Browsing by Author "Dutta, Shibesh"

3 omega correction method for eliminating resistance measurement error due to Joule heating

Alternative metals for advanced interconnects

Alternative metals for advanced interconnects

Alternative metals: from ab initio screening to calibrated narrow line models

Atomic layer deposition of ruthenium for advanced interconnect applications

Atomic layer deposition of ruthenium thin films from (ethylbenzyl) (1-ethyl-1,4-cyclohexadienyl) Ru: process characteristics, surface chemistry, and film properties

Atomic layer deposition of ruthenium with TiN interface for sub-10nm advanced interconnects beyond copper

Characterization of ultra-thin nickel-silicide films synthesized using the solid state reaction of Ni with an underlying Si:P substrate (P: 0.7 to 4.0%)

Direct metal nanowire patterning using ion beam etch

Finite size effects in highly scaled ruthenium interconnects

Finite Size Effects in Platinum-group Metal Nanostructures

Hall effect measurement for precise sheet resistance and thickness evaluation of Ruthenium thin films using non-equidistant four-point probes

Highly scaled ruthenium interconnects

Low-temperature electronic transport properties of ruthenium thin films and nanowires

N5 technology node dual-damascene interconnects enabled using multi patterning

Phase analysis and thermal stability of thin films synthesized via solid state reaction of Ni with Si1-xGex substrate

Resistivity scaling model for metals with conduction band anisotropy

Ruthenium interconnects with 58 nm2 cross-section area using a metal-spacer process

Ruthenium metallization for advanced interconnects

Sub-100 nm2 cobalt interconnects