Browsing by Author "De Simone, Danilo"
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Publication 28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography
Publication A Novel Main Chain Scission Type Photoresists for EUV Lithography
Proceedings paper2020, Conference on Extreme Ultraviolet Lithography, SEP 21-25, 2020, p.115170DPublication Adhesion and collapse of extreme ultraviolet photoresists and the role of underlayers
Journal article2022, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (21) 3, p.034601Publication Advanced lithography materials as key scaling enablers
Proceedings paper2014, 27th International Microprocesses and Nanotechnology Conference - MNC, 4/11/2014, p.7A-8-2Publication Alternative EUV materials. Status at imec
Proceedings paper2015, International Symposium on Extreme Ultraviolet Lithography - EUVL. TWG meeting, 4/10/2015Publication Alternative patterning mechanisms for Extreme Ultraviolet Lithography
Oral presentation2018, 14th Chemistry Conference for Young Scientists - ChemCYSPublication Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions
Journal article2023, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, (41) 3, p.Art.: 032404Publication Approaches to Enable Patterning of Tight Pitches towards High NA EUV
Publication Calibrated PSCAR stochastic simulation
Publication Characterizing and modeling electrical response to light for metal based EUV photoresists
Proceedings paper2016, Advances in Patterning Materials and Processes XXXIII, 21/02/2016, p.977906Publication Characterizing variation in EUV contact hole lithography
Proceedings paper2020, International Conference on Extreme Ultraviolet Lithography 2020, 21/09/2020, p.115170KPublication Chemically amplified resist CDSEM metrology exploration for high NA EUV lithography
; ; ; ; Journal article2022, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (21) 2, p.02107Publication Compact 2D OPC modeling of a metal oxide EUV resist for a 7nm node BEOL layer
Proceedings paper2017, Extreme Ultraviolet (EUV) Lithography VIII, 26/02/2017, p.101431EPublication Compatibility between polymethacrylate-based extreme ultraviolet resists and TiO(2 )area-selective deposition
Journal article2022, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (21) 4, p.Art. 041407Publication Defectivity study on dry development rinse process (DDRP)
; ; ; ; Publication Demonstration of an N7 integrated fab process for metal oxide EUV photoresist
Proceedings paper2016, Extreme Ultraviolet (EUV) Lithography VII, 21/02/2016, p.97760BPublication Development of main chain scission type photoresists for EUV lithography
Proceedings paper2019, International Conference on Extreme Ultraviolet Lithography 2019, 15/09/2019, p.111470JPublication Development on main chain scission resists for high-NA EUV lithography
Proceedings paper2023, Conference on Advances in Patterning Materials and Processes XL, FEB 27-MAR 01, 2023, p.Art. 1249807Publication Difference in EUV photoresist design towards reduction of LWR and LCDU
Proceedings paper2017, Advances in Patterning Materials and Processes XXXIV, 27/02/2017, p.101460A