Browsing by Author "Fenger, Germain"
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Publication Application of pixel-based mask optimization technique for high-transmission attenuated PSM
Proceedings paper2009, Design for Manufacturability through Design-Process Integration III, 22/02/2009, p.72750XPublication Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 4, p.Art. 041603Publication Calibration and application of a DSA Compact model for grapho-epitaxy hole processes using contour-based metrology
Publication Calibration and application of Gaussian random field models for exposure and resist stochastic in EUV lithography
Journal article review2022, JAPANESE JOURNAL OF APPLIED PHYSICS, (61) SD, p.SD0806Publication Calibration of Gaussian Random Field stochastic EUV models
Proceedings paper2022, Conference on Optical and EUV Nanolithography XXXV Part of SPIE Advanced Conference, APR 24-MAY 27, 2022, p.1205105Publication Density limits in logic metal1 using double patterning
Proceedings paper2009, 6th International Symposium on Immersion Lithography Extensions, 22/10/2009Publication Design correction in extreme ultrviolet lithography
Journal article2010-10, Journal of Micro/Nanolithography MEMS and MOEMS, (9) 4, p.43001Publication Directed self-assembly (DSA) grapho-epitaxy template generation with immersion lithography
Publication Directed self-assembly graphoepitaxy template generation with immersion lithography
Publication E-beam metrology-based EUVL aberration monitoring
Publication EUV based multi-patterning schemes for advanced DRAM nodes
Proceedings paper2022, Conference on Advances in Patterning Materials and Processes XXXIX Part of SPIE Advanced Lithography and Patterning Conference, APR 24-MAY 27, 2022, p.Art. 1205503Publication Experimental determination and accurate modeling of the EUV ADT flare
Proceedings paper2009, International Symposium on Extreme Ultraviolet Lithography, 18/10/2009Publication Exploring alternative EUV mask absorber for iN5 self-aligned block and contact layers
Proceedings paper2019, Photomask Technology 2019, 16/09/2019, p.111481BPublication Feasibility of compensating for EUV field edge effects through OPC
Proceedings paper2014, Extreme Ultraviolet (EUV) Lithography V, 23/02/2014, p.90480TPublication Flare in extreme ultraviolet lithography: metrology, out-of-band radiation, fractal point spread function, and flare map calibration
Journal article2009, Journal of Micro/Nanolithography, MEMS, and MOEMS, (8) 4, p.41505Publication Full chip correction of EUV design
Proceedings paper2010, Extreme Ultraviolet (EUV) Lithography, 21/02/2010, p.763615Publication High accuracy OPC-modeling by using advanced CD-SEM based contours in the next generation lithography
Publication High NA EUV single patterning of advanced metal logic nodes: Inverse lithography techniques in combination with alternative mask absorbers
Proceedings paper2024, 39th European Mask and Lithography Conference (EMLC), JUN 17-19, 2024, p.Art. 132731MPublication High-accuracy optical proximity correction modeling using advanced critical dimension scanning electron microscope-based contours in next-generation lithography
Publication High-precision contouring from SEM image in 32-nm lithography and beyond