Browsing Conference contributions by imec author "ca30497f34ffb9dbb8aeb60a71a99f1dba689ded"
Now showing items 1-20 of 57
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A CDU comparison of double-patterning process options using Monte Carlo simulation
Hooge, Joshua; Hatakeyama, Shinichi; Nafus, Kathleen; Scheer, Steven; Foubert, Philippe; Cheng, Shaunee; Leray, Philippe (2009) -
Addressing the challenges of Directed Self Assembly implementation
Gronheid, Roel; Pollentier, Ivan; Younkin, Todd; Somervell, Mark; Nafus, Kathleen; Hooge, Josh; Rathsack, Ben; Scheer, Steven; Rincon Delgadillo, Paulina; Nealy, Paul (2011) -
Advances and challenges in dual-tone development process optimization
Fonseca, Carlos; Somervell, Mark; Scheer, Steven; Printz, Wallace; Nafus, Kathleen; Hatakeyama, Shinichi; Kuwahara, Yuhei; Niwa, Takafumi; Bernard, Sophie; Gronheid, Roel (2009) -
Advances in dual-tone development for pitch frequency doubling
Fonseca, Carlos; Somervell, Mark; Scheer, Steven; Kuwahara, Yuhei; Nafus, Kathleen; Gronheid, Roel; Tarutani, Shinji; Enomoto, Yuuchiro (2010) -
Advances in process optimization for dual-tone development as a double patterning technique
Fonseca, Carlos; Somervell, Mark; Bernard, Sophie; Hatakeyama, Shinichi; Nafus, Kathleen; Leeson, Michael; Scheer, Steven; Gronheid, Roel (2008) -
All track directed self-assembly of block copolymers: process flow and origin of defects
Rincon Delgadillo, Paulina; Gronheid, Roel; Thode, Christopher J.; Wu, Hengpeng; Cao, Yi; Somervell, Mark; Nafus, Kathleen; Nealy, Paul F. (2012) -
Calibrated PSCAR stochastic simulation
Dinh, Cong Que; Nagahara, Seji; Shiraishi, Gousuke; Minekawa, Yukie; Kamei, Yuya; Carcasi, Michael; Ide, Hiroyuki; Kondo, Yoshihiro; Yoshida, Yuichi; Yoshihara, Kosuke; Shimada, Ryo; Tomono, Masaru; Moriya, Teruhiko; Takeshita, Kazuhiro; Nafus, Kathleen; Biesemans, Serge; Petersen, John; De Simone, Danilo; Foubert, Philippe; De Bisschop, Peter; Vandenberghe, Geert; Stock, Hans-Jurgen; Meliorisz, Balint (2019) -
Capture probability of assembly defects in 14 nm half-pitch line/space DSA patterns
Pathangi Sriraman, Hari; Chan, BT; Van Look, Lieve; Vandenbroeck, Nadia; Van Den Heuvel, Dieter; Cross, Andrew; Hong, Sung Eun; Nafus, Kathleen; D'Urzo, Lucia; Gronheid, Roel (2015) -
Comparison of directed self-assembly integrations
Somervell, Mark; Gronheid, Roel; Hooge, Joshua; Nafus, Kathleen; Rincon Delgadillo, Paulina; Thode, Chris; Younkin, Todd; Matsunaga, Koichi; Rathsack, Ben; Scheer, Steven; Nealy, Paul (2012) -
Cryogenic etching vs P4 approaches: paths towards ultra-low damage integration of mesoporous oxide dielectric materials
de Marneffe, Jean-Francois; Zhang, Liping; Heyne, Markus; Krishtab, Mikhail; Goodyear, Andy; Cooke, Mike; Heylen, Nancy; Ciofi, Ivan; Wen, Liang Gong; Wilson, Chris; Rutigliani, Vito; Decoster, Stefan; Savage, Travis; Matsunaga, Koichi; Nafus, Kathleen; Boemmels, Juergen; Tokei, Zsolt; Baklanov, Mikhaïl (2014) -
Defect capture sensitivity in 14 nm half-pitch line/space DSA patterns
Pathangi Sriraman, Hari; Gronheid, Roel; Van Den Heuvel, Dieter; Rincon Delgadillo, Paulina; Chan, BT; Van Look, Lieve; Bayana, Hareen; Cao, Yi; Her, YoungJun; Lin, Guanyang; Parnell, Doni; Nafus, Kathleen; Somervell, Mark; Harukawa, Ryoto; Chikashi, Ito; Nagaswami, Venkat; D'Urzo, Lucia; Nealey, Paul (2014) -
Defect mitigation and root cause studies in imec's 14 nm half-pitch chemo-epitaxy DSA flow
Pathangi Sriraman, Hari; Chan, BT; Bayana, Hareen; Van Den Heuvel, Dieter; Van Look, Lieve; Rincon Delgadillo, Paulina; Cao, Yi; Kim, YiHoon; Lin, G.; Parnell, Doni; Nafus, Kathleen; Harukawa, Ryoto; Chikashi, Ito; Nagaswami, Venkat; D'Urzo, Lucia; Gronheid, Roel; Nealey, Paul (2015) -
Dry development rinse process for ultimate resolution Improvement via pattern collapse mitigation
Sayan, Safak; Tao, Zheng; Chan, BT; De Simone, Danilo; Kuwahara, Yuhei; Nafus, Kathleen; Leeson, Michael J.; Gstrein, Florian; Singh, Arjun; Vandenberghe, Geert (2015) -
EUV baseline process optimizations for NXE:3100 evaluation
Foubert, Philippe; Shite, Hideo; Nafus, Kathleen; Hermans, Jan; Hendrickx, Eric (2011) -
EUV patterning improvement toward high-volume manufacturing
Kuwahara, Yuhei; Matsunaga, Koichi; Kawakami, Shinichiro; Nafus, Kathleen; Foubert, Philippe; Goethals, Mieke (2015) -
EUV process establishment through litho and etch for N7 node
Kuwahara, Yuhei; Kawakami, Shinichiro; Kubota, Minoru; Matsunaga, Koichi; Nafus, Kathleen; Foubert, Philippe; Mao, Ming (2016) -
EUV process sensitivities and optimizations for track processing
Shite, Hideo; Bradon, Neil; Nafus, Kathleen; Kitano, Junichi; Kosugi, Hitoshi; Hermans, Jan; Hendrickx, Eric; Foubert, Philippe; Gronheid, Roel; Jehoul, Christiane; Van Den Heuvel, Dieter; Goethals, Mieke; Cheng, Shaunee (2010) -
EUV processing investigation on state-of-the-art coater/developer system
Shite, Hideo; Bradon, Neil; Shimoaoki, T.; Kobayashi, S.; Nafus, Kathleen; Kosugi, Hitoshi; Foubert, Philippe; Hermans, Jan; Hendrickx, Eric; Goethals, Mieke; Gronheid, Roel; Jehoul, Christiane (2011) -
EUV resist chemical gradient enhancement by UV flood exposure for improvement in EUV resist resolution, process control, roughness, sensitivity and stochastic defectivity
Nagahara, S.; Dinh, C.Q.; Yoshida, Keisuke; Shiraishi, G.; Kondo, Y.; Yoshihara, K.; Nafus, Kathleen; Petersen, John; De Simone, Danilo; Foubert, Philippe; Vandenberghe, Geert; Stock, H.; Meliorisz, B. (2020) -
EUV RLS performance tradeoffs for a polymer bound PAG resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2010)