Browsing Conference contributions by imec author "ca30497f34ffb9dbb8aeb60a71a99f1dba689ded"
Now showing items 21-40 of 57
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EUV RLS performance tradeoffs for a polymer bound PAG resist process
Rathsack, Ben; Hooge, Josh; Somervell, Mark; Scheer, Steve; Nafus, Kathleen; Shite, Hideo; Bradon, Neil; Kitano, Junichi; Gronheid, Roel; Vaglio Pret, Alessandro (2009) -
EUV secondary electron blur at the 22nm half pitch node
Gronheid, Roel; Younkin, Todd; Leeson, Michael; Fonseca, Carlos; Hooge, Joshua; Nafus, Kathleen; Biafore, John; Smith, Mark D. (2011) -
Evaluation of integration schemes for contact-hole grapho-epitaxy DSA: a study of substrate and template affinity control
Romo Negreira, Ainhoa; Younkin, Todd; Gronheid, Roel; Demuynck, Steven; Vandenbroeck, Nadia; Seo, Takehito; Guerrero, Douglas; Parnell, Doni; Muramatsu, Makoto; Shinichiro, Kawakami; Takashi, Yamauchi; Nafus, Kathleen; Somervell, Mark (2014) -
Experimental study of sub-DSA resolution assist features (SDRAF)
Yi, Linda; Bekaert, Joost; Gronheid, Roel; Vandenberghe, Geert; Nafus, Kathleen; Wong, H.-S. Philip (2015) -
Exploration of new resist chemistries and process methods for enabling dual-tone development
Fonseca, Carlos; Somervell, M.; Scheer, S.; Kuwahara, Y.; Nafus, Kathleen; Gronheid, Roel; Tarutani, S. (2009) -
Feasibility study on dual tone development for frequency doubling
Bernard, Sophie; Fonseca, Carlos; Gronheid, Roel; Hatakeyama, Shinichi; Leeson, Michael; Nafus, Kathleen; Scheer, Steven; Somervell, Marc (2008) -
Focus spot reduction by brush scrubber cleaning
Pacco, Antoine; Kesters, Els; Simms, Ihsan; Nafus, Kathleen; Vandereyken, Jelle; Yonekawa, Hiroki (2014) -
Further investigation of EUV process sensitivities for wafer track processing
Bradon, Neil; Nafus, Kathleen; Shite, Hideo; Kitano, J.; Kosugi, H.; Goethals, Mieke; Cheng, Shaunee; Hermans, Jan; Hendrickx, Eric; Baudemprez, Bart; Van Den Heuvel, Dieter (2010) -
Image contrast contributions to immersion lithography defect formation and process yield
Rathsack, Ben; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Hatakeyama, Shinichi; Kouichi, Hontake; Kitano, Junichi; Van Den Heuvel, Dieter; Leray, Philippe; Hendrickx, Eric; Foubert, Philippe; Gronheid, Roel (2008) -
Investigation of EUV process sensitivities for wafer track processing
Bradon, Neil; Weichert, Heiko; Nafus, Kathleen; Hatakeyama, Shinichi; Kitano, J.; Kosugi, H.; Yoshihara, K.; Goethals, Mieke; Hermans, Jan (2009) -
Kinetics of defect annihilation in directed self-assembly of block copolymers using chemically nano-patterned surfaces
Rincon Delgadillo, Paulina; Gronheid, Roel; Lin, Guanyang; Cao, Yi; Romo, Ainhoa; Somervell, Mark; Nafus, Kathleen; Nealey, Paul (2014) -
Latest cluster performance for EUV lithography
Shite, Hideo; Matsunaga, Koichi; Nafus, Kathleen; Kosugi, H.; Foubert, Philippe; Hermans, Jan; Hendrickx, Eric; Goethals, Mieke; Van Den Heuvel, Dieter (2012) -
LWR reduction by novel lithographic and etch techniques
Kobayashi, Shinji; Shimura, Satoru; Kawasaki, Tetsu; Nafus, Kathleen; Hatakeyama, Shinichi; Shite, Hideo; Nishimura, Eiichi; Kushibiki, Masato; Hara, Arisa; Gronheid, Roel; Vaglio Pret, Alessandro; Kitano, Junichi (2010) -
Manufacturability improvements in EUV resist processing towards NXE:3300 processing
Kuwahara, Yuhei; Matsunaga, Koichi; Shimoaoki, Takeshi; Kawakami, Shinichiro; Nafus, Kathleen; Foubert, Philippe; Goethals, Mieke; Shimura, Satoru (2014) -
Measurement and evaluation of water uptake by resists, top coats and stacks and correlation with watermark defects
Foubert, Philippe; Kocsis, Michael; Gronheid, Roel; Kishimura, Shinji; Soyano, Akimasa; Nafus, Kathleen; Stepanenko, Nickolay; De Backer, Johan; Vandenbroeck, Nadia; Ercken, Monique (2007) -
Novel metal containing resists for EUV lithography extendibility
De Simone, Danilo; Sayan, Safak; Dei, Satoshi; Pollentier, Ivan; Kuwahara, Yuhei; Vandenberghe, Geert; Nafus, Kathleen; Shiratani, Motohiro; Nakagawa, Hisashi; Naruoka, Takehiko (2016) -
Novel technologies in coater/developer to enhance the CD stability and to improve the defectivity toward N7 and smaller nodes
Kamei, Yuya; Sano, Yohei; Yamauchi, Takashi; Kawakami, Shinichiro; Tadokoro, Masahide; Enomoto, Masashi; Muramatsu, Makoto; Nafus, Kathleen; Sonoda, Akihiro; Demand, Marc; Foubert, Philippe (2019) -
Origin of defect in directed self-assembly of block copolymers using feature multiplication
Rincon Delgadillo, Paulina; Harukawa, Ryoto; Parnell, Doni; Lee, Yu-tsung; Chan, BT; Lin, Guanyang; Cao, Yi; Nagaswami, Venkat; Somervell, Mark; Nafus, Kathleen; Gronheid, Roel; Nealey, Paul (2013) -
Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-throughput and high-resolution EUV lithography: dual photosensitization of acid generation and quencher decomposition by flood exposure
Nagahara, Seiji; Carcasi, Michael; Shiraishi, Gosuke; Nakagawa, Hisashi; Dei, Satoshi; Shiozawa, Takahiro; Nafus, Kathleen; De Simone, Danilo; Vandenberghe, Geert; Stock, Hans-Jürgen; Küchler, Bernd; Hori, Masafumi; Naruoka, Takehiko; Nagai, Tomoki; Minekawa, Yukie; Iseki, Tomohiri; Kondo, Yoshihiro; Yoshihara, Kosuke; Kamei, Yuya; Tomono, Masaru; Shimada, Ryo; Biesemans, Serge; Nakashima, Hideo; Foubert, Philippe; Buitrago, Elizabeth; Vockenhuber, Michaela; Ekinci, Yasin; Oshima, Akihiro; Tagawa, Seiichi (2017) -
Process sensitivities in exemplary chemo-epitaxy directed self-assembly integration
Rincon Delgadillo, Paulina; Gronheid, Roel; Lin, Guanyan; Cao, Yi; Romo Negreira, Ainhoa; Somervell, Mark; Nafus, Kathleen; Nealey, Paul (2013)