Browsing by Author "Finders, Jo"
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Publication 22nm node imaging and beyond: a comparison of EUV and ArFi double patterning
Proceedings paper2010, International Symposium on Lithography Extensions, 20/10/2010Publication 22nm node imaging and beyond: When will EUV take over?
Proceedings paper2010, International Symposium on Extreme Ultraviolet Lithography, 18/10/2010Publication Applying dipole illumination to characterize the imaging performance of 193nm photoresists for the 100nm node
Oral presentation2000, Interface, Poster SessionPublication Arf solutions for low-k1 back-end imaging
Proceedings paper2003, Optical Microlithography XVI, 23/02/2003, p.270-281Publication CD control comparison of step & repeat versus step & scan DUV lithography for sub-0.25 μm gate printing
Proceedings paper1998, Optical Microlithography XI, 25/02/1998, p.56-66Publication Critical assessment of error budget components in double patterning immersion lithography
Proceedings paper2008, 5th International Symposium on Immersion Lithography Extensions, 22/09/2008Publication Delay Times in Lattice Matched InGaAs/InP HEMT's with Gatelengths between 80 and 250 nm
Oral presentation1995, 19th Workshop on Compound Semiconductor Devices and Integrated Circuits (WOCSDICE '95); May 21-24, 1995; Stockholm, Sweden.Publication Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control
Proceedings paper2009, Optical Microlithography XXII, 23/02/2009, p.72740RPublication Design split and double exposure for contact hole printing at 0.40 k1 and beyond
Proceedings paper2004, Proceedings 41st Interface Symposium, 26/09/2004Publication Double dipole lithography for 65-nm node and beyond: a technology readiness review
Proceedings paper2004-08, Photomask and Next-Generation Lithography Mask Technology XI, 14/04/2004, p.481-498Publication Double patterning for 32-nm and below: an update
Proceedings paper2008, Optical Microlithography XXI, 24/02/2008, p.692408Publication Double patterning lithography for 32 nm: critical dimensions uniformity and overlay control considerations
Journal article2009, J. Micro/Nanolithography, MEMS, and MOEMS, (8) 1, p.11002Publication Edge placement error analysis for N7 logic patterning options
Publication Evaluation of local CD and placement distribution on EUV mask and its impact on wafer
Proceedings paper2019, XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology 2019, 16/04/2019, p.1117807-1-1117807-7Publication Experimental verification of phase induced mask 3D effects in EUV imaging
Proceedings paper2015, International Symposium on Extreme Ultraviolet Lithography - EUVL, 5/10/2015Publication Feasibility of 250 nm gate patterning using i-line with OPC
Journal article1998, Microelectronic Engineering, 41/42, p.111-116Publication Freeform illumination sources: an experimental study of source-mask optimization for 22nm SRAM cells
Proceedings paper2010, Optical Microlithography XXIII, 21/02/2010, p.764008Publication Fundamental understanding and experimental verification of bright versus dark field imaging
Publication Image placement error: closing the gap between overlay and imaging
Journal article2005, Journal Microlith., Microfab., Microsyst., (JM3), (4) 3, p.33006Publication Imaging challenges in 20nm and 14nm logic nodes: hot spots performance in Metal1 layer
Proceedings paper2013, 29th European Mask and Lithography Conference, 25/06/2013, p.88860N
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