Browsing Conference contributions by imec author "96aaa64e938e223bc994751727550abb316e187c"
Now showing items 21-40 of 60
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Extending gate dielectric scaling by using ALD HfO2/SrTiO3 stacks
Maes, Jan; Machkaoutsan, Vladimir; Pierreux, Dieter; Blomberg, Tom; Swerts, Johan; Schram, Tom; Adelmann, Christoph; Delabie, Annelies; Van Elshocht, Sven; Popovici, Mihaela Ioana; Conard, Thierry; Tseng, Joshua; Ragnarsson, Lars-Ake (2010) -
Extreme scaled gate dielectrics by using ALD Hf-based composite materials
Pierreux, Dieter; Machkaoutsan, Vladimir; Tois, E.; Swerts, Johan; Schram, Tom; Adelmann, Christoph; Van Elshocht, Sven; Tseng, Joshua; Ragnarsson, Lars-Ake; Maes, Jan (2009) -
Extreme scaled gate dielectrics by using ALD HfO2/SrTiO3 composite structures
Pierreux, Dieter; Machkaoutsan, Vladimir; Tois, E.; Swerts, Johan; Schram, Tom; Adelmann, Christoph; Van Elshocht, Sven; Popovici, Mihaela Ioana; Conard, Thierry; Tseng, Joshua; Ragnarsson, Lars-Ake; Maes, Jan (2009) -
Gate-all-around InGaAs nanowire FETs with peak transconductance of 2200 μS/μm at 50nm Lg using a replacement fin RMG flow
Waldron, Niamh; Sioncke, Sonja; Franco, Jacopo; Nyns, Laura; Vais, Abhitosh; Zhou, Daisy; Lin, Dennis; Boccardi, Guillaume; Sebaai, Farid; Xie, Qi; Givens, M.; Tang, F.; Jiang, X.; Chiu, Eddie; Opdebeeck, Ann; Merckling, Clement; Maes, Jan; van Dorp, Dennis; Teugels, Lieve; Sibaja-Hernandez, Arturo; De Meyer, Kristin; Barla, Kathy; Collaert, Nadine; Thean, Aaron (2015) -
High efficiency low temperature pre-epi clean method for advanced group IV epi processing
Machkaoutsan, Vladimir; Weeks, Doran; Bauer, Matthias; Maes, Jan; Tolle, John; Thomas, Shawn; Alian, AliReza; Hikavyy, Andriy; Loo, Roger (2012-09) -
High efficiency low temperature pre-epi clean method for advanced group IV epi processing
Machkaoutsan, Vladimir; Weeks, Doran; Bauer, Matthias; Maes, Jan; Tolle, John; Thomas, Shawn; Alian, AliReza; Hikavyy, Andriy; Loo, Roger (2012) -
High-k dielectrics and metal gates for future generation memory devices
Kittl, Jorge; Opsomer, Karl; Popovici, Mihaela Ioana; Menou, Nicolas; Kaczer, Ben; Wang, Xin Peng; Adelmann, Christoph; Pawlak, Malgorzata; Tomida, Kazuyuki; Rothschild, Aude; Govoreanu, Bogdan; Degraeve, Robin; Schaekers, Marc; Zahid, Mohammed; Delabie, Annelies; Meersschaut, Johan; Polspoel, W.; Clima, Sergiu; Pourtois, Geoffrey; Detavernier, C.; Knaepen, W.; Afanasiev, Valeri; Blomberg, T.; Pierreux, Dieter; Swerts, Johan; Maes, Jan; Manger, D.; Vandervorst, Wilfried; Conard, Thierry; Franquet, Alexis; Favia, Paola; Bender, Hugo; Brijs, Bert; Van Elshocht, Sven; Jurczak, Gosia; Van Houdt, Jan; Wouters, Dirk (2009) -
High-k dielectrics and metal gates for future generation memory devices
Kittl, Jorge; Opsomer, Karl; Popovici, Mihaela Ioana; Menou, Nicolas; Kaczer, Ben; Wang, Xin Peng; Adelmann, Christoph; Pawlak, Malgorzata; Tomida, Kazuyuki; Rothschild, Aude; Govoreanu, Bogdan; Degraeve, Robin; Schaekers, Marc; Zahid, Mohammed; Delabie, Annelies; Meersschaut, Johan; Polspoel, W.; Clima, Sergiu; Pourtois, Geoffrey; Knaepen, W.; Detavernier, C.; Afanasiev, Valeri; Blomberg, T.; Pierreux, Dieter; Swerts, Johan; Fischer, P.; Maes, Jan; Manger, D.; Vandervorst, Wilfried; Conard, Thierry; Franquet, Alexis; Favia, Paola; Bender, Hugo; Brijs, Bert; Van Elshocht, Sven; Jurczak, Gosia; Van Houdt, Jan; Wouters, Dirk (2009) -
High-k gate stack engineering – towards meeting low standby power and high performance targets
