Browsing by Author "Cross, Andrew"

Capture probability of assembly defects in 14 nm half-pitch line/space DSA patterns

Connected component analysis of review-SEM images for sub-10nm node process verification

Deep learning-based defect detection using large FOV SEM for 28 nm pitch BEOL layer patterned with 0.33NA single exposure EUV

Defect characterization of EUV Self-Aligned Litho-Etch Litho-Etch (SALELE) patterning scheme for advanced nodes

Defect source analysis of directed self-assembly process

Defect source analysis of directed self-assembly process (DSA of DSA)

DSA materials contributions to the defectivity performance of the 14nm half-pitch LiNe flow @ imec

EUV based multi-patterning schemes for advanced DRAM nodes

EUV stochastic defect monitoring with advanced broadband optical wafer inspection and e-beam review systems

Extreme thinning of Si wafers for via-last and multi wafer stacking applications

High sensitivity repeater detection with broadband plasma optical wafer inspection for mask defect qualification

Hotspot discovery and variability analysis for advanced EUV processes

In-device high resolution and high throughput optical metrology for process development and monitoring

In-line metrology for characterization and control of extreme wafer thinning of bonded wafers

In-line metrology for characterization and control of extreme wafer thinning of bonded wafers

Investigation of the performance of state-of-the-art defect inspection tools within EUV lithography

Process window discovery methodology development for advanced lithography

Process window discovery, expansion and control of design hotspots susceptible to overlay failures

Single Mask Solution to Pattern BLP and SNLP using 0.33NA EUV for Next Generation DRAM Manufacturing

stochastic defect monitoring with advanced broadband optical wafer inspection and e-Beam review systems