Browsing by Author "Grasser, T."
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Publication A Comprehensive Cryogenic CMOS Variability and Reliability Assessment using Transistor Arrays
Proceedings paper2023, 7th IEEE Electron Devices Technology and Manufacturing Conference (EDTM), MAR 07-10, 2023Publication A drift-diffusion-based analytic description of the energy distribution function for hot-carrier degradation in decananometer NMOSFETs
Proceedings paper2016, 46th European Solid-State Device Research Conference - ESSDERC, 12/09/2016, p.428-431Publication A reliable method for the extraction of the lateral position of defects in ultra-scaled MOSFETs
Proceedings paper2014, International Reliability Physics Symposium - IRPS, 1/06/2014, p.XT.13Publication A rigorous study of measurement techniques for negative bias temperature instability
Journal article2008-09, IEEE Transactions on Device and Materials Reliability, (8) 3, p.526-536Publication Atomic Hydrogen Exposure to Enable High-Quality Low-Temperature SiO2 with Excellent pMOS NBTI Reliability Compatible with 3D Sequential Tier Stacking
Proceedings paper2020, IEEE International Electron Devices Meeting (IEDM), DEC 12-18, 2020Publication Benchmarking time-dependent variability of junctionless nanowire FETs
Proceedings paper2017, International Reliability Physics Symposium - IRPS, 2/04/2017, p.2D-6.1-2D-6.7Publication Characterization and modeling of charge trapping: From single defects to devices
Proceedings paper2014, IEEE International Conference on IC Design & Technology - ICICDT, 28/05/2014, p.1-4Publication Characterization and physical modeling of the temporal evolution of near-interfacial states resulting from NBTI/PBTI stress in nMOS/pMOS transistors
;Grasser, T. ;Stampfer, B. ;Waltl, M. ;Rzepa, G. ;Rupp, K. ;Schanovsky, F.Pobegen, G.Proceedings paper2018, 2018 IEEE International Reliability Physics Symposium - IRPS, 13/03/2018, p.2A.2-1-2A.2-10Publication Circuit simulation of workload-dependent RTN and BTI based on trap kinetics
Journal article2014, Microelectronics Reliability, (54) 11, p.2364-2370Publication COMPHY - A compact-physics framework for unified modeling of BTI
Journal article2018, Microelectronics Reliability, 85, p.49-65Publication Critical modeling issues in negative bias temperature instability
;Grasser, T.Meeting abstract2009, 215th Electrochemical Society Spring Meeting, 24/05/2009, p.793Publication CV Stretch-Out Correction after Bias Temperature Stress: Work-function Dependence of Donor-/Acceptor-like Traps, Fixed Charges, and Fast States
Proceedings paper2021, IEEE International Reliability Physics Symposium (IRPS), MAR 21-24, 2021Publication Defect creation stimulated by thermally activated hole trapping as the driving force behind negative bias temperature instability in SiO2, SiON, and high-k gate stacks
Proceedings paper2008, IEEE Integrated Reliability Workshop - IRW, 12/10/2008, p.91-95Publication Efficient physical defect model applied to PBTI in high-k stacks
Proceedings paper2017, IEEE International Reliability Physics Symposium - IRPS, 2/04/2017, p.XT-11.1-XT-11.6Publication Evidence of Tunneling Driven Random Telegraph Noise in Cryo-CMOS
Proceedings paper2021, IEEE International Electron Devices Meeting (IEDM), DEC 11-16, 2021Publication From mean values to distributions of BTI lifetime of deeply scaled FETs through atomistic understanding of the degradation
Proceedings paper2011, Symposium on VLSI Technology, 13/06/2011, p.152-153Publication Hot-carrier degradation in FinFETs: modeling, peculiarities, and impact of device topology
Proceedings paper2017, IEEE International Electron Devices Meeting - IEDM, 2/12/2017, p.310-313Publication Hydrogen-related volatile defects as the possible cause for the recoverable component of NBTI
;Grasser, T. ;Rott, K. ;Reisinger, H. ;Waltl, M. ;Wagner, P. ;Schanovsky, F. ;Goes, W.Pobegen, G.Proceedings paper2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.409-412Publication Impact of single charged gate oxide defects on the performance and scaling of nanoscaled FETs
Proceedings paper2012, International Reliability Physics Symposium - IRPS, 15/04/2012, p.5A-4Publication Implications of gate-sided hydrogen release for post-stress degradation build-up after BTI stress
;Grasser, T. ;Waltl, M. ;Puschkarsky, K. ;Stampfer, B. ;Rzepa, G. ;Pobegen, G.Reisinger, H.Proceedings paper2017, IEEE International Reliability Physics Symposium - IRPS, 2/04/2017, p.6A-2.1-6A-2.6
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