean, Aaron (2012) -
Buried Power Rail Integration with Si FinFETs for CMOS Scaling beyond the 5 nm Node
Gupta, Anshul; Mertens, Hans; Tao, Zheng; Demuynck, Steven; Boemmels, Juergen; Arutchelvan, Goutham; Devriendt, Katia; Varela Pedreira, Olalla; Ritzenthaler, Romain; Wang, Shouhua; Radisic, Dunja; Kenis, Karine; Teugels, Lieve; Sebaai, Farid; Lorant, Christophe; Jourdan, Nicolas; Chan, BT; Zahedmanesh, Houman; Subramanian, Sujith; Schleicher, Filip; Hopf, Toby; Peter, Antony; Rassoul, Nouredine; Debruyn, Haroen; Demonie, Ingrid; Siew, Yong Kong; Chiarella, Thomas; Briggs, Basoene; Zhou, Daisy; Rosseel, Erik; De Keersgieter, An; Capogreco, Elena; Dentoni Litta, Eugenio; Boccardi, Guillaume; Baudot, Sylvain; Mannaert, Geert; Bontemps, N.; Sepulveda Marquez, Alfonso; Mertens, Sofie; Kim, Min Soo; Dupuy, Emmanuel; Vandersmissen, Kevin; Paolillo, Sara; Yakimets, Dmitry; Chehab, Bilal; Favia, Paola; Drijbooms, Chris; Cousserier, Joris; Jaysankar, Manoj; Lazzarino, Frederic; Morin, Pierre; Altamirano Sanchez, Efrain; Mitard, Jerome; Wilson, Chris; Holsteyns, Frank; Tokei, Zsolt; Horiguchi, Naoto (2020) -
CMOS compatible Josephson junctions for superonducting qubit applications
Ivanov, Tsvetan; Potocnik, Anton; Wan, Danny; Verjauw, Jeroen; Jussot, Julien; Mongillo, Massimo; Acharya, Rohith; Mohiyaddin, Fahd Ayyalil; Favia, Paola; Bender, Hugo; Goux, Ludovic; Govoreanu, Bogdan; Radu, Iuliana (2020) -
Combined STEM-EDS tomography of nanowire structures
Bender, Hugo; Kundu, Paromita; Richard, Olivier; Favia, Paola; Zhong, Zhichao; Batenburg, Kees Joost; Wirix, Maarten; Schoenmakers, Remco (2019) -
Combining TEM and 3D scanning spreading resistance microscopy, a hybrid approach, to the analysis of Ge gate-all-around nano-wires
Favia, Paola; Celano, Umberto; Drijbooms, Chris; Witters, Liesbeth; Arimura, Hiroaki; Capogreco, Elena; Vancoille, Eric; Bender, Hugo (2018) -
Comparison between experimental and simulated strain profiles in Ge channels with embedded source/drain stressors
Buhler, Rudolf; Eneman, Geert; Favia, Paola; Bender, Hugo; Vincent, Benjamin; Hikavyy, Andriy; Loo, Roger; Martino, Joao; Claeys, Cor; Simoen, Eddy; Collaert, Nadine; Thean, Aaron (2014) -
Composition variation of In1-xGaxAs epitaxially grown in narrow trenches on Si
Favia, Paola; Richard, Olivier; Geypen, Jef; Waldron, Niamh; Merckling, Clement; Guo, Weiming; Caymax, Matty; Bender, Hugo (2013) -
Compositional analysis on ensemble of InGaAs fins using TEM and Rutherford backscattering spectrometry
Laricchiuta, Grazia; Vandervorst, Wilfried; Vickridge, Ian; Mayer, Matej; Favia, Paola; Schulze, Andreas; Meersschaut, Johan (2017) -
Cutting-edge epitaxial processes for sub 3 nm technology nodes: application to nanosheet stacks and epitaxial wrap-around contacts
Hikavyy, Andriy; Porret, Clément; Mencarelli, M.; Loo, Roger; Favia, Paola; Ayyad, Mustafa; Briggs, Basoene; Langer, Robert; Horiguchi, Naoto (2021) -
Damage in nickel silicides during FIB specimen preparation
Verleysen, Eveline; Bender, Hugo; Favia, Paola; Schryvers, Dominique; Vandervorst, Wilfried (2011)