De Gendt, Stefan; Brunco, David; Caymax, Matty; Conard, Thierry; Date, Lucien; Delabie, Annelies; Deweerd, Wim; Groeseneken, Guido; Houssa, Michel; Hyun, Sangjin; Kaushik, Vidya; Kubicek, Stefan; Maes, Jan; Pantisano, Luigi; Ragnarsson, Lars-Ake; Rohr, Erika; Schram, Tom; Shimamoto, Y.; Sleeckx, Erik; Vandervorst, Wilfried; Van Elshocht, Sven; Yamada, Naoki; Witters, Thomas; Zhao, Chao; Zimmerman, Paul; Heyns, Marc (2005) -
Impact of Hf-precursor choice on scaling and performance of high-k gate dielectrics
Maes, Jan; Fedorenko, Yanina; Delabie, Annelies; Ragnarsson, Lars-Ake; Swerts, Johan; Nyns, Laura; Van Elshocht, Sven; Wang, C.; Wilk, G. (2007) -
Impact of sequential infiltration synthesis on pattern fidelity of DSA lines
Singh, Arjun; Knaepen, Werner; Sayan, Safak; El Otell, Ziad; Chan, BT; Maes, Jan; Gronheid, Roel (2015) -
Implementation of high-k gate dielectrics - a status update
De Gendt, Stefan; Chen, Jerry; Carter, Richard; Cartier, Eduard; Caymax, Matty; Claes, Martine; Conard, Thierry; Delabie, Annelies; Deweerd, Wim; Kaushik, Vidya; Kerber, Andreas; Kubicek, Stefan; Maes, Jan; Niwa, M.; Pantisano, Luigi; Puurunen, Riikka; Ragnarsson, Lars-Ake; Schram, Tom; Shimamoto, Yasuhiro; Tsai, Wilman; Röhr, Erika; Van Elshocht, Sven; Witters, Thomas; Young, Edward; Zhao, Chao; Heyns, Marc (2003) -
Implementation of rare earth elements in high-k based gate stacks
Van Elshocht, Sven; Adelmann, Christoph; Nyns, Laura; Delabie, Annelies; Popovici, Mihaela Ioana; Swerts, Johan; Meersschaut, Johan; Shi, Xiaoping; Gielis, Sven; Kesters, Jurgen; Breuil, Laurent; Ragnarsson, Lars-Ake; Schram, Tom; Pourtois, Geoffrey; Pierreux, Dieter; Maes, Jan; Jurczak, Gosia; Kittl, Jorge (2009) -
Improved cost-effectiveness of the block co-polymer anneal process for DSA
Pathangi Sriraman, Hari; Stokhof, Maarten; Knaepen, Werner; Vaid, Varun; Mallik, Arindam; Chan, BT; Vandenbroeck, Nadia; Maes, Jan; Gronheid, Roel (2016) -
Integration issues of polysilicon with high k dielectrics deposited by Atomic Layer Chemical Vapor Deposition
Tsai, Wilman; Chen, Jian; Carter, Richard; Cartier, Eduard; Kluth, Jon; Richard, Olivier; Claes, Martine; Lin, Steven; Nohira, Hiroshi; Conard, Thierry; Caymax, Matty; Young, Edward; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Manabe, Yukiko; Maes, Jan; Rittersma, Chris; Besling, Wim; Roozeboom, F. (2002) -
Localized power spectral density analysis on atomic force microscopy images for advanced patterning applications
Moussa, Alain; Saib, Mohamed; Paolillo, Sara; Lazzarino, Frederic; Illiberi, Andrea; Maes, Jan; Deng, Shaoren; Charley, Anne-Laure; Leray, Philippe (2019) -
Low-temperature pre-epitaxy surface cleaning of Si and SiGe
Profijt, Harald; Suhard, Samuel; Rosseel, Erik; Tolle, John; Mertens, Hans; Dhayalan, Sathish Kumar; Hikavyy, Andriy; Weeks, Doran; Holsteyns, Frank; Loo, Roger; Mehta, Sandeep; Maes, Jan (2015-05) -
Mobility reduction due to remote charge scattering in Al2O3/SiO2 gate-stacked MISFETs
Saito, Shin-ichi; Shimamoto, Yasuhiro; Torii, Kazuyoshi; Manabe, Yukiko; Caymax, Matty; Maes, Jan; Hiratani, Masahiko; Kimura, Shin-ichiro (2002) -
Nitrided hafnium silicates for gate dielectrics
Wang, C.G.; Velasco, H.; Verghese, M.; Shero, E.; Wilk, G.; Maes, Jan; Laitinen, O.; Deweerd, Wim; Delabie, Annelies; Opila, R.L.; Mathew, A.; Demirkan, K.; Morais, J.; Baumvol, I.J.R. (2004) -
On the process and material sensitivities for high-k based dielectrics
Van Elshocht, Sven; Adelmann, Christoph; Popovici, Mihaela Ioana; Swerts, Johan; Delabie, Annelies; Nyns, Laura; Shi, Xiaoping; Tielens, Hilde; Pourtois, Geoffrey; Menou, Nicolas; Breuil, Laurent; Pierreux, Dieter; Maes, Jan; Hardy, An; Van Bael, Marlies; Jurczak, Gosia; Kittl, Jorge (2010)