Browsing by Author "Mack, Chris"
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Publication Characterizing variation in EUV contact hole lithography
Proceedings paper2020, International Conference on Extreme Ultraviolet Lithography 2020, 21/09/2020, p.115170KPublication Determining the ultimate resolution of scanning electron microscope unbiased roughness measurements, part 1: Simulating noise
Publication Diagnosing and Removing CD-SEM Metrology Artifacts
Proceedings paper2021, Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV, 21/02/2021, p.116111BPublication e-beam metrology of thin resist for high NA EUVL
; ; ; ; ; Journal article review2023, JAPANESE JOURNAL OF APPLIED PHYSICS, (62) SG, p.Art. SG0808Publication Evolution of roughness during the pattern transfer of high-chi, 10 nm half-pitch, silicon-containing block copolymer structures
Publication Metrology of Thin Resist for High NA EUVL
Proceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.12053OOPublication Need for LWR metrology standardization: the imec roughness protocol
Journal article2018, Journal of Micro/Nanolithography MEMS and MOEMS, 17, p.41009Publication Role of landing energy in e-beam metrology of thin photoresist for high-numerical aperture extreme ultraviolet lithography
Journal article2023, JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3, (22) 2, p.021002Publication Roughness study on L/S patterning with chemo
Proceedings paper2019, The 5th DSA symposium, 16/10/2019Publication Roughness study on line and space patterning with chemo-epitaxy directed self-assembly
Proceedings paper2020, Advances in Patterning Materials and Processes XXXVII, 23/02/2020, p.113260XPublication Setting up a proper power spectral density (PSD) and autocorrelation analysis for material and process characterization
Proceedings paper2018, Metrology, Inspection, and Process Control for Microlithography XXXII, 25/02/2018, p.105851KPublication The need for LWR metrology standardization: the imec roughness protocol
Proceedings paper2018, Metrology, Inspection, and Process Control for Microlithography XXXII, 25/02/2018, p.105850DPublication Unbiased roughness measurements: subtracting out SEM effects
Oral presentation2017, 43rd International Conference on Micro and Nanoengineering - MNEPublication Unbiased roughness measurements: Subtracting out SEM effects
Journal article2018, Microelectronic Engineering, 190, p.33-37Publication Unbiased roughness measurements: Subtracting out SEM effects, Part 2
Journal article2018, Journal of Vacuum Science and Technology B, (36) 6, p.06J501Publication Unbiased roughness measurements: Subtracting out SEM effects, part 3
Proceedings paper2019, Metrology, Inspection, and Process Control for Microlithography XXXIII, 24/02/2019, p.109590P